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JP2022164584A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by a specific formula, a carboxylic ac...
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JP2022164583A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a salt represented by Formula (I-1346), an acid generator, and a resist compo...
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JP2022161843A |
To provide: a novel photoacid generator comprising a sulfonyl imide salt compound that has high photosensitivity to i-line and also has excellent storage stability in a blend with a cationic polymerizable compound such as an epoxy compou...
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JP7158500B2 |
Provided is a compound of Formula (I):wherein the variable groups are defined herein.
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JP2022161017A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resist compositio...
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JP2022159071A |
To provide: a new photoacid generator containing a sulfonylimide salt compound which has high photosensitivity to the i-line and has excellent storage stability in a composition with a cationic polymerizable compound such as an epoxy com...
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JP7146587B2 |
To provide a salt and the like capable of producing a resist pattern having a good mask error factor (MEF).The salt has a group represented by formula (aa) [where Xand Xeach represent -O- or -S-; Xrepresents a hydrocarbon group having an...
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JP2022141598A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by a formula (I), a carboxylic acid ...
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JP2022141489A |
To provide a novel fluorine-containing sulfonyl compound to be a precursor of a sulfonyl group-containing monomer as a staring monomer for a fluorine-based polymer electrolyte, and provide a novel sulfonyl group-containing monomer that c...
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JP2022141597A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP7140075B2 |
A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative ...
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JP7138065B2 |
To provide a salt and a resist composition capable of producing a resist pattern with an excellent focus margin (DOF).There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. ...
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JP2022129631A |
To provide: a thermosetting composition which contains a heat acid generator excellent in reactivity and heat stability as a cation polymerization initiator, and thereby is excellent in curability and heat stability; an adhesive using th...
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JP2022126072A |
To provide a high-yield and high-purity production method of a sulfonium salt where fluorine atoms or fluorinated alkyl groups are introduced into a triphenylsulfonium cationic moiety.A production method of a sulfonium salt (S) represent...
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JP7124340B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or a C1-...
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JP2022123839A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.There are provided: a triphenyl salt having substituents which is represented by a specific ...
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JP2022123840A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by a specific formula; a carboxylic acid ge...
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JP7113815B2 |
The present invention provides compounds according to Formula I as described herein, and their use for inhibiting the lysine gingipain protease (Kgp) from the bacterium Porphyromonas gingivalis. Also described are gingipain activity prob...
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JP2022110339A |
To provide a new method for producing α-(mercaptomethyl) acrylate that is useful as the raw material for pharmaceuticals and various resin compositions.A method for producing α-(mercaptomethyl) acrylate includes hydrolyzing Bunte salt ...
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JP2022108851A |
To provide: a photoacid generator excellent in long-term storage stability and curability and also excellent in heat resistance of a cured product obtained by applying photoirradiation or heating treatment; and a photocurable resin compo...
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JP7101541B2 |
A resist composition including: a compound including an anion moiety and a cation moiety and represented by the following Formula (bd1); and an organic solvent having a hydroxyl group in which Rx1 to Rx4 each represent a hydrocarbon grou...
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JP7100805B2 |
A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent.R1 is a hydrogen atom or a monovalent group provided ...
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JP2022105281A |
To provide: a photoacid generator; a photoresist composition; and a pattern formation method.A photoacid generator includes the part of the formula (1), where, Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl grou...
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JP7099030B2 |
To provide a composition capable of producing a resist pattern with good line edge roughness (LER), and a method for producing a resist pattern.The resist composition contains an acid generator containing a salt represented by formula (I...
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JP7099418B2 |
A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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JP7099250B2 |
A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
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JP7094144B2 |
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition....
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JP7093975B2 |
Provided is a zwitterionic polymer that has a zwitterion that includes an effect of improving the stability of proteins. This zwitterionic polymer is a polymeric protein stabilizer that exhibits a protein stabilizing effect even at a sma...
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JP7091875B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or...
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JP7091874B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or...
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JP7092356B2 |
The present invention discloses a biaryl urea ROR³t inhibitor, and specifically relates to a biaryl urea derivative, as represented by formula I, with an ROR³t inhibiting activity, and a preparation process thereof, and a pharmaceutica...
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JP2022093297A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The salt represented by formula (I), the acid generator, and the resist composition are provided. ...
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JP2022091720A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.The carboxylate represented by formula (I), the carboxylic acid generator, and th...
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JP7087730B2 |
wherein Q1, Q2, R1, R2, R3, R4, R5, z, and Z+ are defined in the specification.
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JP2022091718A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The salt represented by formula (I), the acid generator, and the resist composition containing the...
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JP2022089280A |
To provide a highly active heat-sensitive or active energy ray-sensitive acid generator which has excellent acid-generating ability upon irradiation with heat or an active energy ray and improves storage stability of a curable or resist ...
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JP7081413B2 |
A salt represented by the formula (I):
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JP7079647B2 |
To provide a compound and a composition, suitably used for a resist composition for a lithography process using active energy rays such as electron beams or extreme ultraviolet rays, UV.The present invention provides an onium salt repres...
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JP2022077982A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The salt represented by formula (I), the acid generator, and the resist composition are provided. ...
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JP2022077505A |
To provide a carboxylate and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The carboxylate represented by formula (I) and the resist composition are provided. [In the formula, Ar represe...
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JP2022075556A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The salt represented by formula (I), the acid generator, and the resist composition are provided. ...
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JP7070141B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or...
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JP7069207B2 |
The present invention relates to novel hair treatment materials, and in particular materials for shaping hair and/or strengthening the hair. Also described are the use of these compounds in hair care formulations for shaping, straighteni...
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JP2022073968A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.The salt is represented by formula (I) [where Q1 and Q2 each independently represent a fluor...
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JP7067271B2 |
An onium salt of arenesulfonic acid having a bridged ring-containing group generates a bulky acid having an appropriate strength and controlled diffusion. When a positive resist composition comprising the onium salt and a base polymer is...
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JP7067831B2 |
The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.
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JP7068457B2 |
This invention provides a Brassica oleracea plant with high S-methylmethionine content. This invention relates to a Brassica oleracea plant with higher S-methylmethionine content than that in a conventional Brassica oleracea plant. Speci...
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JP7066577B2 |
To provide a compound capable of producing a resist pattern with good line edge roughness (LER), a resin having a structural unit derived from the compound, and a resist composition containing the resin.The compound is represented by for...
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JP7066573B2 |
To provide a salt and a resist composition capable of producing a resist pattern with excellent CD uniformity (CDU).A compound is represented by formula (I), and the resist composition contains the compound. [In the formula (I), R-Reach ...
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JP2022525186A |
The compounds of the present disclosure, as well as their compositions and methods of use. The compound inhibits the activity of the TEAD transcription factor and is useful in the treatment of diseases associated with the activity of the...
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