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WO/2020/247324A1 |
Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from ...
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WO/2020/241116A1 |
The present invention provides a photomask blank which exhibits high adhesion of a resist film to a film containing chromium, and which is capable of achieving good resolution limit and good CD linearity during the formation of an assist...
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WO/2020/237317A1 |
Methods for forming microstructures in photocurable material are described. At least one image of light or radiation for curing the photocurable material is applied in a pattern corresponding to the image. The image is formed by near-fie...
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WO/2020/237928A1 |
An OLED display panel and a photomask. The OLED display panel comprises a first film layer (21), and a second film layer (22) formed on the first film layer (21), wherein the material of the second film layer (22) is an organic material,...
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WO/2020/241780A1 |
Provided are reflective photomask blanks and a reflective photomask which can compatibly suppress a projection effect and enhance the life of a mask. The reflective photomask blanks (10) are provided with: a substrate (1); a reflection u...
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WO/2020/236889A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/236892A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/236884A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/236883A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/236887A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/236888A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/235612A1 |
The present invention addresses the problem of providing an EUV mask blank provided with a hard mask layer enabling a sufficient etching speed in a dry etching process having a sufficiently high etching selection ratio under the etching ...
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WO/2020/236893A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/236886A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/228594A1 |
Provided are an array substrate and a manufacturing method therefor, a display device, and a mask plate. The array substrate comprises a pixel defining layer having a first opening (201, 251), a second opening (202, 252), and a third ope...
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WO/2020/225412A1 |
For approximating imaging properties of an optical production system which images an object (7) to imaging properties of an optical measurement system (15, 4) when imaging the object (7), which imaging properties arise from an adjustment...
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WO/2020/225411A1 |
For the purpose of three-dimensionally determining an aerial image of a lithography mask (7) as a measurement intensity result of an imaging by means of an anamorphic projection exposure imaging optical unit of a projection exposure appa...
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WO/2020/226030A1 |
This quartz etching method comprises forming a mask over a quartz glass substrate, and using a hydrofluoric acid-based etchant solution to perform etching. This quartz etching method comprises preparing the quartz glass substrate, formin...
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WO/2020/221556A1 |
A method for reducing M3D effects on imaging is described. The method includes identifying points within a source plane of the photolithography system that are associated with pattern shifts resulting from diffraction of light off a phot...
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WO/2020/221547A1 |
A patterning device configured for use in a lithographic apparatus, the lithographic apparatus being configured to use radiation for imaging a pattern at the patterning device via projection optics onto a substrate. The patterning device...
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WO/2020/216572A1 |
Described herein are methods for optimizing an aspect of a patterning process based on defects. For example, a method of source and mask optimization of a patterning process includes obtaining a location on a substrate having a threshold...
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WO/2020/212107A1 |
Described herein is a method for determining corrections to features of a mask. The method includes obtaining (i) a pattern group for a design layout, and (ii) defect inspection data of a substrate imaged using the mask used in the patte...
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WO/2020/213661A1 |
[Problem] To provide: an adhesive agent for pellicles, which makes it possible to reduce a residue adhered to an exposure original plate that has been used in lithography, particularly ArF lithography, upon the peeling of the pellicle fr...
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WO/2020/213659A1 |
[Problem] To provide a pellicle, exposure original plate with pellicle, method for recycling exposure original plates and method for reducing peel residue, with which it is possible to reduce the residue which adheres to the exposure ori...
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WO/2020/213662A1 |
[Problem] To provide an adhesive for a pellicle that can reduce the amount of residue on an exposure original plate when the pellicle is peeled off from the exposure original plate after using lithography, in particular ArF lithography, ...
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WO/2020/212840A1 |
Methods are disclosed relating to the operation of a micro-structural fluid ejector in a fluid printing apparatus. The methods include providing an imaging system, capturing a digital image of the micro-structural fluid ejector and its s...
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WO/2020/210177A1 |
A system for stochastic reticle defect dispositioning is disclosed. The system includes a controller including one or more processors and memory. The one or more processors configured to acquire product metrology data of a product reticl...
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WO/2020/207774A1 |
A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto ...
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WO/2020/207759A1 |
Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive t...
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WO/2020/209955A1 |
Methods and apparatus for removing a photoresist layer from a photomask substrate are provided. In one example, a method for removing a photoresist layer from a substrate in a chamber includes generating a first plasma including first ra...
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WO/2020/208848A1 |
Provided is a photomask obtained at low cost and through a straightforward production method, the photomask exhibiting sufficient ESD suppression effects, causing no exposure pattern destruction, and further having suitable exposure effi...
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WO/2020/200635A1 |
Disclosed is a method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate comprising at least a sub-field, the method comprising: obtaining an initial spatial profile associated with a spatial ...
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WO/2020/203338A1 |
The present invention prevents pressure from being exerted locally and minimizes generation of dust from a gripping part when a mask blank substrate is gripped by a transfer robot. This mask blank substrate 10 is provided with: first and...
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WO/2020/199525A1 |
The present application provides a support assembly and a mask support using same. The support assembly comprises: a base; an adjustment block, movably provided on the base; a first adjustment mechanism, capable of driving the adjustment...
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WO/2020/192010A1 |
Disclosed are a mask plate and a stitching exposure method. The mask plate comprises: a target exposure pattern (110) and a compensation exposure pattern (120), wherein the compensation exposure pattern (120) is located at a stitching en...
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WO/2020/196555A1 |
Provided is a substrate which is for a mask blank and of which the surface shape can be accurately calculated after being set on a mask stage of an exposure device. A substrate 10 for a mask blank comprises: a first main surface 12a wh...
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WO/2020/196836A1 |
The present invention addresses the problems of providing an adhesive solution that exhibits a high solution stability and providing a pellicle that, through the use of the adhesive solution, exhibits little adhesive residue and exhibits...
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WO/2020/191661A1 |
The present disclosure relates the technical field of display, and provides a display substrate, a display device, a mask plate, and a manufacturing method. In the method, a pattern structure is formed on a substrate. The substrate compr...
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WO/2020/187578A1 |
Described herein is a method of determining representative patterns for training a machine learning model to predict optical proximity corrections. The method includes obtaining a design layout comprising a set of group of patterns, each...
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WO/2020/189168A1 |
The present invention addresses the problem of providing a mask blank that makes it possible to further miniaturize a mask pattern or a hard mask pattern and improving the pattern quality, and to resolve this problem, a mask blank (100) ...
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WO/2020/187690A1 |
The invention relates to a measurement or inspection device, in particular a mask inspection device, comprising: an object (2) to be measured or inspected, a lens system (4) for measuring or inspecting a surface (2a) of the object (2), a...
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WO/2020/184473A1 |
Provided is a reflection-type mask blank which enables the further reduction of the shadowing effect of a reflection-type mask. A reflection-type mask blank (100) in which a multilayer reflection film (2) and an absorber film (3) are a...
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WO/2020/180584A1 |
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputte...
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WO/2020/180586A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and EUV lithography systems are disclosed. The EUV mask blanks comprise an absorber including a tuning layer and a stack of absorber layers of a first material A and a ...
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WO/2020/180585A1 |
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputte...
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WO/2020/180582A1 |
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputte...
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WO/2020/179463A1 |
The present invention addresses the problem of providing a mask blank with which mask patterns and hard mask patterns can be made finer and pattern quality can be improved. To solve the problem, a mask blank (100), which has a structure ...
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WO/2020/178008A1 |
Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least parti...
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WO/2020/175354A1 |
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask and form a fine and highly accurate absorber pattern. A reflective mask blank having a multilayer reflection film...
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WO/2020/174342A1 |
Methods for matching features in patterns for electronic designs include inputting a set of pattern data for semiconductor or flat panel displays, where the set of pattern data comprises a plurality of features. Each feature in the plura...
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