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WO/2022/014939A1 |
The present disclosure provides an oil splash protection system and method for a rotary plasma head. The system comprises: a nozzle part from which plasma is discharged; a rotating body part which is driven to rotate the nozzle part, whe...
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WO/2022/013017A1 |
Voltage waveform generator for plasma assisted processing apparatuses A voltage waveform generator comprises a common node, a voltage waveform generation circuit and a current source. The voltage waveform generation circuit is operably c...
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WO/2022/013285A1 |
A method of manufacturing a sputtering target is provided. The method comprises the steps of providing a backing structure, providing target material comprising ceramic target material for spraying, subsequently thermal-spraying the targ...
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WO/2022/013297A1 |
A method, a device and a computer program for repairing a mask for lithography, in particular a mask for EUV lithography, are described. A method of repairing a mask for lithography, in particular a mask for EUV lithography, comprises th...
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WO/2022/013284A1 |
A sputtering target includes at least one single piece with a length of at least 600 mm. The sputtering target comprises a backing structure provided with target material for sputtering. At least 40% of the mass of the target material in...
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WO/2022/015432A1 |
An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the ext...
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WO/2022/013945A1 |
This sample image observation device is provided with an SEM and a control system for controlling the SEM. The sample image observation device divides an observation region of a sample into a plurality of sections and performs restoratio...
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WO/2022/014380A1 |
A fluorescent element comprising: a substrate having a first main surface and a second main surface, which faces the first main surface; and a Group-III-element nitride semiconductor layer disposed over the first main surface of the subs...
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WO/2022/013368A1 |
An emitter is configured to emit charged particles. The emitter comprises a body, a metal layer and a charged particle source layer. The body has a point. The metal layer is of a first metal on at least the point. The charged particle so...
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WO/2022/013918A1 |
The purpose of the present invention is to properly correct the various types of distortion without a reduction in observation throughput. The present disclosure provides a charged particle beam device that obtains an image by irradiatin...
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WO/2022/015524A1 |
Systems and methods for pulsing radio frequency (RF) coils are described. One of the methods includes supplying a first RF signal to a first impedance matching circuit coupled to a first RF coil, supplying a second RF signal to a second ...
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WO/2022/015512A1 |
In some examples, a double seal arrangement for a substrate processing chamber comprises a radially inner barrier seal disposed within a barrier seal gland. The barrier seal gland includes an inner toe and an outer toe. A radially outer ...
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WO/2022/010755A1 |
Exemplary substrate support assemblies may include a platen characterized by a first surface configured to support a semiconductor substrate. The assemblies may include a first stem section coupled with a second surface of the platen opp...
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WO/2022/010872A1 |
Embodiments of the disclosure provide electrostatic chucks for securing substrates during processing. Some embodiments of this disclosure provide methods and apparatus for increased temperature control across the radial profile of the su...
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WO/2022/011330A2 |
An ion implantation system has an aluminum trichloride source material. An ion source is configured to ionize the aluminum trichloride source material and form an ion beam. The ionization of the aluminum trichloride source material furth...
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WO/2022/009995A1 |
Provided is an electrostatic deflection convergence-type energy analyzer that has a wide acceptance angle and high two-dimensional convergence performance, is capable of imaging a two-dimensional real-space image and an emission angle di...
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WO/2022/008518A1 |
A charged particle beam detector may include a circuit with a storage cell configured to receive a signal representing an output of a sensing element; a storage cell multiplexer configured to selectively transmit the signal representing ...
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WO/2022/008906A1 |
Broadly speaking, the present techniques provide a method and system for controlling a wafer production process in real-time using a trained machine learning, ML, model. Advantageously, the ML model uses multiple sensed parameters to det...
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WO/2022/008675A1 |
A method for determining a geometry of a measuring tip (100) for a scanning probe microscope is proposed. The method comprises the steps of: a) generating (S1) at least one test structure (200), which has elevations (210) alternating wit...
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WO/2022/010875A1 |
A method for applying RF power in a plasma process chamber is provided, including: generating a first RF signal; generating a second RF signal; generating a third RF signal; wherein the first, second, and third RF signals are generated a...
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WO/2022/010686A1 |
A first radiofrequency signal generator is set to generate a low frequency signal. A second radiofrequency signal generator is set to generate a high frequency signal. An impedance matching system has a first input connected to an output...
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WO/2022/008511A1 |
There is provided a dielectric barrier electrical discharge apparatus, system and method. The apparatus comprises at least two electrodes arranged in use to provide at least one anode and at least one cathode an electric field thereby be...
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WO/2022/008209A1 |
The invention relates to a method for producing a gas curtain of purge gas in a slit valve tunnel of a device for treating a semiconductor wafer and to a slit valve tunnel. The method comprises conducting the purge gas to two ends of a c...
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WO/2022/008286A1 |
The disclosure relates to charged-particle multi-beam columns and multi-beam column arrays. In one arrangement, a sub-beam defining aperture array forms sub-beams from a beam of charged particles. A collimator array collimates the sub-be...
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WO/2022/009297A1 |
Provided is a charged particle beam device with which it is possible to impart a function of an energy filter even in a small BSE detector. This charged particle beam device is provided with a phosphor for converting charged particles pr...
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WO/2022/010599A1 |
A method and apparatus for the use of hydrogen plasma treatments is described herein. The process chamber includes a plurality of chamber components. The plurality of chamber components may be coated with a yttrium zirconium oxide compos...
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WO/2022/011165A1 |
Described are coatings that contain of fluorinated yttrium oxide and a metal oxide; methods of preparing these coatings; substrates, surfaces, equipment, and components of equipment that include a coating that contains a combination of f...
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WO/2022/008462A1 |
There is provided a detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of res...
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WO/2022/010839A1 |
Embodiments of showerheads for use in a process chamber and methods of reducing drooping of a showerhead faceplate are provided herein. In some embodiments, a showerhead for use in a process chamber includes: a faceplate having a plurali...
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WO/2022/011315A1 |
In some embodiments, a high voltage power supply is disclosed that provides a plurality of high voltage pulses without any voltage droop between two subsequent pulses. In some embodiments, a high voltage power supply is disclosed that pr...
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WO/2022/008736A1 |
The invention relates to a method for producing a beam of charged gas-phase species based on a composition comprising at least one polymer and at least one precursor species of the beam. The invention further relates to a device for carr...
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WO/2022/008924A1 |
A detector module for use in an apparatus for analysing a specimen is provided. The detector module comprises a plurality of X-ray sensor elements and one or more electron sensor elements, and is adapted to be positioned below a polepiec...
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WO/2022/009357A1 |
The present disclosure proposes a pattern matching device capable of achieving matching processing that is characterized by involving a learning function even for a semiconductor pattern including a repetitive pattern, in particular. The...
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WO/2022/010661A1 |
Methods, systems, apparatuses, and computer programs are presented for controlling etch rate and plasma uniformity using magnetic fields. A substrate processing apparatus includes a vacuum chamber including a processing zone for processi...
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WO/2022/004648A1 |
This ceramic structure contains aluminum titanate with aluminum oxide as a main component. In a surface layer region where the depth from a sintered surface is 5 mm or less, a surface resistance value and/or a surface resistivity increas...
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WO/2022/006004A1 |
Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical enviro...
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WO/2022/004514A1 |
[Problem] The present invention addresses the problem of providing a sample holder which makes it possible to rotate a sample while cooling the sample. [Solution] A sample holder according to the present invention is characterized by com...
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WO/2022/005864A1 |
A method of performing a fluoroconversion process to apply a coating to surfaces of a component of a substrate processing system includes arranging the component within a processing chamber, setting at least one process parameter of the ...
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WO/2022/005504A1 |
A deposition system is disclosed that allows for growth of inclined c-axis piezoelectric material structures. The system integrates various sputtering modules to yield high quality films and is designed to optimize throughput lending it ...
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WO/2022/006053A1 |
Methods and apparatus for processing a substrate are provided herein. In embodiments, a magnetron assembly for use in a PVD chamber includes: a base plate having a first side, a second side opposite the first side, and a central axis; a ...
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WO/2022/004401A1 |
This focused ion beam device is provided with a focused ion beam column in which a focused ion beam optical system is incorporated into a lens barrel, and which emits a focused ion beam from the distal end portion of the lens barrel, whe...
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WO/2022/003677A1 |
A measurement system and method are presented for measuring one or more parameters of a sample. The measurement system comprises an excitation system and a detection system. The excitation system is configured to generate combined exciti...
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WO/2022/004229A1 |
This differential exhaust device provides a high degree of vacuum to a treatment space. The differential exhaust device is provided with: a displacement driving unit that, by displacing a head unit or a to-be-treated substrate, is capabl...
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WO/2022/003927A1 |
This charged particle beam device comprises: a charged particle beam source that generates charged particle beams; an objective lens in which coil current is inputted to focus the charged particle beams on a sample; a control unit that c...
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WO/2022/003770A1 |
This electron source is provided with a suppressor electrode that has an opening at one end in a direction along a central axis, and an electron emitter having a distal end that protrudes out from the opening, wherein the electron source...
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WO/2022/002728A1 |
Methods for repairing a defect of a lithographic mask with a particle beam are described. One such method can comprise the following steps: Processing the defect with the particle beam with a first set of processing parameters; processin...
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WO/2022/006326A1 |
A method for removing residue deposits from a reaction chamber includes supplying a cleaning gas into the reaction chamber via direct delivery from a remote plasma source (RPS). The cleaning gas forms a plurality of gas flow streamlines ...
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WO/2022/005150A1 |
According to one embodiment of the present specification, provided is a plasma generation device comprising: a chamber providing a generation space for plasma; an antenna module, which is arranged to be adjacent to the chamber, is connec...
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WO/2022/005753A1 |
A method of evaluating a region of a sample that includes two or more sub-regions adjacent to each other that have different milling rates. The method can include: scanning a focused ion beam over the region during a single scan frame su...
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WO/2022/005686A1 |
Methods and apparatus for plasma chamber target for reducing defects in workpiece during dielectric sputtering are provided. For example, a dielectric sputter deposition target can comprise a dielectric compound having a predefined avera...
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