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Patent Searching and Data


Matches 501 - 550 out of 3,322

Document Document Title
JP5994970B2  
JP2016167024A
[Subject] A shadow cast over exposure light by a member of a light source part provides art advantageous to reducing influence which it has on image formation performance. [Means for Solution] An illumination-light study system which ill...  
JP2016528526A
基準構造体(250、400、500)と、 自己保持型アクチュエータである第1アクチ ュエータ(205)を用いて基準構造体(2 50、400、500)に対して作動可...  
JP5991256B2  
JP5984013B2  
JP5983689B2  
JP5983966B2  
JP2016162754A
[Subject] Even if it is irradiated with many light sources at a mutually different angle and superposition of a beam pattern is made, a luminescent device for vehicles with which matching of a beam pattern can be made to be made is provi...  
JP2016162731A
[Subject] Absorption of light in the end face by the side of incidence of a shading object which constitutes a louver is controlled, and a field-like lighting installation which can raise luminosity is provided. [Means for Solution] Ligh...  
JP2016162575A
[Subject] Though afocal magnification is low, a bundle of rays can be extracted thinly and small light equipment is provided. A projector provided with a lighting installation provided with the above-mentioned light equipment and the lig...  
JP2016157096A
[Subject] A lighting installation which can obtain illumination light more efficiently is provided. [Means for Solution] It has light source 10 and light tunnel 14, and constitutes lighting installation 1 used for a projection display et...  
JP2016526258A
本発明は、レーザー光源(300)、波長変 換光源、合成光源及び投影システムに関する 。当該レーザー光源は、レーザー素子アレイ と、集光光学素子(33)と、コリメー...  
JP5979793B2  
JP2016154141A
[Subject] A lighting installation etc. which can reduce luminosity unevenness in illumination light are provided. [Means for Solution] A lighting installation is provided with the following. A light source part containing a laser light s...  
JP2016153878A
[Subject] An output of blue light can be improved sharply and light equipment small and high-intensity moreover is provided. [Means for Solution] A dichroic mirror made to reflect blue excitation light which emits light equipment of this...  
JP5979693B2  
JP2016525231A
光学コンポーネント(36)の場合、光学素 子(45)がフレーム(43)に横方向(4 4)に固定され、フレーム(43)は、横方 向(44)の光学素子(45)の線膨張...  
JP2016152270A
[Subject] A plurality of lamps provide an exposure device arranged the optimal. [Means for Solution] In exposure device 10 provided with lamp group 11 which comprised a plurality of lamps 12, and integrator 14 which improves the homogene...  
JP2016151687A
[Subject] Provide the optical system for projecting which covers a wide variable power range and can respond also to the image display element of high resolution in application to an approached type projector. [Means for Solution] In the...  
JP2016525232A
本発明は、特にリソグラフィ微細又はナノ構 造を結像するリソグラフィシステムの光学ア センブリ(100)であって、光学アセンブ リ(100)のビーム経路に連続して配...  
JP2016151688A
[Subject] Provide the optical system for projecting which covers a wide variable power range and can respond also to the image display element of high resolution in application to an approached type projector. [Means for Solution] In the...  
JP2016524182A
本発明は、投影露光システムとリソグラフィ マスクとを用いてウェハ内に構造を作製する ためのシステムに関する。このシステムを用 いてルールに基づくマスク調整を行うこ...  
JP2016524184A
光学コンポーネントが、光学素子(27)の 変位に対する放射の影響を低減する少なくと も1つの手段を備える。【選択図】図5  
JP5967132B2  
JP2016142900A
【課題】照明ムラの発生が低減された照明装 置およびプロジェクターを提供する。【解決 手段】励起光を射出する光源装置と、波長変 換素子と、を備え、励起光によって波長...  
JP2016139143A
[Subject] Lighting conditions which were rich in diversity about relevant lighting conditions required in order to transfer faithfully a mask pattern which has various characteristics, for example, light intensity distribution, a polariz...  
JP2016138961A
[Subject] In a lens group which constitutes a projection optical system, a projector provided with a projection optical apparatus which suppresses efficiently change of a Osamu difference by variation in an installed position, and such a...  
JP5959342B2  
JP2016133756A
[Subject] Provide an optical system for projecting which can respond to high-intensity and high resolution, and can attain a high field angle. [Means for Solution] Optical system for projecting 40 sets n to 6 or 7 from the expansion side...  
JP2016130859A
[Subject] A spatial-light-modulation unit which is used for an illumination-light study system and can raise flexibility about an intensity level of pupil intensity distribution. [Means for Solution] A spatial-light-modulation unit used ...  
JP2016127226A
[Subject] In the case of exposure, desired temperature distribution is produced inside a pattern field of Reticle . [Means for Solution] Exposure device 100 holds Reticle R which has the pattern field in which a pattern was formed, and i...  
JP5944400B2  
JP2016518619A
A micro lithography device (10) contains an object system (20) containing a penetration filter (42) constituted so that light irradiation distribution in projection Optical path might be corrected variably. A penetration filter (42) cont...  
JP5938335B2  
JP5938707B2  
JP2016109731A
[Subject] In a microscope, irradiation light to a sample is adjusted swiftness and appropriately. [Means for Solution] It has a reflective means including a reflective surface which has a part of shape of an elliptical pipe side, and a d...  
JPWO2014010274A1
基板処理装置(EX)は、照明領域(IR) から発生する反射光束(L2)を基板に向け て投射させて、マスクパターンの像を基板に 結像する投影光学系(PL)と、照明領...  
JP5934082B2  
JP5935852B2  
JP5935920B2  
JP2016105190A
To provide a ring light illuminator capable of creating a well-defined and homogeneous illumination field in an area to be illuminated.A ring light illuminator with annularly arranged light sources is disclosed. To each light source ther...  
JP2016517026A
An illumination-light study unit (4) for projection lithography functions as illuminating an object recognition field (5) which can arrange an object (7) imaged by illumination light (16). An illumination-light study unit (4) has a view ...  
JP2016103025A
[Subject] An exposure method and a device for enabling transfer of a pattern of various pitches to high resolution simultaneous respectively are provided. [Means for Solution] It is an exposure device which has illumination-light study s...  
JP5928653B2  
JP5928632B2  
JP5927555B2  
JP2016099390A
[Subject] An illumination-light study system and an image display device which can raise a contrast ratio of picture light by reducing diffraction light are provided. [Means for Solution] An optical equalization element (14) which equali...  
JP2016100461A
[Subject] Large-sized-izing of an illumination optical device accompanying an increase in the number of optical components and complication of imaging optics and big-ticket-ization are avoided, and an illumination optical device in which...  
JPWO2013191255A1
照明装置は、長方形の第1面、内面、及び長 方形の第2面を有し、前記第1面に入射した 光が前記内面での多重反射を介して前記第2 面から出射する、光インテグレータと、...  
JP2016095523A
To provide catadioptric projection objectives that have tilted deflecting mirrors which allows imaging of patterns including sub-patterns oriented in various directions.A first deflecting mirror has a first reflective coating with reflec...  

Matches 501 - 550 out of 3,322