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JP2022068394A |
To provide a chemically amplified resist composition that has improved lithography performance factors such as CDU, LWR and DOF and reduced defects in photolithography using high-energy radiation as the energy source, an acid diffusion i...
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JP2022066864A |
To provide a resist composition excellent in all of sensitivity, resolution, roughness reduction, and pattern shape, and a resist pattern forming method using the resist composition.The resist composition contains: a resin component (A1)...
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JP7056421B2 |
To provide a salt capable of producing a resist pattern with a good focus margin (DOF), and a resist composition containing the salt.A carboxylate is represented by formula (I) [where Lrepresents a C1-6 fluorinated alkanediyl group; Lrep...
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JP7057240B2 |
To provide a simple method for producing a sulfonium salt useful as a quencher, in which the structure of sulfonium is not limited but is especially a triarylsulfonium having an arylthio group(s) and which has an anionic residue of sulfo...
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JP7056524B2 |
A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when proce...
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JP2022059571A |
To provide a positive resist material that has better sensitivity and resolution than conventional positive resist materials, in which LWR and CDU are improved, and a pattern shape after exposure is excellent, and a pattern forming metho...
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JP2022059112A |
To provide a novel sulfonium salt used for a chemically amplified resist composition excellent in solubility in a solvent, having high sensitivity, and excellent in lithography performance such as exposure tolerance (EL), and LWR in phot...
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JP2022055315A |
To provide a molecular resist composition having excellent sensitivity, resolution and LWR in electron beam lithography and extreme ultraviolet lithography, and a patterning method using the molecular resist composition.A molecular resis...
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JP7049604B2 |
Provided is a method for producing a pentafluorosulfanyl aromatic compound represented by general formula (3), Ar-(SF5)k, (in the formula, Ar is a substituted or unsubstituted aryl group or heteroaryl group, and k is an integer between 1...
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JP7048248B2 |
This invention provides a photoacid generator containing a novel sulfonium salt having high photosensitivity to i-ray. A photoacid generator comprises a mixed sulfonium salt of a sulfonium salt represented by the following formula (1) an...
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JP2022050324A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); and an acid generator and a resist composit...
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JP2022050325A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); and an acid generator and a resist composit...
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JP7044562B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness, a resist composition containing the same, and a method for producing a resist pattern.The salt is represented by formula (I) [where Qand Q, and Rand R...
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JP7044563B2 |
To provide a salt and a resist composition capable of producing a resist pattern having a good mask error factor.A carboxylate represented by formula (I), an acid generator containing the carboxylate, and a resist composition containing ...
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JP7044561B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness, a resin, a resist composition, and a method for producing a resist pattern.The salt is represented by formula (I) [where Qand Qeach represent F or a p...
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JP7042613B2 |
A resist composition containing a compound (B1) represented by Formula (b1) in which Rb1 represents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yb1 and Yb2 each independently represent a divalen...
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JP7042878B2 |
To provide a resist composition capable of producing a resist pattern with good CD uniformity.The resist composition contains an acid generator containing a salt represented by formula (I0), and a resin having an acid-labile group. [In t...
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JP7041204B2 |
Iodine-containing photoacid generators and compositions including the same. A photoacid generator compound is provided having formula (I) wherein, in formula (I), the groups and variables are the same as those described in the specificat...
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JP2022037902A |
To provide an acid generator that has excellent curable properties and can be light-irradiated or heated to suitably form a cured product having excellent heat resistance, and a curable resin composition comprising the same.In an onium s...
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JP7032549B2 |
The present invention provides: an active-light-sensitive or radiation-sensitive resin composition containing (A) a resin that decomposes due to the action of an acid, the degree of solubility increasing in an alkaline developing solutio...
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JP7031537B2 |
A novel sulfonium compound has formula (A). A positive resist composition comprising a polymer and a quencher containing the sulfonium compound is improved in resolution and LER during pattern formation and has storage stability. In form...
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JP7028136B2 |
A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in expo...
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JP2022028612A |
To provide a salt that makes it possible to produce a resist pattern having excellent line edge roughness, an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP2022028614A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent CD uniformity, a carboxylic acid generator, a resin and a resist composition.The present invention discloses a carboxylate represented by, for e...
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JP2022025006A |
To provide a salt that can produce a resist pattern having excellent line edge roughness (LER), an acid generator and a resist composition comprising the same.The present invention discloses a salt represented by e.g. formula (I-8), an a...
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JP2022023958A |
To provide: a novel compound which has RAF/MEK complex stabilization activity and/or MEK inhibition activity and is useful for treating or preventing cell proliferative diseases; or a novel RAF/MEK complex stabilization agent or MEK inhi...
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JP6991792B2 |
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group, z...
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JP6991786B2 |
To provide a salt suitable for a resist composition capable of producing a resist pattern with a good focus margin (DOF).The salt is represented by formula (I) [where Rand Reach independently represent a C6-18 aromatic hydrocarbon group ...
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JP2022019579A |
To provide a carboxylate that can produce a resist pattern having excellent CD uniformity (CDU), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses, for example, a carboxylate represe...
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JP2022014782A |
To provide a resist composition having good fine resolution, a resist pattern formation method, a compound, and an acid diffusion control agent.A resist composition contains a base material component whose dissolubility to a developer is...
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JP2022507505A |
In one aspect, formula AA [Chemical 1] Characterized by a compound of, or a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable salt thereof, wherein the variables represented by Formula A are as defined elsewhere ...
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JP2022507506A |
In one aspect, formula AA [Chemical 1] Characterized by a compound of, or a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable salt thereof, wherein the variables set forth in Formula AA are as defined elsewhere h...
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JP6999330B2 |
A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylen...
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JP6997803B2 |
Provided is an active-light-sensitive or radiation-sensitive resin composition that can be used to form a pattern having excellent pattern line width roughness (LRW) and critical dimension uniformity (CDU). Also provided are a resist fil...
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JP2022507668A |
Novel compounds and methods for preparing cannabinoids The present invention relates to various derivatives of the cyclic alkene alcohol of formula (II) or formula (III) (in the formula, R).1Is an alkyl, aryl, alkylaryl or heterocyclic c...
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JP2022505562A |
In one embodiment, Equation A: [Chemical 1] (In the formula, the variables shown in formula A can be as defined anywhere in the specification). The compound of, or a pharmaceutically acceptable salt thereof, or a pharmaceutically accepta...
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JP6991785B2 |
A salt represented by the formula (I). [In the formula (I), R1 and R2 each independently represent an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent. R3 represents an acid labile group. X1 represents ...
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JP2022008151A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist compos...
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JP2022008150A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...
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JP2022001568A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good line edge roughness (LER).The salt represented by formula (I), the acid generator, and the resist composition are provided. ...
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JP2022001567A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The salt represented by formula (I), the acid generator, and the resist composition are provided. [In th...
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JP6987637B2 |
To provide a salt and a resist composition capable of producing a resist pattern having good CD uniformity.There are provided: the salt having a group represented by formula (aa1); an acid generator containing the salt; and the resist co...
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JP2021536451A |
The present invention is directed to ligated metal-organic frameworks (MOFs) for use in the removal of both anionic and cationic species from liquids or liquid streams. The invention also provides a method for placing MOFs on a substrate...
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JP6986974B2 |
To provide a salt and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The salt is represented by formula (I) [where Q, Q, Rand Reach represent a hydrogen atom, a fluorine atom, or the like; z re...
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JP2021187844A |
To provide a salt, an acid generator, and a resist composition containing the same, so that by using them, a resist pattern having good line edge roughness (LER) can be produced.The salt represented by formula (I), the acid generator, an...
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JP2021187843A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...
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JP6977033B2 |
Provided herein is a process for preparing triaryl organoborates proceeding from alkyl or cycloalkyl boronates in the presence of an n-valent cation 1/n Kn+ to obtain organoborates of the formula 1/n Kn+R34B−—R1 (IV), where one equiv...
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JP6974981B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.There are provided a salt represented by formula (I), an acid ge...
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JP6971896B2 |
To provide a photosensitive composition which prevents π-π stack on a graphene as a resist when the graphene is worked, and can suppress contamination and performance deterioration of the graphene.A photosensitive composition includes:...
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JP2021176851A |
To provide a salt capable of producing a resist pattern with excellent CD uniformity (CDU), and to provide a resist composition containing the salt.A salt has an anion expressed by a formula (aa1). [In the formula (aa1), X1 represents a ...
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