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WO/2022/004456A1 |
The purpose of the present invention is to solve problems of accuracy deterioration in the shape of a formed pattern which is caused by an increase in pattern thickness resulting from increase in thickness of an oxide layer formed on a s...
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WO/2022/004350A1 |
Provided is a mask blank that enables, without complicating the mask-manufacturing process, creation of patterns of differing transmittance with desired accuracy, and achievement of a desired phase-shift function in each pattern. This ...
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WO/2022/002931A1 |
The present invention relates to a method (2800) for setting at least one side wall angle (170, 670, 1970, 2470, 2770, 2780) of at least one pattern element (120, 220, 230, 250, 260, 280, 290) of a photolithographic mask (150, 200, 700) ...
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WO/2022/002728A1 |
Methods for repairing a defect of a lithographic mask with a particle beam are described. One such method can comprise the following steps: Processing the defect with the particle beam with a first set of processing parameters; processin...
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WO/2022/002558A1 |
To ascertain an image of an object (5) which emerges when the object (5) is illuminated with illumination light (1) from a partly coherent light source (17) with a target illumination setting having an illumination-side numerical apertur...
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WO/2022/000478A1 |
The present application relates to a circuit board manufacturing method and a circuit board. The method comprises: providing a substrate, forming a metal layer on the substrate, covering the side of the metal layer away from the substrat...
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WO/2021/259738A1 |
Described herein is a method for determining a likelihood that an assist feature of a mask pattern will print on a substrate. The method includes obtaining (i) a plurality of images of a pattern printed on a substrate and (ii) variance d...
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WO/2021/262271A1 |
A computing device is provided, including a processor. The processor may generate a three-dimensional device model at least by receiving one or more three-dimensional substrate elements and one or more two-dimensional lithography element...
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WO/2021/259646A1 |
Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include g...
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WO/2021/253778A1 |
A photomask protection device, comprising: a pair of reflectors (12), the reflectors (12) being arranged in parallel to each other; and a laser tube (13) provided on one end of one of the reflectors (12) and used for emitting a laser bea...
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WO/2021/251157A1 |
Provided are a pellicle frame (1), a pellicle, an exposure original plate with a pellicle, an exposure method, a method for manufacturing a semiconductor, and a method for manufacturing a liquid crystal display board, the frame-shaped pe...
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WO/2021/246187A1 |
Provided are: a frame-shaped pellicle frame 1 having a pellicle frame main body 1a and an insulation layer 1b covering the pellicle frame main body; a pellicle comprising a pellicle film that is provided on the pellicle frame 1 and a top...
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WO/2021/247296A1 |
Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of E...
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WO/2021/244820A1 |
Described herein is a method for improving a design of a patterning device. The method includes (i) obtaining mask points of a design of a mask feature, wherein the mask feature corresponds to a target feature in a target pattern to be p...
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WO/2021/246450A1 |
Provided are a method for producing a laminate and its application, the method comprising, in the stated order, step 1 of preparing a laminate precursor having, in the stated order, a base material, a first transparent conductive part, a...
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WO/2021/244830A1 |
A method for verifying a feature of a mask design is described. The method comprises determining localized shapes of the feature; and determining whether there is a breach by the feature of verification criteria based on the localized sh...
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WO/2021/241877A1 |
The present invention relates to an exposure pattern, an exposure mask, and a method for forming an exposure pattern by same, wherein the exposure pattern is formed by division exposure, and in an area where a first exposure area formed ...
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WO/2021/239337A1 |
There is described an optical element for a lithographic apparatus, said optical element comprising an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containin...
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WO/2021/237552A1 |
A mask, an exposure method, and a touch panel. The mask comprises a light-transmitting pattern (520) and a light-shielding pattern (510), the mask further comprises a first exposure region (A) and a second exposure region (B), and the fi...
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WO/2021/238342A1 |
A mask (13), an exposure method and a touch panel (170). The mask (13) comprises a first area (130') and a second area (130); the first area (130') is located on at least one side of the second area (130), wherein the first area (130') c...
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WO/2021/233121A1 |
A wafer edge exposure apparatus and method, and a lithographic device. The apparatus comprises a wafer bearing module (20), a mask (30), a mask driving module (40), an alignment module (50), an exposure module (60), and a control module ...
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WO/2021/230297A1 |
Provided are: a reflective mask in which a fine absorption film pattern is formed even when a high-absorption material is used as an absorption film of an EUV mask, whereby a projection effect can be lessened and electron beam modificati...
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WO/2021/229968A1 |
This processing method for glass substrates comprises: irradiating a first main surface of a glass substrate with a gas cluster in the form of a beam; moving the glass substrate so as to move the irradiation point of the gas cluster on t...
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WO/2021/230262A1 |
The present invention provides: a pellicle frame for EUV exposure characterized in that the pellicle frame is provided with at least one ventilation part, and a filter having a porous membrane coated with a resin is attached inside the v...
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WO/2021/229967A1 |
This processing method for glass substrates comprises: preparing a protective layer-equipped glass substrate that has a glass substrate and a protective layer containing a resin layer which is in contact with the glass substrate; holding...
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WO/2021/229269A1 |
A method and apparatus for inscribing a Bragg grating in an optical waveguide, comprising: providing electromagnetic radiation from an ultrashort pulse duration laser, wherein the electromagnetic radiation has a pulse duration of less th...
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WO/2021/227910A1 |
A photomask and a manufacturing method therefor. The photomask comprises: a substrate (11), and a light-shielding layer (12) and a barrier layer (13) which are located on the substrate (11), wherein the light-shielding layer (12) is inte...
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WO/2021/224353A1 |
In particular for producing reflective optical elements for the EUV wavelength range, which have grating structures or which can serve for a phase shift, methods with the following steps are proposed: - applying a structurable layer to a...
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WO/2021/223569A1 |
A mask plate relating to the technical field of display, comprising a first splicing exposure region (120) and a second splicing exposure region (220) which are arranged along a first direction (A). After being translated along a first v...
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WO/2021/224009A1 |
Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target re...
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WO/2021/225999A1 |
Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process per...
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WO/2021/218413A1 |
A mask (M), a display substrate and a manufacturing method, and a display device. The present invention can improve the yield of the display device. The mask (M) is used for manufacturing a pixel defining layer (6) of the display substra...
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WO/2021/221124A1 |
The objective of the present invention is to provide a reflective photomask blank and a reflective photomask that suppresses or reduces a projection effect in a reflective photomask for patterning transfer using light having a wavelength...
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WO/2021/221123A1 |
The purpose of the present invention is to provide a reflective photomask blank and a reflective photomask which have high resistance to hydrogen radicals and which have improved transfer properties by minimally suppressing projection ef...
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WO/2021/222179A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate,; a multilayer stack of reflective layers on the substrate, a capping layer on t...
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WO/2021/222688A1 |
Methods and systems for building a photomask from obtained pattern information relating to a photomask that exhibits defects on wafer. Spatial domain analysis is conducted on the pattern information so that corrective photomask structure...
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WO/2021/222603A1 |
A pod includes a cover with a cover body, a baseplate with a baseplate body, and one or more seal surfaces. The one or more seal surfaces are formed on one or more of the baseplate body and the cover body to provide sealing. A method of ...
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WO/2021/212557A1 |
A mask plate, and a display panel and a manufacturing method therefor. The mask plate comprises a transverse shading strip (10) and a longitudinal shading strip (20) crossed with the transverse shading strip (10); and the mask plate is p...
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WO/2021/216658A1 |
Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.
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WO/2021/213777A1 |
A pellicle frame (17) comprises: a first portion (40); and a plurality of second portions (42). The first portion is for connection to a border (19a) of a pellicle (19). The first portion comprises a hollow and generally rectangular body...
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WO/2021/217061A1 |
Embodiments of the present disclosure are directed to an array substrate which can be used in nucleic acid sequencing, which includes a plurality of fiducial domains (FDs). The disclosure also includes array substrate manufacturing metho...
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WO/2021/213813A1 |
An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illuminatio...
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WO/2021/208692A1 |
A mask layout method and apparatus, and a mask. The mask layout method comprises: forming, on a mask (1), chip patterns (11) arranged in an array, a cutting channel (12) being formed between every two adjacent chip patterns (11), the cut...
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WO/2021/211676A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2021/209273A1 |
An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam...
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WO/2021/211955A1 |
Sensor zones are created on an inner pod of a reticle container using a dry coating method. The sensor zones are discrete zones having a specific spectral reflectivity. The sensor zones are positioned such that they can be read by a tool...
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WO/2021/210432A1 |
An exposure pellicle film includes a carbon nanotube film, the carbon nanotube film containing carbon nanotubes, the carbon nanotube film having an EUV light transmittance of 80% or above at a wavelength of 13.5 nm, and the carbon nanotu...
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WO/2021/205906A1 |
[Problem] With conventional mask-information adjusting devices, there has been a problem in that the data size of mask information with which it is possible to obtain a high-precision exposure pattern is large. [Solution] A mask-informat...
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WO/2021/203966A1 |
An optical proximity effect correction method and apparatus. The optical proximity effect correction method comprises: acquiring an original target pattern, and pre-processing the original target pattern to form a secondary target patter...
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WO/2021/204024A1 |
Disclosed are a mask plate and a method for testing the quality of the mask plate. The mask plate comprises a mask exposure area (12) and a non-mask exposure area (11), wherein the mask exposure area (12) is provided with a mask pattern ...
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