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WO/2012/020741A1 |
Provided is a method of light imprinting that helps prevent fine pattern molding defects and exposure irregularities from occurring during light imprinting work. The present invention comprises lowering a die pressing mechanism that rele...
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WO/2012/017530A1 |
Provided are: a photocurable composition which is capable of providing a cured product that has excellent environmental characteristics and excellent mold releasability and which exhibits excellent compatibility between a fluorine-contai...
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WO/2012/018043A1 |
This resin mold for nanoimprinting has a resin layer formed with fine irregularities on the surface, wherein the resin layer is formed from 1 to 49 parts by weight of a silicone-based macromonomer and/or a fluorine-based macromonomer, an...
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WO/2012/018045A1 |
Provided is a resin mold which is free from transfer defects, has a superior peeling property from a resin to be imprinted, and does not cause dropping of a release agent by the imprint. Disclosed is a resin mold comprising a resin layer...
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WO/2012/018048A1 |
The present invention addresses the problem of providing a resin mold for nanoimprinting that has excellent, transfer defect-free releasability with the resin to be imprinted, and does not produce defects due to imprinting. The present i...
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WO/2012/014869A1 |
The present invention is an imprint device and a transfer method therefor, whereby recess and projection shapes present on the surface of a stamper are transferred to transfer-receiving object by irradiating the transfer-receiving object...
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WO/2012/014962A1 |
A resin stamper (10) which is for use in nanoimprinting and which is provided with a microstructure layer (2) on a light -transmitting substrate (1), said microstructure layer (2) being made of a polymer prepared from a resin composition...
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WO/2012/014774A1 |
Disclosed is a manufacturing device for a nanoimprint mold, wherein said device anodises an aluminium substrate with electrolytic solution, and which is characterised in that at least the material on the surface of a portion which comes ...
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WO/2012/015634A2 |
A method and apparatus of thermal imprint lithography includes moving an imprinter against a surface to be imprinted, supplying energy to a layer of heating material, and forming features in the surface to be imprinted. The imprinter com...
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WO/2012/008686A2 |
A printing plate is provided comprising a substrate having a first surface and a second surface opposite to the first surface, and a resin layer having a plurality of printing patterns on the first surface of the substrate. A method of m...
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WO/2012/008343A1 |
The disclosed TiO2-containing quartz-glass substrate for an imprint mold has a principal surface and a side surface. The arithmetic-mean roughness (Ra) of the side surface is 1 nm or less and the root mean square of the frequency roughne...
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WO/2012/004175A1 |
A continuous plasma treatment process, said process comprising the steps of: providing a plasma treatment apparatus, said apparatus comprising at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes...
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WO/2012/006207A1 |
The present invention relates to a scratch-resistant micro- and/or nanostructured surface comprising a plurality of micro-scale and/or nano-scale surface elements, said surface being essentially unchanged when being subjected to 10 rubbi...
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WO/2012/002301A1 |
Disclosed is an apparatus for applying a liquid, which is provided with: a liquid jetting head, which is provided with a plurality of nozzles (120A-120C) that drop the functional liquid on a substrate, and liquid chambers (122A-122C) tha...
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WO/2012/002413A1 |
Disclosed is a composition for a photocurable imprint, which has good pattern transferring properties and good mold (pattern formation surface) release properties regardless of the type of a polymerizable monomer contained therein, and t...
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WO/2012/000500A1 |
The present invention solves numerous problems in state-of-the-art industrial polymer shaping of micro and nanostructures. The problems of high tool polishing requirements, the inability to define an arbitrary topographical structure on ...
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WO/2011/160772A1 |
In a method for producing a packaging container having at least one packaging laminate (10 A, 10 B) having at least three polymer layers, said packaging laminate having an inner layer (12 A, 12 B), which forms the inside of the container...
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WO/2011/161944A1 |
Disclosed is a process for producing a replica mold for imprinting use which is inexpensive and has good properties including strength and flexibility. The process for producing a replica mold comprises the following steps: (A) applying ...
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WO/2011/160939A1 |
A method of treating a surface of an object comprising a rubber material and in particular a bladder for use in a process for making a vehicle tyre. The method comprises subjecting the surface to a gas at a low pressure at which the gas ...
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WO/2011/162426A1 |
The present invention aims to realize a method of manufacturing thermoplastic polyurethane film without using release paper or release film. Preferably, uneven shapes can be formed in the surface of the film, which is extruded from a T-d...
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WO/2011/158714A1 |
A phenomenon where a rendered pattern becomes unclear due to rotational runout of a roller mold in the direction of a rotation axis is curbed while restraining an increase in the cost. For the purpose of achieving the above, a roller mol...
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WO/2011/155365A1 |
Provided is a molded article having surface irregularities, in which a fine shape comprising protrusions and depressions between the protrusions is formed over the entirety or a portion of the surface of a molded article formed by curing...
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WO/2011/155602A1 |
Disclosed is a substrate with an adhesion promoting layer, wherein an adhesion promoting layer is provided on a substrate and an organic compound layer is to be provided on the adhesion promoting layer. An adsorptive functional group and...
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WO/2011/155035A1 |
Disclosed is a transfer device (1) that transfers a pattern formed on a mold (200) to an object to which the pattern is to be transferred (300). The transfer device comprises a first stage (150a), a second stage (150b), a plurality of sh...
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WO/2011/155499A1 |
Disclosed is a method for producing an article having a fine recessed and projected structure on the surface, which comprises: the following step (I) and step (II): (I) a step wherein an active energy ray-curable resin composition for mo...
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WO/2011/155480A1 |
Provided is a method for producing an article having fine surface irregularities, with which it is possible to maintain releasability between a mold and a cured resin layer even with repeated transfer of the fine irregularities of the mo...
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WO/2011/155582A1 |
Disclosed is a stamper for microstructure transfer, which comprises a supporting base and a microstructure layer that is formed on the surface of the supporting base. The microstructure layer has a surface layer which contains a polymer ...
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WO/2011/156054A1 |
Methods and apparatuses (100) herein may provide for the application of viscous fluids, such as adhesives, in pre - determined patterns to an advancing substrate (106). The fluid application apparatus may include a slot die applicator (1...
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WO/2011/151904A1 |
Provided are method and device for producing a stereoscopic decoration piece wherein a bonding or adhesion strength of a lower layer material is not reduced. In a method for producing a stereoscopic decoration piece made of a thermoplast...
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WO/2011/151854A1 |
Disclosed is a roller unit wherein an axle box (6) is disassembled into a plurality of components, and at the time of disassembly, at least one component (6c) of the plurality of components (6) defines a rail function component which is ...
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WO/2011/149864A1 |
Microfluidic surfaces and devices are prepared by imparting a non-planar topography to the liquid flow surface.
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WO/2011/149194A2 |
The present invention relates to an imprint device and a method for imprinting using same. More particularly, the present invention relates to an imprint device, which can uniformly form a nano-pattern on an object to be printed, and a m...
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WO/2011/149004A1 |
Disclosed are a method and apparatus for producing a film having a fine surface structure, which comprises: a step wherein a film is intermittently supplied to a mold having a surface which is provided with grooves extending in two direc...
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WO/2011/147757A1 |
Super-hydrophobic and self-cleaning articles produced by imprinting exposed surfaces with suitable fine-grained and/or amorphous metallic embossing dies to transfer a dual surface structure, including ultra- fine features less than or eq...
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WO/2011/149777A1 |
A system and method for treating films. The method comprises steps of: providing a flexible film having a fist side and a second side; flame treating the first side of the flexible film; subsequently treating the first side with plasma. ...
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WO/2011/145610A1 |
Disclosed is an imprinting system which comprises: a substrate processing station for forming a first resist film on a substrate; a template processing station which comprises a mold release agent processing block for forming a film of a...
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WO/2011/145716A1 |
Disclosed is a method for forming a fine concavo-convex pattern on a substrate using a resin film, which can form the concavo-convex pattern accurately at a position at which the concavo-convex pattern is to be formed on the substrate ev...
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WO/2011/145607A1 |
Disclosed is an imprint system, comprising a substrate processing station for forming a first resist film on a substrate, an imprint processing station connected to the substrate processing station and provided with a plurality of imprin...
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WO/2011/145611A1 |
Disclosed is an imprinting system which comprises: a substrate processing station for forming a first resist film on a substrate; an imprinting station which is connected to the substrate processing station and provided with a plurality ...
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WO/2011/141996A1 |
Disclosed is a transfer device (1) for transferring a pattern formed on a mold (200a) to a transfer reception body (300), wherein the transfer device is provided with a first mold holding means (154a) which holds the mold by a first cont...
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WO/2011/141995A1 |
Disclosed is a transfer device (1) for transferring a pattern formed on a mold (200) to a transfer reception body (300), wherein the transfer device is provided with a mold holding means (154a) for holding a mold, a transfer reception bo...
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WO/2011/138958A1 |
A process for producing a functional device, comprising the following steps in this order: a functional solid material precursor layer formation step of applying a functional liquid material on a base material to form a layer of a precur...
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WO/2011/139604A1 |
A strap having increased column stiffness includes a leading edge and a trailing edge forming a length of the strap, a first outer edge and second outer edge defining a width of the strap, and a first side and a second side defining a th...
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WO/2011/139593A1 |
A method of making a nanostructure is provided that includes applying a thin, random discontinuous masking layer (105) to a major surface (103) of a substrate (101) by plasma chemical vapor deposition. The substrate (101) can be a polyme...
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WO/2011/073193A9 |
The invention concerns a method for antiseptic processing of the surface of a product made of organosilicon rubbers with molecular weight 2⋅105-6⋅105, said method consisting in a two stages formation of an antiseptic coating on said ...
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WO/2011/126131A1 |
The issue is to form a high-definition pattern having good etching resistance with good mass productivity by use of an imprinting technique. A resist layer (20m) is formed on a substrate (10), the resist layer (20m) comprising a resist c...
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WO/2011/126101A1 |
Provided is a curable composition for imprints excellent in pattern transferability. Disclosed is a curable composition for imprints comprising a polymerizable monomer (A) and a polymerization initiator (B), which is substantially free f...
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WO/2011/126044A1 |
Provided is a method for producing an article having a microrelief structure on the surface thereof, wherein a microrelief structure on the surface of a roll-shaped mold, the surface of which has been treated by release agent, is transfe...
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WO/2011/125970A1 |
Disclosed is an active energy ray-curable resin composition which contains: 70-95 parts by mass of a polyfunctional monomer (A) having a surface free energy of at least 37mJ/m2 when cured; and 5-30 parts by mass of a fluorine-based (meth...
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WO/2011/125800A1 |
Disclosed is a curable composition for nanoimprint, which contains (A) a polymerizable compound, (B) a fluorine atom-containing polymer and (C) a radical generator. It is preferable that the content of the fluorine atom-containing polyme...
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