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WO/2023/170438A1 |
The invention relates to a photoactivable hybrid organic-inorganic sol-gel resin comprising : a) A sol-gel resin obtainable by a method comprising the steps of : ai) Hydrolyzing at least one sol-gel precursor, said sol-gel precursor comp...
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WO/2023/171370A1 |
Provided is a composition for pretreatment which is applied to a semiconductor substrate before a protective film is formed on the semiconductor substrate by means of a protective film-forming composition, the composition for pretreatmen...
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WO/2023/168892A1 |
An optical detection device and a detection method. The optical detection device comprises an optical assembly, a vacuum cavity assembly, and a motion platform assembly; the optical assembly comprises a light source device, a reflector (...
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WO/2023/171739A1 |
The present invention employs a resist composition that contains a resin component that has a structural unit derived from a compound represented by general formula (a0-1). In the general formula, Rm is an alkyl group, a halogenated alky...
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WO/2023/171527A1 |
This resist composition contains a resin component (A1) having a constituent unit (a01) and a constituent unit (a02). In the formulas, W01 and W02 are groups containing polymerizable groups. Ya01 and Ya02 are single bonds or divalent lin...
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WO/2023/172228A2 |
A photolithography method characterized by steps of providing a target phase, transmitting a beam from an EM radiation source (9) to a spatial light modulator (3) and the beam reflected from the spatial light modulator (3) to a sample (5...
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WO/2023/170132A1 |
The present invention relates to a radiation curable screen printing composition for cast-curing comprising one or more compounds comprising radiation curable groups, one or more photoinitiators and one or more rheology modifying agents,...
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WO/2023/169806A1 |
Methods, software, and systems are disclosed for predicting a failure rate for a design layout. The predicting can include obtaining an image of the design layout in a lithography process. Derivatives of the image intensity at select loc...
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WO/2023/169818A1 |
Disclosed is a method of correcting a measured spectrum for the effects of a source spectrum resulting from an illumination source. The method comprises obtaining a measured spectrum in terms of a measurement parameter, the measured spec...
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WO/2023/169802A1 |
Disclosed herein is a substrate support arrangement suitable for an EUV exposure process, the substrate support arrangement comprising: a substrate support arranged to support a substrate; and a power supply arrangement configured to gen...
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WO/2023/171487A1 |
Provided is a photosensitive resin composition including a liquid-repellent material (A), an alkali-soluble resin (B), and a photosensitizer (C), wherein the liquid-repellent material (A) contains the components (A-1) and (A-2) described...
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WO/2023/172523A1 |
A computing device including a display screen is at a photolithography exposure facility. The facility includes one or more photolithography exposure apparatuses. The computing device is configured to display on the display screen: a sta...
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WO/2023/170021A1 |
Provided are an electronic device manufacturing solution, a method for manufacturing a resist pattern, and a method for manufacturing a device.
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WO/2023/169352A1 |
The present application relates to a benzophenone derivative, a method for preparing same, and use thereof. The benzophenone derivative has a structure represented by formula (1), formula (2), or formula (3). Compared with EMK, the bis(d...
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WO/2023/172404A1 |
A rollable laser phosphor display comprises a plurality of elongated sections. An elongated section of the plurality of elongated sections includes a color converter sheet and a plurality of light sources. A cover sheet extends across th...
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WO/2023/165814A1 |
The invention relates to a method for machining a workpiece (17) in a machining process, preferably in a photolithographic structuring process, wherein the machining of the workpiece (17) comprises a control of the temperature of the wor...
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WO/2023/165914A1 |
[Problem] An ion implantation thick film resist composition is provided. [Means for Solution] An ion implantation thick film resist composition comprising a polymer (A) having a certain structure, a photoacid generator (B) and a solvent ...
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WO/2023/164793A1 |
The present invention relates to the technical field of display, and provides a display substrate and a manufacturing method therefor, and a display device. The manufacturing method for the display substrate comprises: forming a metal la...
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WO/2023/165783A1 |
An apparatus for measuring a parameter of a structure related to a semiconductor manufacturing process. The apparatus comprises a source assembly configured to provide measurement radiation having one or more first wavelengths for irradi...
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WO/2023/165985A1 |
The present disclosure describes optical structures and methods for manufacturing the optical structures. In some implementations, a method includes imprinting a multi-level structured surface of a tool into an imprint material that is d...
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WO/2023/167695A1 |
A method of semiconductor metrology includes patterning a film layer on a semiconductor substrate to define a first field on the semiconductor substrate with a first pattern comprising at least a first target feature within a first margi...
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WO/2023/165823A1 |
An inspection apparatus includes a radiation source, an optical system, and a detector. The radiation source is configured to generate a beam of radiation. The optical system is configured to receive and direct the beam along an optical ...
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WO/2023/166020A1 |
A method for imaging a mask layer (12), comprising the steps: provision of a mask layer (12), receiving an image file (18) and detecting at least one solid area (20) and at least one halftone area (22) in the image file (18); imaging an ...
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WO/2023/165919A1 |
A method and apparatus for processing a lithographic printing plate precursor, comprising development with a first gum solution and subsequently with a second gum solution, wherein both gum solutions are provided in a cascade configurati...
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WO/2023/165767A1 |
Embodiments of present invention provide a method of forming an extreme ultraviolet (EUV) mask. The method includes subliming a radiation-sensitive material onto a surface of an EUV blank substrate; exposing the radiation-sensitive mater...
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WO/2023/165837A1 |
A reticle stage for a lithographic apparatus is disclosed. The reticle stage comprises a support for a reflective reticle, and at least one shielding element coupled to the support. The at least one shielding element is selectively confi...
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WO/2023/162574A1 |
Provided are: a composition capable of forming a film that exhibits excellent storage stability, excellent spectral characteristics, and excellent light resistance and moisture resistance; a film; an optical filter; a solid-state imaging...
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WO/2023/163008A1 |
This resist composition contains a resin component (A1) having constituent unit (a01) expressed by formula (a0-1) and constituent unit (a10) expressed by formula (a10-1). R and Rx1 represent a hydrogen atom or the like; Y01, L01, and Yax...
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WO/2023/162687A1 |
Provided are: a resin composition having excellent storage stability and excellent chemical resistance of the resulting cured article; a cured article obtained by curing the resin composition; a laminate including the cured article; a me...
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WO/2023/162718A1 |
Provided is a resin composition comprising a component (A) comprising at least one polymeric compound selected from the group consisting of polyamide, polyimide, polyamideimide and polybenzoxazole, a component (B) comprising a cationical...
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WO/2023/160924A1 |
Disclosed is an optical arrangement for reflecting pulsed radiation, comprising: an optical retarder and optical reflector. The optical retarder comprises a first axis coinciding with a first linear polarization state and a second axis, ...
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WO/2023/162889A1 |
The purpose of the present invention is to provide: a polymer which has a high development rate, can form a fine pattern, and can provide a cured product having excellent fine wire adhesion; and a photosensitive resin composition contain...
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WO/2023/160925A1 |
A system for cleaning contamination particles from a clamp of a lithography apparatus is described. The system includes a body configured to be inserted into the lithography apparatus, engaged by a tool handler of the lithography apparat...
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WO/2023/162905A1 |
A resin composition comprising a precursor of a cyclization resin, a base generator having a structure which generates a basic compound by the action of at least one of light, heat, an acid, and a base and having two or more polymerizabl...
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WO/2023/164090A1 |
Systems and methods for performing 3D photoresist profile generation for a semiconductor device fabrication environment are discussed. The methods comprise receiving in a virtual fabrication environment a top contour mask and a bottom co...
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WO/2023/163271A1 |
The present invention relates to a probe head for testing semiconductor elements, the central technical feature being a low-friction probe head comprising: a probe; a block provided with a receiving hole in which the probe is received; a...
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WO/2023/163111A1 |
The present invention addresses the problem of providing a polyether resin having exceptional dielectric characteristics. The solution to the problem addressed by the present invention is a polyether resin having a repeating unit represe...
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WO/2023/163209A1 |
The purpose of the present invention is to provide: a cured product which is obtained by optically and thermally curing a curable resin composition and exhibits optical characteristics such as a high total light transmittance, a low haze...
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WO/2023/162552A1 |
Provided is a chemically amplified positive photosensitive composition which forms a pattern to serve as a template in a process for creating a plated article on a substrate which comprises a metal layer on the surface thereof, said comp...
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WO/2023/163516A1 |
Provided are a curable composition, a film manufactured using same, and a display device comprising same, the composition comprising: (A) semiconductor nanorods; (B) a photo-curable monomer containing a compound having an unsaturated car...
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WO/2023/162565A1 |
Provided are: an actinic-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent CDU in ultrafine pattern formation, and capable of forming a pattern having excellent CDU even after time has p...
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WO/2023/160896A1 |
First and second novel membranes for use in a lithographic apparatus are disclosed. The first membrane comprises a core substrate and a metal silicate layer. The metal silicate layer is an outermost layer of the first membrane. The secon...
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WO/2023/162836A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (P) which can be decomposed by the action of an acid to increase the polarity thereof and a compound (Q) represented by a...
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WO/2023/162837A1 |
The present invention provides: a positive active-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin having repeating units (a) represented by a specific general formula (a) and (B) a compound that produces aci...
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WO/2023/160935A1 |
A sample inspection tool is described. The inspection tool includes a light source configured to produce effective inspection radiation below 200nm, a sample holder, an imaging sub-system containing sub-system components that delivers li...
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WO/2023/162762A1 |
Provided are: an actinic-ray-sensitive or radiation-sensitive resin composition; a resist film; a pattern forming method; and an electronic device manufacturing method, wherein the resist film, the pattern forming method, and the electro...
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WO/2023/162551A1 |
The present invention provides a method for producing a plated shaped article, wherein: footing of a pattern is suppressed when the pattern, which is used as a mold for the formation of a plated shaped article, is formed using a photosen...
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WO/2023/162907A1 |
This resist composition includes a base component (A) and a compound (B0) represented by general formula (b0). In the formula, Ar0 is an arylene group or a hetero arylene group. Rm1 and Rm2 are substituents other than an iodine atom. L01...
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WO/2023/162838A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A) having repeating units (a) represented by a specific general formula (a); an active-ray-sensitive or radiation-sensit...
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WO/2023/162653A1 |
[Problem] To provide a resist underlayer film formation composition having thermal resistance for use in a lithography process in semiconductor device production. [Solution] Provided is a resist underlayer film formation composition that...
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