| Document |
Document Title |
|
WO/2022/072370A1 |
A substrate support configured to support a substrate having a diameter D comprises a first inner electrode and a second inner electrode that are each D- shaped, define a first outer diameter that is less than D, and are configured to be...
|
|
WO/2022/072711A1 |
Disclosed herein is a sintered yttrium oxide body having a total impurity level of 40 ppm or less, a density of not less than 4.93 g/cm3, wherein the sintered yttrium oxide body has at least one grain boundary comprising silica in an amo...
|
|
WO/2022/065428A1 |
Provided is an electron microscope which, despite being equipped with an objective lens that leaks a magnetic field to a sample, generates a sample observation image using an electron beam in order to enable acquisition of a scanning ele...
|
|
WO/2022/066503A1 |
Embodiments of the present disclosure generally relate to methods of depositing carbon film layers greater than 3,000 A in thickness over a substrate and surface of a lid of a chamber using dual frequency, top, sidewall and bottom source...
|
|
WO/2022/064707A1 |
The present invention rapidly and highly accurately acquires depth information for a multilayered structure. This analysis system comprises: (a) a step of acquiring a first imaged image of a multilayered structure-including sample SAM as...
|
|
WO/2022/067171A1 |
A method for repetitive tuning of a matching network in a radio frequency plasma processing device, the method including detecting a condition within the matching network and determining if the condition is a known condition for the matc...
|
|
WO/2022/064668A1 |
A charged particle beam device provided with an iron thin film spin detector is provided. This charged particle beam device comprises a charged particle column 201 which scans a charged particle beam 202 on a sample 203; a spin detector ...
|
|
WO/2022/064628A1 |
In order to enable even an electron microscope equipped with an objective lens, which causes a magnetic field to leak toward a sample, to acquire a scanning electron microscope image by using low-angle reflected electrons, that is, refle...
|
|
WO/2022/063553A1 |
The invention relates to an apparatus for the treatment of a biological surface using atmospheric-pressure plasma, comprising: - a device for generating atmospheric-pressure plasma (DGP), and - a control device (DC) configured to control...
|
|
WO/2022/066603A1 |
Embodiments of showerheads are provided herein. In some embodiments, a showerhead assembly includes a chill plate having a plurality of recursive gas paths and one or more cooling channels disposed therein, wherein each of the plurality ...
|
|
WO/2022/064719A1 |
The purpose of the present invention is to obtain, with a charged particle beam device in which a sample is irradiated with a charged particle beam and with light so as to obtain an observation image of the sample, an observation image i...
|
|
WO/2022/066593A1 |
A showerhead comprises first, second, and third components. The first component includes a disc-shaped portion and a cylindrical portion extending perpendicularly from the disc-shaped portion. The disc-shaped portion includes first and s...
|
|
WO/2022/063540A1 |
A method of operating a secondary imaging system of a charged particle beam apparatus may include using an anti-scanning mode. Excitation of a component of the secondary imaging system may be adjusted synchronously with a primary scannin...
|
|
WO/2022/063112A1 |
The present invention provides a semiconductor reaction chamber, comprising a chamber body, a dielectric window, a gas inlet member, a bearing member, an upper radio frequency assembly, and multiple ultraviolet light generating apparatus...
|
|
WO/2022/066944A1 |
Substrate coating systems and methods are disclosed. A substrate coating system comprises a deposition chamber enclosing at least a first electrode and a second electrode and a power supply coupled to the first electrode and the second e...
|
|
WO/2022/066135A1 |
The claimed method for producing cathodic vacuum arc plasma comprises igniting a vacuum arc discharge between a cathode (2) and an anode (3) with the aid of an ignition means (4), and forming a plasma flow by means of a magnetic field pr...
|
|
WO/2022/064848A1 |
In the present invention, in a cylindrical guard electrode (5) disposed on the outer peripheral side of an electron generation part (31) of an emitter (3), a tip section (5A) positioned in an emission direction of an electron beam (L1) f...
|
|
WO/2022/066942A1 |
Embodiments of components for use in substrate process chambers are provided herein. In some embodiments, a component for use in a substrate process chamber includes: a body having an opening extending partially through the body from a t...
|
|
WO/2022/058424A1 |
What is proposed is an apparatus (100) for analysing and/or processing a sample (10) with a particle beam (110), comprising:a providing unit (106) for providing the particle beam (110); a shielding element (202) for shielding an electric...
|
|
WO/2022/058437A1 |
The invention relates to an apparatus and a method for separating a carbon layer, wherein an arc discharge is formed between an electron source (10) and an evaporation material (2) by means of a first power supply device (9), wherein the...
|
|
WO/2022/057847A1 |
The present invention relates to the field of semiconductor processing devices, and provides a collection assembly and a semiconductor precleaning chamber. The collection assembly is used for collecting particle impurities in the semicon...
|
|
WO/2022/059202A1 |
This inspection system 100 comprises: an electron source 102 which irradiates a sample 200 with an inspection beam; a detector 105 which detects secondary electrons obtained by irradiating the sample 200 with the inspection beam and outp...
|
|
WO/2022/058193A1 |
The invention relates to a coating method and to a coating apparatus for coating a body (40). A magnetron-cathode (22a, 22b, 22c, 22d) having a target (24a, 24b, 24c, 24h) is arranged in the vacuum chamber (12). Electrical power is suppl...
|
|
WO/2022/058333A1 |
The invention relates to a device for generating a dielectric barrier discharge, having a thermoelectric component (1), an electrode (2) which is arranged opposite the thermoelectric component (1), and a high voltage source (12) which is...
|
|
WO/2022/058346A2 |
What is proposed is an apparatus (100) for analysing and/or processing a sample (200) with a particle beam (112), comprising:a sample stage (120) for holding the sample (200);a providing unit (110) for providing the particle beam (112) c...
|
|
WO/2022/058218A1 |
The present application relates to methods and apparatus for delivering liquid or solid feedstocks into a plasma treatment vessel. More specifically, the invention provides a method for treating a sample using glow discharge plasma in an...
|
|
WO/2022/058253A2 |
A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: a plurality of control lenses, a plurality of objective lenses and a controller. The plurality of control lenses are configured to contro...
|
|
WO/2022/058014A1 |
A cathode assembly (110) for sputter deposition is provided. The cathode assembly includes a first cathode drive unit (113) configured to rotate a first rotatable cathode (111), a second cathode drive unit (114) adjacent to the first cat...
|
|
WO/2022/057977A1 |
The present invention relates to a workpiece holder (1) for a plasma-enhanced chemical vapour deposition system (50), to a system (50) of this kind, and to an operating method (100) for a system (50) of this kind. The workpiece holder (1...
|
|
WO/2022/060562A1 |
Methods, systems, apparatuses, and computer programs are presented for controlling plasma discharge uniformity using magnetic fields. A substrate processing apparatus includes a vacuum chamber with a processing zone for processing a subs...
|
|
WO/2022/060921A1 |
Semiconductor processing systems are described to measure levels of atomic oxygen using an atomic oxygen sensor positioned within a substrate processing region of a substrate processing chamber. The processing systems may include a semic...
|
|
WO/2022/060688A1 |
A gas distribution assembly for a processing chamber in a substrate processing system includes a gas plate including a plurality of holes configured to supply a gas mixture into an interior of the processing chamber and a carrier ring co...
|
|
WO/2022/058120A2 |
Disclosed herein is a connector for electrically connecting a feedthrough of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly configured to be in electrical connection with a high voltage ...
|
|
WO/2022/058252A1 |
Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respe...
|
|
WO/2022/060665A1 |
Exemplary semiconductor processing chambers may include showerhead. The chambers may include a pedestal configured to support a semiconductor substrate, where the showerhead and pedestal at least partially define a processing region with...
|
|
WO/2022/058546A1 |
The present invention relates to a method for treating a sample using glow-discharge plasma comprising one or more treatment steps, in which the sample for treatment is subject to plasma treatment in a treatment vessel provided with a te...
|
|
WO/2022/060536A1 |
The microfluidic device (100, 200) has a first reservoir (102, 202) that preferably includes a first liquid (108, 208). The first liquid (108, 208) is being held by a capillary stop valve (228, 230) in the first reservoir (102, 202). A s...
|
|
WO/2022/060351A1 |
Embodiments disclosed herein generally relate to an apparatus having a partially anodized gas distribution showerhead including a body having a plurality of gas passages extending therethrough from an upstream side to a downstream side, ...
|
|
WO/2022/060932A1 |
Exemplary semiconductor processing chambers include a gasbox. The chambers may include a substrate support. The chambers may include a blocker plate positioned between the gasbox and the substrate support. The blocker plate may define a ...
|
|
WO/2022/060509A1 |
Embodiments disclosed herein include a plasma treatment chamber, comprising one or more sidewalls. A support surface within the one or more sidewalls holds a workpiece. A first gas injector along the one or more sidewalls injects a first...
|
|
WO/2022/057978A1 |
The present invention relates to a device (1), a system (50) and a method (100) for plasma-enhanced chemical vapor deposition. A process chamber (2) is configured to receive at least one workpiece carrier (30). According to the invention...
|
|
WO/2022/058542A1 |
The present invention relates to a method for treating a sample using glow-discharge plasma, in an apparatus comprising a treatment vessel, an electrode, a counter-electrode, and a power supply comprising one or more transformers and hav...
|
|
WO/2022/060470A1 |
An apparatus, system and method. An apparatus may include an RF power assembly, arranged to output an RF signal; a resonator, coupled to receive the RF signal, the resonator comprising a first output end and a second output end, and a dr...
|
|
WO/2022/059171A1 |
The present invention comprises: a charged particle optical system that scans a sample with a pulsed charged particle beam; a light source (120) that irradiates the sample with pulsed light; a detector (112) that detects secondary charge...
|
|
WO/2022/060537A1 |
The method is for preparing a sample in a microfluidic device. The microfluidic device is provided that has a first reservoir in fluid communication with a second reservoir in fluid communication with and adjacent to a draining unit that...
|
|
WO/2022/053175A1 |
The invention relates to multiple particle beam system comprising a magnetic immersion lens and comprising a detection system. Here, a cross-over of the second individual particle beams is provided in the secondary path between the beam ...
|
|
WO/2022/055124A1 |
Disclosed are a method for protecting an apparatus from etching substances and a method for forming an oxide film. The method for protecting an apparatus from etching substances according to the present invention comprises the steps of: ...
|
|
WO/2022/053647A1 |
What is described is a process for producing synthesis gas from CO2, which can save power in the production of synthetic hydrocarbons. This is achieved by a process for producing synthesis gas that has the following steps: Splitting a hy...
|
|
WO/2022/055831A1 |
The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disp...
|
|
WO/2022/055609A2 |
A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a cont...
|
