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JP7181301B2 |
The present invention provides a compound having an excellent rate of change in HTP due to exposure. The present invention further provides a composition formed of the compound, a cured product, an optically anisotropic body, and a refle...
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JP7178169B2 |
To provide a resist composition capable of producing a resist pattern having a good pattern collapse margin (PCM).The resist composition contains a non-polymerizable compound having a 1,2-naphthoquinone diazide sulfonyl group in the mole...
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JP2022173240A |
To provide a compound used for the treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH).The present invention provides a compound of the following formula, or an enantiomer, a diastereomer, or a pharmaceutica...
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JP2022173110A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin (PCM) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resis...
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JP2022546314A |
The present invention provides novel prodrugs of treprostinil and methods of making and using these prodrugs.
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JP2022164584A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by a specific formula, a carboxylic ac...
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JP2022164586A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin (PCM) to be produced.The carboxylate represented by formula (I), the carboxylic acid gener...
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JP2022164583A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a salt represented by Formula (I-1346), an acid generator, and a resist compo...
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JP2022140761A |
To provide therapeutic methods for treating disease.The present disclosure provides a compound of a Formula (I) in the figure or a pharmaceutically acceptable salt thereof as described herein. The present disclosure also provides pharmac...
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JP7141461B2 |
An object of the present invention is to provide a compound which increases the intensity of HTP by exposure to irradiation with light such as ultraviolet rays, and a mixture including the compound. Another object of the present inventio...
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JP2022123839A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.There are provided: a triphenyl salt having substituents which is represented by a specific ...
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JP2022123840A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by a specific formula; a carboxylic acid ge...
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JP7111047B2 |
A novel sulfonium compound of formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a...
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JP7064575B2 |
The present invention provides a compound showing a large change in HTP upon light exposure. The present invention further provides a composition including the compound, a cured object, an optically anisotropic object, and a reflective f...
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JP2022068394A |
To provide a chemically amplified resist composition that has improved lithography performance factors such as CDU, LWR and DOF and reduced defects in photolithography using high-energy radiation as the energy source, an acid diffusion i...
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JP7023891B2 |
Prodrugs of treprostinil are provided which can be used in the treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH). The structures of the compounds can be adapted to the particular application for a suitable...
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JP2022029432A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity, an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by formula (I...
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JP2022028612A |
To provide a salt that makes it possible to produce a resist pattern having excellent line edge roughness, an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP2022028616A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness (LER), a carboxylic acid generator, a resin and a resist composition comprising the same.The present invention discloses a c...
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JP2022028614A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent CD uniformity, a carboxylic acid generator, a resin and a resist composition.The present invention discloses a carboxylate represented by, for e...
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JP2022028615A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity (CDU), an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP2022025024A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity, an acid generator and a resist composition comprising the same.The present invention discloses, for example, a salt represented by formu...
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JP2022025022A |
To provide a salt that can produce a resist pattern having excellent mask error factors, an acid generator and a resist composition comprising the same.Specifically, the present invention discloses a salt represented by e.g. formula (I-8...
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JP2022025007A |
To provide a salt that can produce a resist pattern having excellent CD uniformity (CDU), an acid generator and a resist composition comprising the same.The present invention discloses a salt represented by formula (I), an acid generator...
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JP2022025025A |
To provide a salt that can produce a resist pattern having excellent focus margin (DOF), an acid generator and a resist composition comprising the same.Specifically, the present invention discloses a salt represented by e.g. formula (I-8...
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JP2022025005A |
To provide a salt that can produce a resist pattern having excellent pattern collapse resistance (PCM), an acid generator and a resist composition comprising the same.The present invention discloses a salt of formula (I), a generator and...
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JP2022025006A |
To provide a salt that can produce a resist pattern having excellent line edge roughness (LER), an acid generator and a resist composition comprising the same.The present invention discloses a salt represented by e.g. formula (I-8), an a...
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JP2022021311A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity, an acid generator and a resist composition comprising the same.The present invention discloses, for example, a salt represented by formu...
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JP2022021310A |
To provide a salt that makes it possible to produce a resist pattern having excellent mask error factor (MEF), an acid generator and a resist composition comprising the same.The present invention discloses, for example, a salt represente...
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JP2022020562A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity, an acid generator and a resist composition comprising the same.The present invention discloses a salt represented by the following formu...
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JP2022020563A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness, a carboxylic acid generator and a resist composition comprising the same.The present invention discloses, for example, a ca...
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JP2022511469A |
The present disclosure is based on equation (I') or (II'-0). [Chemical 1] Or a pharmaceutically acceptable salt or solvate thereof. The present disclosure also relates to pharmaceutical compositions containing compounds, as well as thera...
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JP2022019581A |
To provide a carboxylate that can produce a resist pattern having excellent line edge roughness (LER), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses a carboxylate represented by ...
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JP2022019586A |
To provide a carboxylate that can produce a resist pattern having excellent mask error factors, a carboxylic acid generator and a resist composition comprising the same.The present invention discloses a carboxylate illustrated by formula...
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JP2022019585A |
To provide a salt that can produce a resist pattern having excellent resolution, an acid generator and a resist composition comprising the same.The present invention discloses a salt represented by, for example, the following formula, an...
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JP2022019582A |
To provide a carboxylate that can produce a resist pattern having excellent CD uniformity (CDU), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses a carboxylate represented by the fo...
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JP2022019579A |
To provide a carboxylate that can produce a resist pattern having excellent CD uniformity (CDU), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses, for example, a carboxylate represe...
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JP2022013737A |
To provide a carboxylate, a carboxylic acid generator and a resist composition including the same that enable production of a resist pattern with excellent line edge roughness (LER).Provided are a carboxylate having a specific structure ...
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JP2022013736A |
To provide a salt, an acid generator and a resist composition including the same that enable production of a resist pattern with excellent CD uniformity (CDU).Provided are a dibenzothiophenium salt having a specific structure exemplified...
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JP6996116B2 |
To provide a resist composition capable of producing a resist pattern having good line edge roughness.The resist composition contains a resin containing a structural unit having an acid-labile group, an acid generator, and a compound rep...
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JP2022008136A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good line edge roughness (LER).The carboxylate represented by formula (I), the carboxylic acid generator, and th...
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JP2022008153A |
To provide a salt, an acid generator and a resist composition including the same that enable production of a resist pattern with excellent line edge roughness (LER).For instance, a carboxylate of a structural formula below is presented.S...
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JP2022008154A |
To provide a chemical compound, a resin and a resist composition including the same that enable production of a resist pattern with excellent CD uniformity (CDU).Provided are a chemical compound expressed by a formula (I), a resin and a ...
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JP2022008152A |
To provide a salt, an acid generator and a resist composition comprising the same, making it possible to produce a resist pattern having excellent CD uniformity (CDU).The present invention discloses a dibenzothiophenium salt or the like ...
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JP2022008150A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...
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JP2021193076A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator and a resist composition containing the acid generator.There are provided a salt represented by the formula (I), an acid gen...
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JP2021193077A |
To provide a salt capable of producing a resist pattern having good CD uniformity, an acid generator and a resist composition containing the acid generator.There are provided a salt represented by the formula (I), an acid generator and a...
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JP6987104B2 |
To provide novel high penetration compositions (HPCs) or high penetration prodrugs (HPPs) for treatment of Parkinson's disease.The HPCs/HPPs are capable of being converted to parent active drugs or drug metabolites after crossing the bio...
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JP6981767B2 |
To provide a compound and a resin suitably used for a resist composition that can produce a resist pattern having excellent CD uniformity.The present invention provides a compound represented by formula (I), and a resin and a resist comp...
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JP2021191745A |
To provide a salt capable of producing a resist pattern having a good pattern collapse margin (PCM), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist ...
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