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Matches 501 - 550 out of 3,177

Document Document Title
JP2016510425A
At least one mirror device (200) which has a plurality of mirror elements of each other because of the object of changing the angular distribution of the light in which the present invention was reflected by the mirror device which can b...  
JP2016510142A
The projection lens for imaging the pattern arranged in the object plane (OS) of a projection lens using the electromagnetic radiation line which has the operating wavelength of lambda< 260 nm at the image plane has a plurality of optica...  
JP2016045306A
To provide a light flux control member that is used in plane light source devices suppressing luminance unevenness and high in light utilization efficiency.A light flux control member has: a first incidence plane 151; a second incidence ...  
JP2016042124A
To provide a lighting device capable of changing the beam angle distribution of illumination light while restraining loss in the quantity of light.A lighting device comprises: a light source 2 that emits light; a multiple reflection elem...  
JP2016042122A
To provide a lighting device capable of changing the beam angle distribution of illumination light while restraining loss in the quantity of light.A lighting device comprises: a light source that emits light; a multiple reflection elemen...  
JP2016509691A
A system constituted so that a radiation beam might be projected on a target portion of a substrate in a lithography device is indicated. A system is provided with a mirror and a controller. A mirror has an actuator for constituting shap...  
JP2016042125A
To provide a diffusion lens that suppresses sensitivity to changes in illuminance as well as suppresses degradation in optical performance caused by unnecessary light and decrease in releasability in the process of molding the lens.An em...  
JP5892499B2  
JP5888622B2  
JP2016039258A
To provide an optical device advantageous in adjustment of optical performance through an aperture stop.An optical device 100 includes: an aperture stop 3 including a first member 3a and a second member 3b each having two facing end part...  
JP2016039429A
To provide a projector whose type is to serially arrange two spatial modulation elements, and which can suppress the occurrence of moire by controlling a boundary between a bright portion and a dark portion in an image plane of an image ...  
JP2016035593A
To provide an illumination optical apparatus and an exposure apparatus which can contribute to increase in manufacture efficiency of a device with increase in an output of a light source, even when a spatial light modulation member is di...  
JP2016035999A
To provide a light source device which is advantageous in terms of utilization efficiency of a light flux radiated from the light source.A light source device 100 includes a light source 1 for radiating a light flux from a light emission...  
JP5884743B2  
JP5884871B2  
JP5881221B2  
JP5878169B2  
JP2016031403A
To improve light utilization efficiency with a small-sized configuration.An illumination optical system 20A illuminating a liquid crystal panel 40 modulating light from a light source unit 10 with the light, includes, in order from a lig...  
JP5872639B2  
JP5868492B2  
JP5867576B2  
JP5863974B2  
JP5861897B2  
JP2016026306A
To provide an illumination optical device capable of forming a zonal illumination pupil distribution in a circumferential polarization state while satisfactorily suppressing light quantity loss.Provided is an illumination optical device ...  
JP2016504631A
It is related with an EUV mirror which carries out two or more owners of the layer pair of a mutual layer which the present invention is provided with multilayered constitution applied on a substrate and the substrate, and the multilayer...  
JP5854082B2  
JP5854103B2  
JP5854107B2  
JP2016025316A
To provide a technique for suppressing ununiformity of lighting due to a light source with a small number of optical elements.An illumination optical element 3 irradiates a predetermined area A1 of an illuminated surface, i.e., a sample ...  
JP2016021526A
To provide an illumination optical device for forming the shape of the image of a secondary light source into a desired ring shape or a circular shape, while suppressing the loss of a light quantity.An illumination optical device 100 inc...  
JP5849727B2  
JP2016502684A
The illumination-light study unit for EUV projection lithography has the 1st facet mirror and the 2nd facet mirror to which each has a plurality of reflective facets on a base material. The facet of the 1st facet mirror can be switched a...  
JPWO2013179977A1
照明装置(IU)は、第1の光源部(21a )と、第1の光源部と光の出射方向が異なる 第2の光源部(21b)と、第1の光源部か らの光と第2の光源部からの光の進行方...  
JP2016502136A
An EUV collector (15) functions as transmitting EUV radiation (14) from an EUV radiation source (3) in a lighting long-sight field (17a). A collector (15) has at least one Normal mirror collector subunit (23) containing at least one mirr...  
JP2016502233A
Lighting installation 1 has housing 3 provided with luminescence window 5 and antenna reflector 7 of the side opposite to the above-mentioned luminescence window. Light transmittance state plane carrier 9 is allocated between the above-m...  
JP5845684B2  
JP2016009014A
To provide an illumination device capable of projecting an image that is bright and high in chromatic purity.An illumination light source device according to the present invention comprises: a phosphor 5 which is irradiated by light from...  
JPWO2013179961A1
光伝達損失を低減しつつ、発光素子のビーム の断面形状を整形する。内視鏡用の光源装置 (13)には、レーザダイオード(LD2) を有する発光素子部(71)と、ビーム...  
JP2016500838A
An EUV optical apparatus is provided with Miller (22x) in whom many regulation is possible on the Miller main part (120). Each mirror main part is supported on an actuator (100x) provided with moving parts (132, 134, 136) and a fixed cas...  
JP5842615B2  
JP5843905B2  
JPWO2013164923A1
撮像用の補助光として適した配光を有する補 助光源ユニット用の光学素子であって、小型 を保ちつつ、十分な光量を確保し、製造が容 易で低コストである光学素子及びそれを...  
JP5835828B2  
JP2015230354A
To provide a light source device that can improve the efficiency of use of light and reduce the size thereof, and efficiently cool a wavelength conversion element.A light source device includes: a light emitting element that emits excita...  
JPWO2013157249A1
【課題】6枚構成の投写用レンズにおいて、 小さなFナンバー、広角、諸収差の良好な補 正、高性能を実現する。【解決手段】投写用 レンズは、拡大側から順に、縮小側に凹...  
JPWO2013150752A1
映像表示装置は、光源と表示素子と照明プリ ズムと接眼光学系とを有する。光源は照明光 を射出する。表示素子は照明光を変調して映 像光として射出する。照明プリズムは光...  
JP2015223462A
To reduce speckle noises by a further simple method.The lighting system includes: at least one laser light source exiting laser beams; a coupling optical system for coupling the laser beams exited from the laser source, with optical fibe...  
JP2015534654A
the present invention -- light source; condenser [of an optical beam] (5) ; -- it is an optical equalization system (4) containing at least one micro lens array (L3, L4), and an image focal point side of an optical equalization system is...  
JP2015534123A
How to operate a micro lithography device, The stage of giving the illumination system (20) in which the optical irradiance distribution on an array contains the array (34) of the mirror (M) which can be inclined which changes only at le...  
JP2015534130A
A lighting system of a micro lithography projection aligner is provided with an optical integration machine (70), and an optical integration machine (70) contains the 1st optical raster plate (74) and the 2nd optical raster plate (76). T...  

Matches 501 - 550 out of 3,177