| Document |
Document Title |
|
WO/2024/052218A1 |
A target (2) for sputtering in mid-frequency AC sputtering processes, or DC sputtering processes, the target (2) comprising a target material layer (21) mainly comprising M-doped LixPOy, wherein x is from 2.5 to 3.5 and wherein y is from...
|
|
WO/2024/050571A1 |
The present invention relates to a method for preparing a substrate coated with an intermediate layer and a diamond layer, comprising the following steps: (a) roughening a surface of the substrate with an etchant, (b) coating the roughen...
|
|
WO/2024/051936A1 |
A closure for pharmaceutical preparations, a method for manufacturing closures for pharmaceutical preparations, and a rotary deposition apparatus for manufacturing closures for pharmaceutical preparations are provided. The closure for ph...
|
|
WO/2024/045517A1 |
A vacuum coating system (100), comprising a housing (1), a switch member (2), a feeding structure (3), and a coating structure (4). A feeding chamber (101) and a coating chamber (102) in communication with each other are formed in the ho...
|
|
WO/2024/045972A1 |
The present disclosure relates to the technical field of vapor deposition, and provides a vapor deposition mask, a vapor deposition apparatus and a vapor deposition method. The vapor deposition mask comprises a mask body and a plurality ...
|
|
WO/2024/048306A1 |
This coated tool has a base material and a hard coating film on the base material. The hard coating film has an A layer provided on the base material and a B layer provided on the A layer. The A layer is a nitride or carbonitride contain...
|
|
WO/2024/050202A1 |
The disclosed and claimed subject matter provides precursors having at least one tethered cyclopentadienyl ligand ("Cp ligand"), at least one amidinate ligand ("Ad ligand") and a lanthanide and/or lanthanide-like transition metal ("M") o...
|
|
WO/2024/048225A1 |
A sputtering target material made of a sintered object of an oxide comprising potassium, sodium, niobium, and oxygen, the sputtering target material having a density of 4.2 g/cm3 or less and a Vickers hardness of 30-200, wherein a plural...
|
|
WO/2024/047999A1 |
A film formation device according to the present invention is characterized by comprising: an electrostatic chuck 31 that absorbs the surface of a substrate S opposite the film formation-side surface thereof; a first support member 41 th...
|
|
WO/2024/048672A1 |
A coated tool according to the present disclosure comprises a substrate, a first coating layer, a second coating layer, and a third coating layer. The first coating layer contains Al, Ti, Cr, and N. The second coating layer includes a fi...
|
|
WO/2024/045748A1 |
Disclosed are a thin film deposition apparatus and a thin film deposition method. The thin film deposition apparatus comprises: a reaction container, which has a vacuum chamber, wherein a support capable of holding a substrate on a holdi...
|
|
WO/2024/048767A1 |
[Problem] To provide a crystal having excellent crystallinity and a laminate structure, and an element, an electronic device, an electronic apparatus, and a system using same. [Solution] Provided is a laminate structure in which an epita...
|
|
WO/2024/049800A1 |
Target assemblies for PVD chambers are provided herein. In some embodiments, a target assembly for a PVD chamber includes: a backing plate; and a target coupled to the backing plate and having a substrate facing surface opposite the back...
|
|
WO/2024/048664A1 |
This molybdenum sputtering target contains molybdenum. The molybdenum sputtering target contains crystal particles which have an average crystal particle diameter of less than 10μm, a relative density of 99.6% or higher, and an oxygen c...
|
|
WO/2024/048261A1 |
An ion bombardment device (1) has: a vacuum chamber (2); a base-material support part (11); a filament (3); a discharge power supply (22); a filament heating power supply (3T); and a magnetic-field generation mechanism (20). The filament...
|
|
WO/2024/048757A1 |
The coated tool according to the present disclosure comprises a base body and a coating layer. The coating layer contains a plurality of crystal grains. The plurality of crystal grains have a plurality of regions provided with mutually d...
|
|
WO/2024/048357A1 |
The present invention is a base substrate for a single crystal diamond multilayer substrate, said base substrate having an initial substrate that is one of a single crystal Si{111} substrate, a single crystal α-Al2O3{0001} substrate, an...
|
|
WO/2024/049771A1 |
Two-dimensional (2D) materials and their heterostructures show a promising path for next generation electronics. Nevertheless, there are challenges with (i) controlling monolayer (ML)-by-ML 2D material growth, (ii) maintaining single-dom...
|
|
WO/2024/048304A1 |
A coated tool comprising a base and a rigid coating film formed thereon. The rigid coating film is a nitride or carbonitride which contains Al and Cr in amounts of 70-90 atm.% and 10-30 atm.%, respectively, with respect to the total amou...
|
|
WO/2024/048954A1 |
A mask comprises: a body which has a length extended in a first direction, and in which defined are a plurality of first cell regions arranged in the first direction, each including a plurality of first holes, and a plurality of second c...
|
|
WO/2024/047995A1 |
This semiconductor device comprises: an amorphous substrate having an insulating surface; an orientation pattern located on the amorphous substrate; and a semiconductor pattern including gallium nitride and located on the upper surface o...
|
|
WO/2024/048768A1 |
[Problem] To provide: a laminated structure with excellent bending strength; an element; an electronic device; an electronic apparatus; and a system. [Solution] This laminated structure is constituted of at least a first layer and a seco...
|
|
WO/2024/048764A1 |
[Problem] To provide: a crystal having excellent crystallinity; a layered structure; and an element, an electronic device, an electronic apparatus, and a system that use the crystal and the layered structure. [Solution] This layered stru...
|
|
WO/2024/047216A1 |
The present invention relates to a method for producing a carrying structure (10) for carrying at least one functional unit (20), preferably for an optical device, in a reaction chamber (30), comprising: providing a liquid medium (40) fo...
|
|
WO/2024/049055A1 |
A deposition mask according to an embodiment comprises a metal plate including a deposition region and non-deposition regions. The deposition region includes at least one effective portion, and the at least one effective portion includes...
|
|
WO/2024/048765A1 |
[Problem] The present invention provides: a crystal which has excellent crystallinity; a multilayer structure; and an element, an electronic device, an electronic apparatus and a system, each of which uses the crystal and the multilayer ...
|
|
WO/2024/048766A1 |
[Problem] To provide a crystal having excellent crystallinity, a multilayer structure, and an element, an electronic device, an electronic appliance, and a system which are obtained using these. [Solution] An electroconductive crystal wh...
|
|
WO/2024/041825A1 |
A conductive substrate coated with compact lithium is described, wherein the substrate consists of sheet-like metals or sheet-like carbon-based materials, wherein on at least one side of the substrate a 1 to 5000 nm thick lithiophilic in...
|
|
WO/2024/041388A1 |
A top-down sublimation arrangement (1,100) for an evaporation system and use of it, at least comprising at least one heatable top-down sublimation crucible (10) having at least one sidewall (14), being fillable with evaporation material ...
|
|
WO/2024/042076A1 |
The invention relates to a coating method for depositing a coating system (S) on a substrate (1), wherein at least one HiPIMS layer (HS) and one DCMS layer (DS) are deposited on the substrate (1) by means of magnetron sputtering. In the ...
|
|
WO/2024/043560A1 |
A deposition mask according to an embodiment comprises a metal plate including a deposition area and a non-deposition area, wherein: the deposition area comprises at least one effective portion; the effective portion comprises a pluralit...
|
|
WO/2024/041353A1 |
Disclosed in the present application is a rotary cathode end head, comprising an end head housing, wherein a driving shaft is rotatably mounted in the end head housing by means of a bearing, and one end of the driving shaft penetrates ou...
|
|
WO/2024/039591A1 |
A method for nanoparticle fabrication deposits a seed layer of a transparent conductive oxide onto a substrate and deposits a layer of a plasmonic metal onto the transparent conductive oxide layer. The method forms nanoparticles from the...
|
|
WO/2024/039156A1 |
A razor blade according to an embodiment of the present invention comprises a substrate having a cutting edge formed at the tip thereof, wherein the thickness (T4) of the substrate as measured at a distance of 4μm from the tip has a val...
|
|
WO/2024/038862A1 |
This vapor deposition mask comprises: a first plate member equipped with a first inner surface having a first protruding section on the edge thereof; and a second plate member equipped with a second inner surface having a second protrudi...
|
|
WO/2024/039090A1 |
A deposition mask according to an embodiment comprises: a small surface hole including a metal plate including a deposition area and a non-deposition area, wherein the deposition area includes at least one effective area and a non-effect...
|
|
WO/2024/038674A1 |
Provided is an yttrium-based protective film having excellent plasma resistance and appearance. The yttrium-based protective film provided herein contains an yttrium oxide, has a porosity of less than 0.5 vol% and a Vickers hardness of...
|
|
WO/2024/039527A1 |
A system for depositing material over a sample in a localized region of the sample, the system including: a vacuum chamber; a thermal mass disposed outside the vacuum chamber; a sample support configured to hold a sample within the vacuu...
|
|
WO/2024/039091A1 |
A deposition mask according to an embodiment comprises a metal plate including a deposition region and a non-deposition region, wherein the deposition region includes at least one effective portion. The effective portion comprises a plur...
|
|
WO/2024/031958A1 |
A solar cell production device and a copper seed layer coating process and apparatus. Deposition of a conductive thin film is first completed in a first process chamber (100) to obtain a first base body; then, the first base body is full...
|
|
WO/2024/035664A1 |
A system may include a substrate and a coating deposited onto a surface of the substrate. The coating includes a carbon rich layer deposited on the substrate. The carbon rich layer is also characterized by a first carbon content includin...
|
|
WO/2024/034435A1 |
The present invention increases the usefulness of ECR plasma technology. A film formation device 1 causes ejected first target particles to be deposited by causing ions (ions constituting ECR plasma) to collide with a cylindrical target ...
|
|
WO/2024/034236A1 |
This alignment device comprises: a substrate support means for supporting a substrate; a mask support means for supporting a mask; a distance adjustment means for adjusting a distance between the substrate support means and the mask supp...
|
|
WO/2024/030562A1 |
A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a th...
|
|
WO/2024/027361A1 |
The present invention provides a film coating device and method capable of improving deep hole filling. The device comprises a cavity, a target material bearing disc, a magnetic control assembly, a base, and a corrector. The target mater...
|
|
WO/2024/029429A1 |
This laminate structure has an underlying insulating layer, a metal oxide layer disposed on the underlying insulating layer, and an oxide semiconductor layer disposed in contact with the metal oxide layer. The oxide semiconductor layer h...
|
|
WO/2024/027645A1 |
The present invention relates to the technical field of integrated black panel display devices, and provides an anti-reflection film, and a preparation method therefor and an application thereof. The anti-reflection film comprises a subs...
|
|
WO/2024/029221A1 |
This alignment apparatus performs alignment of a substrate and a mask using a substrate mark provided to the substrate and a mask mark provided to the mask. A plurality of detection means detect the substrate mark and the mask mark. A de...
|
|
WO/2024/026939A1 |
A polymer composite material and a preparation method therefor. The polymer composite material comprises a polymer base layer and a metal thin film layer arranged on the surface of the polymer base layer, wherein the material forming the...
|
|
WO/2024/024343A1 |
The present disclosure provides a powder surface film-forming device, which makes it possible to reduce the aggregation of a powder by disintegrating aggregates of the powder at a proper timing during the delivery of the powder when the ...
|
