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WO/2020/261752A1 |
One problem addressed by the present invention is to provide a method for producing an active light sensitive or radiation sensitive resin composition which is capable of forming a pattern that is suppressed in defects. Another problem a...
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WO/2020/262628A1 |
[Problem] To provide a polishing composition that is for use in CMP polishing and that makes it possible to minimize the occurrence of defects. [Solution] A polishing composition containing silica particles, a nitrogen-containing organic...
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WO/2020/262496A1 |
The present invention provides an acrylic rubber composition which contains an acrylic rubber and a specific anti-aging agent, wherein: the acrylic rubber contains from 15% by weight to 55% by weight of a methacrylic acid alkyl ester mon...
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WO/2020/261886A1 |
An ultraviolet ray absorber represented by general formula (1) and a use therefor. In general formula (1), R11 represents a monovalent substituent group. n is 1 or 2. W1 and W2 each independently represent a hydrogen atom, a cyano group,...
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WO/2020/258707A1 |
Provided is a method for improving hygroscopic-state braking performance of a microporous friction material, comprising adding a hydrophobic agent into the components for preparing the microporous friction material, the microporous frict...
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WO/2020/262211A1 |
A synthetic grinding stone (100) for chemical mechanical grinding of a wafer W according to the present invention comprises: a polishing agent (101) which is mainly composed of fumed silica that has a chemical mechanical grinding action ...
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WO/2020/262495A1 |
Provided is an acrylic rubber including 20-35% by weight of an ethyl methacrylate unit (a), 0-20% by weight of an ethyl acrylate unit (b), 50-75% by weight of an n-butyl acrylate unit (c), and 0.5-4% by weight of a carboxyl group-contain...
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WO/2020/255279A1 |
Provided is a friction material composition that can obtain an excellent friction coefficient during repeated normal braking and has excellent stability of the friction coefficient by using a material having little environmental load and...
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WO/2020/255582A1 |
The present invention addresses the problem of providing a polishing liquid which is less likely to cause dishing on a surface to be polished of an object to be polished after polishing if applied to CMP of an object to be polished havin...
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WO/2020/255616A1 |
The present invention provides a polishing liquid that has good polishing speed and is capable of suppressing the occurrence of corrosion and scratches on the polishing surface, when applied to CMP of a body to be polished that has a cob...
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WO/2020/255579A1 |
Provided are a release agent for polymer compounds, an adhesive material, and a method for using an adhesive material, wherein the release agent can be used for releasing as many types of polymer compounds as possible, and the burden req...
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WO/2020/256932A1 |
Embodiments of the present disclosure generally relate to planarization of surfaces on substrates and on layers formed on substrates. More specifically, embodiments of the present disclosure relate to planarization of surfaces on substra...
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WO/2020/255964A1 |
Provided is an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. Provided are: a resist film and a pattern forming method which use the actinic ray-sensitive...
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WO/2020/255603A1 |
The present invention provides a polishing liquid that, when applied to chemical-mechanical polishing (CMP) of an item to be polished, said item having a cobalt-including film, can produce semiconductor products that have superior reliab...
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WO/2020/255585A1 |
The present invention provides a method for purifying a compound that generates an acid when irradiated with active light or radiation, said method being capable of reducing the content of metal impurities, while having excellent recover...
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WO/2020/255581A1 |
The present invention addresses the problem of providing a polishing fluid which, when applied to chemical mechanical polishing (CMP) of a work having a cobalt-containing film, is less apt to make the polished surface of said work have e...
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WO/2020/255862A1 |
Provided are: a chemical-mechanical polishing composition containing an aqueous carrier and at least one compound selected from the group consisting of an abrasive, a basic component, a quaternary polyammonium salt, a quaternary ammonium...
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WO/2020/255602A1 |
The present invention provides a polishing solution that, when employed for CMP of an article to be polished that has a cobalt-containing film, hinders the occurrence of dishing on the surface to be polished of the polished article and a...
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WO/2020/256146A1 |
The present invention provides a composition which contains a fluoroethylene having one or more fluorine atoms, said fluoroethylene exhibiting excellent stability. A fluoroethylene composition according to the present disclosure contai...
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WO/2020/255921A1 |
A polishing composition is provided with which a work can be polished with reduced force of friction therewith at a satisfactory polishing rate. The polishing composition provided by the present invention comprises water, abrasive grains...
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WO/2020/255561A1 |
This water repellent agent composition which contains (A) an organopolysiloxane compound represented by average structural formula (1) is capable of providing a coating agent that uses an active energy ray-curable resin with high water r...
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WO/2020/255841A1 |
The present invention involves a mixture composition comprising an organosilicon compound (A) represented by formula (a1), an organosilicon compound (B) represented by formula (b1), and a curing inhibitor (C) and a mixture composition co...
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WO/2020/255741A1 |
The present invention addresses the problem of providing: a hydrophilic metal-surface treatment agent which can impart water repellency to metal surfaces to inhibit the metals from corroding or discoloring; a method for treating a metal ...
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WO/2020/251028A1 |
The present invention provides a sealing sheet having a thermosetting sealant layer, the sealing sheet being characterized by satisfying a requirement (I), a requirement (II), and a requirement (III). A sealing sheet according to the pre...
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WO/2020/250560A1 |
Provided are: a hydrophilization treatment agent; and a method for forming a hydrophilic coating film, which are capable of forming a coating film which has excellent hydrophilicity and water droplet removal properties and can maintain t...
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WO/2020/252490A1 |
Disclosed is a composition having: an organosilane polymer, a polyamide polymer; and an abrasive aggregate. The organosilane is made by: reacting an amino-functional alkoxysilane with one or more polyisocyanates to form one or more adduc...
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WO/2020/251056A1 |
Provided is a compressed member that is for an electrochemical device and that is obtained by crosslinking a crosslinkable composition containing a fluorine-containing elastomer, wherein a difference δG' (G' (100°C) - G' (180°C)) betw...
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WO/2020/250570A1 |
This acrylic rubber is a copolymer provided by the copolymerization, as a crosslinkable comonomer, of 1-3 wt% in the copolymer of a monoalkyl fumarate ester monomer having a C1-8 alkyl group, and the copolymerization of n-butyl acrylate,...
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WO/2020/249751A1 |
The present invention relates to an epoxy composition including – a waterborne hardener component containing an amine functional adduct, which is a reaction product of at least one polyether amine, at least one polyalkylene amine, at l...
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WO/2020/246607A1 |
The present disclosure addresses the problem of providing a composition, preferably a composition for forming a liquid-repellent film. The problem is solved by a composition containing: [1] a polymer constituting a water-repellent compon...
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WO/2020/246847A1 |
The present application relates to a composition for encapsulating an organic electronic device, and an organic electronic apparatus including same, and provides a composition for encapsulation and an organic electronic apparatus includi...
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WO/2020/246310A1 |
[Problem] To provide an organosilane that acts as a surface treatment agent having excellent coatability, adhesion, and surface hardness with respect to a substrate, and that further provides a coated article having excellent adhesion an...
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WO/2020/245994A1 |
A polishing solution containing: abrasive grains that include a metal oxide; at least one hydroxy acid compound selected from the group consisting of hydroxy acids having the structure expressed in formula (A1), and salts thereof; and wa...
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WO/2020/247423A1 |
A composition including 2-chloro-3,3,3-trifluoropropene (1233xf), one or more of 2,3-dichloro-1,1,1-trifluoropropane (243db), 1,2-dichloro-3,3,3-trifluoropropene (1223xd), 2,3-dichloro-3,3-difluoropropene (1232xf), 2,2,3-trichloro-1,1,1-...
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WO/2020/243835A1 |
The present application provides a method for the preparation of sugar-modified siloxane oligomers or polymers that one their own, or after dilution in an appropriate solvent, become shear thickening and energy dissipating.
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WO/2020/245904A1 |
This polishing solution for CMP contains a liquid medium and abrasive grains containing silica, wherein the contained amount of the abrasive grains with respect to the total amount of the polishing solution is 1.0 mass% or more, and, in ...
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WO/2020/246506A1 |
Provided is a sealant material composition that is configured such that the sealant flowing as a result of vehicle running is suppressed while an excellent sealing property is ensured. This sealant material composition for use as a mater...
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WO/2020/246471A1 |
This polishing solution for CMP contains a liquid medium and abrasive grains containing silica, wherein the contained amount of the abrasive grains with respect to the total amount of the polishing solution is 1.0 mass% or more, and, in ...
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WO/2020/246505A1 |
Provided is a sealant material composition that is configured such that the sealant flowing as a result of vehicle running is suppressed while an excellent sealing property is ensured. This sealant material composition for use as a mater...
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WO/2020/246964A1 |
An abrasive composition comprising a substrate selected from the group consisting of a fibrous substrate, a sponge substrate, and combinations thereof and a plurality of calcium carbonate particles dispersed therein; wherein at least a p...
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WO/2020/238083A1 |
Disclosed by the present invention is a solvent-resistant antistatic film, comprising a substrate layer, a first antistatic coating and a second antistatic coating. The first antistatic coating and the second antistatic coating are locat...
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WO/2020/241750A1 |
The present invention provides a base material with a water repellent oil repellent layer, which comprises a water repellent oil repellent layer having excellent fingerprint removal properties. A base material with a water repellent oi...
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WO/2020/239593A1 |
The invention relates to a silyl terminated prepolymer and to a curable composition containing this prepolymer. These compositions are used to make sealants, coatings or adhesives useful in the field of construction, public works and civ...
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WO/2020/239595A1 |
The invention relates to an amine terminated prepolymer and to a curable composition containing this prepolymer. These compositions are used to make sealants, coatings or adhesives useful in the field of construction, public works and ci...
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WO/2020/239596A1 |
The invention relates to a prepolymer comprising α,β-unsaturated carbonyl groups and to a curable composition containing this prepolymer. These compositions are used to make sealants, coatings or adhesives useful in the field pof const...
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WO/2020/241282A1 |
The present invention provides a surface treating agent containing: at least one fluoropolyether group-containing compound represented by formula (1) or (2) [in the formulae, each symbol has the same meaning as described in the specifica...
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WO/2020/241529A1 |
The present invention addresses the problem of providing a compound of high photobase generation efficiency. The present invention is a carbamoyl oxime compound represented by general formula (I). (In the formula, A represents an aroma...
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WO/2020/241122A1 |
The surface-modified glass 1 is equipped with a glass 2 and a silicate film 3 provided on the surface of the glass 2. The glass 2 contains at least one polyvalent metal ion, and the silicate film 3 contains a polyvalent metal ion in comm...
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WO/2020/241755A1 |
Provided is a thermoplastic resin composition comprising: a thermoplastic resin; and a composite particle having a particle surface to which a polymer graft chain is bonded. The thermoplastic resin composition of the present invention ca...
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WO/2020/239594A1 |
The invention relates to an amine terminated prepolymer and to a curable composition containing this prepolymer. These compositions are used to make sealants, coatings or adhesives useful in the field of construction, public works and ci...
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