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Patent Searching and Data


Matches 101 - 150 out of 103,573

Document Document Title
WO/2018/228198A1
An organic electroluminescent device and a preparation method, and an evaporation device. The preparation method for the organic electroluminescent device comprises: forming, on a base substrate (26), a first electrode layer (11); perfor...  
WO/2018/228683A1
A deposition apparatus (100) for coating a flexible substrate (10) with a stack of layers is described. The deposition apparatus comprises: a first spool chamber (110) housing a storage spool for providing the flexible substrate; a depos...  
WO/2018/230663A1
Provided are gallium nitride particles which make it possible to produce a gallium nitride sputtering target having a high density and high strength, have a reduced oxygen content, and have high moldability. A mixed powder of gallium oxi...  
WO/2018/225938A1
The present application relates to a metal pattern film and a manufacturing method therefor. The metal pattern film comprises: a base; a first adhesion enhancing layer and a second adhesion enhancing layer each provided on either side of...  
WO/2018/225396A1
This layered substrate (10) having piezoelectric film comprises a substrate (1), a first electrode film (2) formed over the substrate, and a piezoelectric film (3) formed over the first electrode film, wherein an oxide film made up of an...  
WO/2018/226574A1
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation...  
WO/2018/225826A1
This substrate guide is provided to a carrier frame of a carrier, which substantially perpendicularly holds a substrate such that the surface of the substrate is in substantially vertical direction, and which supports the substrate by be...  
WO/2018/225185A1
The cleaning apparatus (100) is a mask cleaning apparatus for removing organic matter adhering to a vapor deposition mask (60) used for forming a thin organic film by vapor deposition, and comprises a dry cleaning device (110) for removi...  
WO/2018/225822A1
A method for producing a thin film transistor that has a gate electrode, a gate insulating layer, an oxide semiconductor layer, a source electrode and a drain electrode on a substrate. This method for producing a thin film transistor com...  
WO/2018/224454A1
The invention relates to an apparatus and to a method for the deposition of a layer on a substrate (5), wherein, in a preparatory step, a first mass of an initial substance is deposited on storage surfaces of a storage element (1) and, i...  
WO/2018/225324A1
The present invention efficiently generates plasma for sputtering using an antenna and improves plasma uniformity to improve the uniformity of film formation. The apparatus is provided with: a vacuum container 2, which is evacuated and i...  
WO/2018/225184A1
A first clamping member (2) of a clamping apparatus (1) has a main rotating member (5) that can rotate about a main rotating shaft (6) such that the main rotating member faces a supporting member (4) by having a deposition mask (9) there...  
WO/2018/223695A1
Disclosed are an evaporation mask plate (200), a sheathing evaporation mask plate, an evaporation system and an alignment testing method. The evaporation mask plate (200) comprises a mask pattern plate (1). The mask pattern plate (1) com...  
WO/2018/224073A1
The invention relates to a method for producing a sliding surface (1) on a machine element (2), wherein the sliding surface (1) of the machine element (2) is provided for sliding contact with at least one further machine element, wherein...  
WO/2018/223740A1
Disclosed is a pixel arrangement structure, comprising a plurality of repeatedly arranged sub-pixel groups. Each sub-pixel group comprises: one first sub-pixel and two second sub-pixels sequentially arranged in the ith column, wherein i ...  
WO/2018/226683A1
Process kits for use in a multi-cathode process chamber are disclosed. Process kits include one or more of a conical shield, rotatable shield, shroud, inner deposition ring, outer deposition ring, or a cover ring. In some embodiments, a ...  
WO/2018/224366A1
The present invention is in the field of A roll-to-roll apparatus for processing metal tapes with a ceramic coating. In particular, the present invention relates to a roll-to-roll apparatus for pro- cessing metal tapes with a ceramic coa...  
WO/2018/226213A1
In an example, a device cover may comprise a substrate and a metal luster layer having a lustrous paint formulation applied to an outer surface of the substrate. The lustrous paint formulation may comprise base particles with surfaces pa...  
WO/2018/223659A1
A deposition ring (50) and a chuck assembly using the same. The deposition ring (50) is used in the chuck assembly in cooperation with a pressure ring (60) and a base (40), and comprises: an annular body (51) having an upper surface (52)...  
WO/2018/223782A1
Disclosed is a tensioning device, comprising: a pedestal (10) used for bearing a mask, configured to bear a mask (40); a clamp (20) used for clamping a mask, configured to clamp the mask (40); and a deformation adjusting component (30), ...  
WO/2018/226966A1
A magnetic-field-assisted plasma coating system (51; 121; 181; 251) and method are provided. In another aspect, a coating system employs a cathode (61; 261) with a linearly moveable magnetic field. A further aspect employs a workpiece (2...  
WO/2018/223770A1
Provided is a film forming device, comprising: a film forming cavity (91) used for forming a film on a substrate provided therein; a transfer unit used for transferring an anti-adherent plate (7) to the film forming cavity (91) along a t...  
WO/2018/225114A1
This semiconductor device is provided with: a substrate; a conductive wiring line which is provided on one surface of the substrate; and a thin film transistor which is electrically connected to the conductive wiring line. The conductive...  
WO/2018/221099A1
A structure according to an embodiment of the present invention is provided with a decorative part and a member. The decorative part includes a metal layer having: a first surface; a second surface on the opposite side from the first sur...  
WO/2018/220074A1
A profile for window, door, facade or cladding elements is disclosed, which comprises a profile body (2) made from thermoplastic material and extending in a longitudinal direction (z) with an essentially constant cross-section (x-y) alon...  
WO/2018/220067A1
The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering p...  
WO/2018/220989A1
The present invention pertains to a sputtering target containing Y and Mg and having a composition represented by (1-x)Mg-xY (where, 0
WO/2018/220567A1
A coated metallic substrate and fabrication method The present invention relates to a coated metallic substrate comprising, at least; one layer of oxides, such layer being directly topped by an intermediate coating layer comprising Fe, N...  
WO/2018/221711A1
The present invention provides a low-resistance nitride compound semiconductor which has been difficult to manufacturing in the past. Furthermore, high electron mobility is shown, and therefore it is possible to configure a high-performa...  
WO/2018/221520A1
Provided are a fluorinated ether composition for vapor deposition which can be used to form a vapor-deposited film having excellent frictional durability, an article with a vapor-deposited film, and a production method for the article. T...  
WO/2018/220953A1
[Problem] To provide a transparent conductive film having exceptional transparency and electrical conductivity, and furthermore having high hardness. [Solution] A transparent conductive film according to one embodiment of the present inv...  
WO/2018/220907A1
[Problem] To stabilize water vapor partial pressure and further stabilize the film quality of a transparent conductive film. [Solution] A film formation device comprises a first vacuum chamber, a gas supply source, a film formation sourc...  
WO/2018/221852A1
The present invention relates to a frame-integrated mask. The frame-integrated mask (10) according to the present invention is used in a process of forming pixels on a silicon wafer, and comprises: a mask (20) including a mask pattern (P...  
WO/2018/218935A1
A mask plate, a preparation method and a usage method therefor. The mask plate comprises: a support member (100) and a mask strip (200) which is mounted on the support member (100); the mask strip (200) comprises at least two connecting ...  
WO/2018/218932A1
A mask, a mask apparatus and manufacturing method therefor, and mask manufacturing equipment. The mask comprises: a pattern part (1), comprising first edges (15) and second edges (16); first stretching fitting structures (2) used to rela...  
WO/2018/220411A1
The present invention relates to a coated metallic substrate comprising, at least; one layer of oxides, such layer being directly topped by an intermediate coating layer comprising Fe, Ni, Cr and Ti wherein the amount of Ti is above or e...  
WO/2018/221355A1
A coated tool according to one embodiment of the present invention comprises a substrate and a coating layer positioned on the substrate. The coating layer has: a plurality of AlTi layers containing at least one nitride, carbide, or carb...  
WO/2018/214783A1
Embodiments of the present invention provide a vapor deposition crucible, a vapor deposition source, a vapor deposition device, and a vapor deposition method, pertaining to the field of vacuum evaporation film deposition, and solving the...  
WO/2018/216256A1
A coating is formed on a base material and comprises at least one layer. Of said layers, at least one layer is a TiCN layer that is made of titanium carbonitride. Granular structures of the titanium carbonitride occupy at least 75 area% ...  
WO/2018/215410A1
The invention relates to a coated cutting tool comprising a substrate of cemented carbide, cermet, cBN, ceramics or HSS, with a coating comprising a nitride layer which is a High Power Impulse Magnetron Sputtering (HIPIMS)-deposited laye...  
WO/2018/215558A1
Coated turbine component comprising a surface to be exposed to erosion at temperatures of 700 °C or more and a coating covering at least partially the surface, whereas the coating comprises a multilayered film formed of individual layer...  
WO/2018/215408A1
The invention relates to a method for producing a coated cutting tool comprising depositing a 0.5-10 µm nitride layer which is a nitride one or more of Ti, Zr, Hf, V, Ta, Nb, Si, Cr and Al, onto a substrate followed by depositing Al or ...  
WO/2018/214483A1
Disclosed is an evaporation device. The evaporation device comprises a workbench (900), an evaporation source (110) on the workbench, an inner layer plate (120) located on at least one side of the evaporation source (110) and fixedly con...  
WO/2018/214515A1
A support plate (10) for a vapor deposition device comprises: a substrate (1) comprising a groove (2) on one side of a surface of the substrate (1) for supporting a component to undergo vapor-deposition (20); and a cooling component (3) ...  
WO/2018/215413A1
The method relates to a process for preparing a nanomesh metal membrane (5) transferable onto a very wide variety of supports of different types and shapes, comprising at least one step of de-alloying (1) a thin layer (6) of a metal allo...  
WO/2018/214514A1
A metal mask strip fixing device and a metal mask preparation device comprising the metal mask strip fixing device are provided. The metal mask strip fixing device comprises a fixing device body (22), the fixing device body (22) comprise...  
WO/2018/215274A1
A feedback system (210) for controlling properties of a single layer or multiple layer stack being applied on a substrate (10) by means of a vacuum coating process controlled by a plurality of process controlling means, comprises - at le...  
WO/2018/210408A1
An apparatus (100) for processing a substrate is described. The apparatus includes a first vacuum processing arrangement (101), a second vacuum processing arrangement (102), and a support structure (103) arranged in an atmospheric space ...  
WO/2018/212481A1
The present invention relates to a method for manufacturing an anode for a lithium secondary battery comprising a patterned lithium metal. An anode for a lithium secondary battery manufactured according to the present invention can preve...  
WO/2018/209374A1
The invention relates to a method for improving the wear resistance of a highly loaded component provided with a corrosion protection layer, according to which a chemical nickel layer is deposited on the component as a corrosion protecti...  

Matches 101 - 150 out of 103,573