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WO/2024/004226A1 |
A method for producing a transparent electroconductive film (3), in which a transparent electroconductive layer (2) is formed on one thickness-direction surface of a continuous substrate (1). The method for producing a transparent electr...
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WO/2024/005038A1 |
[Problem] The present invention addresses the problem of improving the adhesion between a first layer and a second layer in a substrate with a multilayer reflective film, the substrate having a protective film that comprises the first la...
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WO/2024/000569A1 |
Device for evaporation(100) of a coating material comprising a first material reservoir(10), a first pressure-and temperature-sealing metering device(11), a first transportation section(12), a second material reservoir(13), a second pres...
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WO/2024/004554A1 |
The present invention provides a tungsten target and a method for manufacturing the same that suppresses the occurrence of particle-causing pores, controlling the size and distribution thereof to high precision. The tungsten target is fo...
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WO/2024/000803A1 |
The present invention relates to a preparation method for a composite current collector, and a composite current collector. The preparation method for a composite current collector comprises the following steps: ionizing metal nickel to ...
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WO/2024/000893A1 |
The present application provides a mask, and a mask manufacturing method. The mask comprises a frame body, a plurality of first supporting strips, a plurality of shielding strips, and a plurality of mask strips; the first supporting stri...
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WO/2024/004501A1 |
In an embodiment, this film forming method comprises a first film forming step for forming a first film formed from an organic material on a substrate by using a mask and a second film forming step for forming a second film formed from a...
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WO/2024/004873A1 |
A coated cutting tool according to an embodiment of the present invention comprises a base material and a hard film formed on the base material. The hard film is a nitride in which, with respect to the total amount of metal elements (inc...
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WO/2024/003445A1 |
A method for forming a barrier deposit within a substrate comprising defects is disclosed. The method comprises introducing the substrate into a reaction space, wherein: - the substrate contains water and/or is exposed to water, and simu...
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WO/2024/006298A1 |
A method for reducing a wet etch rate of flowable chemical vapor deposition (FCVD) oxide layers in a semiconductor wafer, the method including performing a plasma doping operation on the semiconductor wafer using a primary dopant gas and...
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WO/2024/004502A1 |
This electronic device manufacturing method comprises: a first mask forming step for forming a first mask that is patterned by means of photolithography; a first film forming step for using the first mask to form a first light-emitting l...
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WO/2024/002713A1 |
The present invention relates to a method for producing a carbon coating on a metal substrate, the metal substrate being chosen from the group consisting of stainless steel, carbon steel, galvanised steel, copper and aluminium, which met...
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WO/2024/004600A1 |
The present invention addresses the problem of providing: a method for producing a laminate having excellent wear resistance; and a method for producing an eyewear lens. The method for producing a laminate according to the present invent...
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WO/2024/003603A1 |
A substrate processing system for processing of a plurality of substrates is described. The substrate processing system includes one or more vacuum chambers; at least a first deposition source and a second deposition source provided in t...
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WO/2023/247173A1 |
Set comprising a physical vapor deposition machine and an obstruction device. The physical vapor deposition machine comprises a vacuum container, an ion beam gun and a support member. The support member comprises at least one hole, the a...
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WO/2023/245883A1 |
Disclosed in the present application is a vacuum cavity, which comprises a cavity frame, a front cavity door assembly and a rear cavity door assembly, wherein the front cavity door assembly and the rear cavity door assembly are connected...
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WO/2023/245542A1 |
An energy-saving window film for an insulating glass unit, a preparation method therefor, and the use thereof, mainly relating to the field of functional film materials. The preparation method for the energy-saving window film for an ins...
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WO/2023/245882A1 |
The present application discloses a variable distance structure. The variable distance structure comprises a variable distance power assembly, a variable distance transmission assembly, a telescopic assembly and a butt-jointing assembly;...
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WO/2023/249244A1 |
Provided are a deposition apparatus and a deposition method using same. The deposition apparatus comprises: a mask including deposition openings; a mask frame supporting the mask, including a first portion, a second portion, a third port...
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WO/2023/246561A1 |
The present application relates to the semiconductor process technology. Disclosed in the present application are a semiconductor process apparatus and a bearing device therefor. The bearing device for the semiconductor process apparatus...
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WO/2023/247350A1 |
The invention relates to a method for coating a surface (2) of a trim component main body (1), in particular of a motor vehicle, comprising the following method steps: - providing (S2) the trim component main body (1) within a vacuum cha...
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WO/2023/249220A1 |
The present invention relates to a method for forming a tungsten (W) film in a semiconductor device, by using a physical vapor deposition (PVD) sputtering method on a semiconductor substrate, the tungsten film forming method comprising: ...
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WO/2023/249493A1 |
The invention relates to a process for deposition of single crystal-like silver thin films on a substrate and corresponding processing unit. The process involves a sputtering method for depositing silver on a substrate using a DC sputter...
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WO/2023/247443A1 |
The disclosure relates to a stencil mask, a method for manufacturing the stencil mask and use of the stencil mask in nanoscale device nanofabrication, including imprinting on substrates of deposition patterns for nanoscale devices. One e...
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WO/2023/246967A1 |
The invention relates to a coated tool, consisting of a main body and at least one single layer, or a lower layer of two layers, made of a metal nitride, deposited on said main body by means of physical vapour deposition (PVD). The inven...
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WO/2023/249814A1 |
A method of making an enhanced aluminium mirror for vacuum ultraviolet (VUV) optics includes depositing a reflective coating comprising aluminium metal to at least one surface of a substrate through physical vapor deposition (PVD) to pro...
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WO/2023/245858A1 |
Disclosed in the present invention is a method for improving the film-substrate bonding strength of a diamond-like carbon coating on a medical metal surface. The method comprises the following steps: processing a pretreated substrate sur...
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WO/2023/245884A1 |
Disclosed in the present application is a vacuum coating device, comprising a heating apparatus, a carrier apparatus, a special gas spray apparatus, and a processing chamber; the heating apparatus is configured to heat the processing cha...
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WO/2023/246731A1 |
A composite current collector, and a preparation method therefor and a use thereof, relating to the technical field of new materials. The composite current collector comprises a polymer substrate layer and a diamond-like carbon layer arr...
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WO/2023/245872A1 |
The present invention relates to the technical field of new materials, in particular to a composite current collector, and a preparation method therefor and the use thereof. The composite current collector comprises a polymer substrate l...
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WO/2023/241795A1 |
The present invention relates to a laser system (10) for evaporating and/or sublimating a material (124) of a source (120) located in a reaction chamber (110) of an evaporation system (100), the laser system comprising a laser light sour...
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WO/2023/242905A1 |
This apparatus for forming a hydroxyapatite-containing thin film comprises: a sputtering device for forming, on the surface of an object by sputtering, a thin film of a material containing an antibacterial metal and hydroxyapatite; and a...
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WO/2023/243566A1 |
Provided are: a gallium nitride sintered compact which is capable of forming a sputtering film at a faster film-forming speed than conventional gallium nitride sintered compacts created by hot pressing; an industrial method for producing...
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WO/2023/243008A1 |
Provided is a cutting tool that includes a base material and a coating film provided on the base material. The coating film includes a first layer. The first layer is constituted of a multilayer structure in which a first unit layer and ...
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WO/2023/240948A1 |
A pipeline integrated vector thrust measuring device and a vector thrust decoupling method, for use in solving the technical problems in traditional measuring devices of high rigidity of a propellant supply pipeline, low measurement prec...
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WO/2023/243174A1 |
Used is a substrate inspection device characterized by comprising: a support means for supporting a substrate; a photographing means for photographing the substrate supported by the support means; and a determination means for determinin...
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WO/2023/241992A1 |
The aim of the invention is to coat a mirror substrate (2) with a multilayer coating which is highly reflective to useful wavelengths and which comprises a plurality of individual layers to be sequentially applied. This is achieved in th...
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WO/2023/240682A1 |
The present disclosure relates to a target material in-situ monitoring method and system, and a computer device and a storage medium. A correspondence between voltage and current parameters collected when a target material and a sputteri...
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WO/2023/243007A1 |
This cutting tool comprises a base material and a coating provided on the base material, wherein: the coating includes a first layer; the first layer has a multilayer structure in which first unit layers and second unit layers are stacke...
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WO/2023/243109A1 |
[Problem] One purpose of the present invention is to provide a vapor generation material which enables the achievement of a vapor of a vaporizable substance stably with high efficiency, while suppressing outgas and splash. Another purpos...
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WO/2023/243635A1 |
The present invention provides a superconductor which is represented by formula (I) and has a perovskite crystal structure. (I): L(1-x)AxMn(1-y)MyO3 (In the formula (I), L represents one or more elements that are selected from among lant...
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WO/2023/237561A1 |
The present invention provides a graphene-containing laminate comprising, in order: a substrate; a graphene layer structure; a first metal oxide layer formed of a first metal oxide, wherein the first metal oxide is a transition metal oxi...
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WO/2023/239524A1 |
Embodiments relate to a method of forming a nanoporous thin film. The method can involve co-sputtering SiO2 and a sacrificial porogen to form a sacrificial porogen: SiO2 composite film onto a substrate. The method can involve annealing t...
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WO/2023/238534A1 |
A film formation simulation method according to an embodiment of the present disclosure includes a step for generating representative particles corresponding to incident radical flux, and calculating the attachment, desorption, migration...
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WO/2023/236135A1 |
The present invention relates to the technical field of material surface treatment, and provides a Gcr15 material surface strengthening treatment process and equipment. The present invention solves the problem that the anti-fatigue perfo...
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WO/2023/236344A1 |
A pixel array, a display panel and a metal mask. During the manufacturing of the pixel array, the spacing (Rr) between a red sub-pixel (100) and a red light evaporation opening (100') can be increased, thereby prolonging the service life...
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WO/2023/238478A1 |
Provided is a feature which makes it possible to perform highly accurate alignment by measuring more positions on a mask and a substrate. A film formation device for forming a film on a film formation surface of a substrate by using a ma...
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WO/2023/238479A1 |
The present invention provides: an alignment device which is capable of reducing the number of times of contact and separation of a substrate and a mask during alignment; a film forming apparatus; and an alignment method.　The present i...
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WO/2023/237938A1 |
A solvent layer is coated on a metal layer carried by a donor substrate, allowing the fabrication of solid metal lines at a high resolution. The laser jetting involves ejecting metal particles, constrained within a solvent membrane, from...
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WO/2023/232547A1 |
The invention relates to a flat metal product and a component made therefrom.
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