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WO/2022/150322A1 |
Exemplary methods of semiconductor processing may include providing a boron-and-carbon-and-nitrogen-containing precursor to a processing region of a semiconductor processing chamber. A substrate may be disposed within the processing regi...
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WO/2022/147507A1 |
A device and method for emitting an electrospray of ionized particles is disclosed, comprising a reservoir, an emitter in communication with the reservoir and having openings, wherein the openings are configured to permit release of the ...
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WO/2022/141001A1 |
A microscope sample stage, comprising: a base (1); a three-dimensional motion mechanism arranged on the base (1), wherein the three-dimensional motion mechanism can move in a first direction, a second direction and a third direction; a s...
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WO/2022/143143A1 |
Disclosed in the present application are a plasma density control system and method, the system comprising an ion source, a reaction chamber, a baffle mechanism, and a Faraday cup set. The Faraday cup set is disposed on the wall surface ...
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WO/2022/145194A1 |
A charged particle beam drawing device according to one aspect of the present invention is characterized by comprising: an electrode which deflects a charged particle beam; an amplifier which applies a deflection potential to the electro...
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WO/2022/146667A1 |
An electrostatic chuck including a workpiece support surface, clamping layer, heating layer, thermal control system, and sealing band is disclosed. The sealing band surrounds an outer perimeter of the electrostatic chuck including at lea...
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WO/2022/146649A1 |
Systems and methods for processing a workpiece are provided. In one example implementation, a method for processing a workpiece can include supporting a workpiece on a workpiece support. The method can include processing the workpiece by...
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WO/2022/145737A1 |
The present invention provides a device for processing a substrate. The device for processing a substrate comprises: a housing having a processing space provided therein; a support unit disposed in the housing to support the substrate; a...
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WO/2022/146648A1 |
An induction coil assembly is disclosed including two induction coils. Each induction coil includes a first winding commencing from a first terminal end in a first position in the z-direction and transitioning to a radially inner positio...
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WO/2022/143120A1 |
The present application discloses an ion source device with an adjustable plasma density, comprising an ion source cavity, a discharge cavity, a spiral coil, a planar coil and a radio frequency power supply, wherein the ion source cavity...
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WO/2022/143144A1 |
Disclosed is an ion source having a coil structure capable of changing along with a discharge cavity structure, comprising an ion source cavity, a coil support, a coil, and a discharge cavity body which are coaxially arranged in sequence...
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WO/2022/146711A1 |
Systems for implanting semiconductor structures with ions are disclosed. The semiconductor structure is positioned on a heatsink 100 and ions are implanted through a front surface of the semiconductor structure to form a damage region in...
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WO/2022/145668A1 |
The present invention relates to a ceramic susceptor. The ceramic susceptor of the present invention comprises: an insulating plate having a high-frequency electrode disposed therein; a shaft connected to the insulating plate; a connecti...
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WO/2022/144156A1 |
There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optica...
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WO/2022/143079A1 |
Disclosed by the present application is an ion source device that has adjustable plasma density. The ion source device comprises a discharge chamber, a helical coil and an ion source chamber which are coaxially arranged from the inside t...
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WO/2022/144143A1 |
It is provided a current measurement module (100) for measuring a current of a primary charged particle beam (123) of a charged particle beam device, the current measurement module (100) including a detection unit (160) configured for de...
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WO/2022/143121A1 |
The present application discloses a dual-baffle device for improving etching uniformity, comprising a first baffle and a second baffle both mounted in an etching reaction chamber. The first baffle is a rounding plate, which can completel...
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WO/2022/144080A1 |
A method for generating an RF signal preferably for a plasma chamber comprising the steps of: Generating an input RF signal on the basis of a first set of control parameters; Detecting at least one distorted RF signal; Synchronizing the ...
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WO/2022/137332A1 |
The present invention has a photocathode 13 comprising a substrate 11 and a photoelectric film 12 formed on the substrate, a light source 1 for emitting pulsed excitation light, a condenser lens 4 disposed to face the substrate of the ...
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WO/2022/138558A1 |
This method for manufacturing an electron source comprises: a step for putting, between a pair of welding electrodes, an object to be welded in which a chip of an electron emission material and a tungsten filament are superposed so as to...
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WO/2022/137427A1 |
This charged particle microscope is provided with an electron gun installed inside a lens barrel, a stage 20, and the like. On the stage 20, a sample holder 30 holding a sample SAM can be installed. In addition, the stage 20 includes a c...
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WO/2022/136324A1 |
A plasma-facing component for a plasma chamber, comprising: a plasma-facing target surface; an inlet through which to receive a coolant fluid and an outlet through which to expel the coolant fluid; and a plurality of internal cooling cha...
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WO/2022/135920A1 |
A method of detecting charged particles may include detecting beam intensity as a primary charged particle beam moves along a first direction; acquiring a secondary beam spot projection pattern as the primary charged particle beam moves ...
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WO/2022/139240A1 |
The present invention relates a plasma-resistant ceramic substrate and a manufacturing method therefor, the ceramic substrate comprising: a bulk of an oxide composition; and a surface layer in which components of the oxide composition co...
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WO/2022/140214A1 |
A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. T...
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WO/2022/135981A1 |
The present invention relates to a method for repairing a defect of a lithographic mask, comprising the following steps: (a.) directing a particle beam to the defect for inducing a local etching process at the defect; (b.) monitoring the...
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WO/2022/139689A1 |
An ion microscope, a method of constructing an ion microscope, and a method of aligning an ion beam in an ion microscope. The microscope comprises a nano-aperture ion source; and a focusing system; wherein the focusing system is configur...
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WO/2022/135842A1 |
Apparatus and methods for directing a beam of primary electrons along a primary beam path onto a sample are disclosed. In one arrangement, a beam separator diverts away from the primary beam path a beam of secondary electrons emitted fro...
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WO/2022/137401A1 |
This charged particle beam device comprises: a sample stage for placing a sample thereon to move said sample; a charged particle beam irradiation optical system for performing irradiation with a charged particle beam; a sample piece movi...
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WO/2022/135971A1 |
A monolithic detector may be used in a charged particle beam apparatus. The detector may include a plurality of sensing elements (311) formed on a first side of a semiconductor substrate, each of the sensing elements configured to receiv...
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WO/2022/135926A1 |
Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference betwe...
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WO/2022/136064A1 |
The present invention provides a various techniques for detecting backscatter charged particles, including accelerating charged particle sub-beams along sub-beam paths to a sample, repelling secondary charged particles from detector arra...
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WO/2022/140431A1 |
A method includes causing manufacturing equipment to generate a RF signal to energize a processing chamber associated with the manufacturing equipment. The method further includes receiving, from one or more sensors associated with the m...
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WO/2022/140263A1 |
The disclosure describes a plasma source assemblies comprising a differential screw assembly, an RF hot electrode, a top cover, an upper housing and a lower housing. The differential screw assembly is configured to provide force to align...
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WO/2022/129799A1 |
Device (D) for electron cyclotron resonance plasma-assisted thin film deposition, comprising a device (2) for producing a plasma and a substrate (4) of a target material of the thin film, the substrate being housed in a body of the produ...
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WO/2022/132578A1 |
An ex situ physical vapor deposition (PVD) process kit conditioning apparatus configured to condition process kit components of a PVD substrate processing chamber, the ex situ PVD process kit conditioning apparatus comprising a chamber a...
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WO/2022/126158A1 |
The invention relates to a part made of a refractory metal, characterized in that the surface of the part is at least partly coated with a layer of Y2O3, to the production of the coated part, and to the use of Y2O3 as a release agent in ...
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WO/2022/132799A1 |
Embodiments of process shield for use in process chambers are provided herein. In some embodiments, a process shield for use in a process chamber includes: an annular body having an upper portion and a lower portion extending downward an...
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WO/2022/128860A1 |
An improved readout circuit for a charged particle detector and a method for operating the readout circuit are disclosed. An improved circuit comprises an amplifier configured to receive a signal representing an output of a sensor layer ...
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WO/2022/130535A1 |
Provided are a vacuum treatment device and a vacuum treatment method with which it is possible to suppress deterioration of the degree of vacuum in a conveyance destination vacuum chamber when conveying a sample between two vacuum chambe...
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WO/2022/128392A1 |
Charged particle systems and methods for processing a sample using a multi-beam of charged particles are disclosed. In one arrangement, a column directs a multi-beam of sub-beams of charged particles onto a sample surface of a sample. A ...
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WO/2022/128817A2 |
The method for producing a pretreated composite substrate (18), which is used as the basis for further processing into electronic semiconductor components, comprises: doping a first layer (21) of SiC in a donor substrate (12) by means of...
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WO/2022/130838A1 |
A multibeam image acquisition apparatus according to an aspect of the present invention is characterized by comprising: a stage for placing a substrate thereon; an objective lens for irradiating the substrate with a multi-primary electro...
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WO/2022/133434A1 |
A showerhead for a processing chamber in a substrate processing system includes an upper portion having a lower surface and an upper surface and a faceplate. A lower surface of the faceplate is below the lower surface of the upper portio...
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WO/2022/132576A1 |
Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may define a plurality of gas inlets and gas outlets. A number of gas outlets may be greater...
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WO/2022/128846A1 |
Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate...
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WO/2022/128594A1 |
An ion implantation device (20) is provided comprising an energy filter (25) with at least one filter layer (32) and at least one support element (30) for supporting the energy filter (25), wherein the at least one support element (30) i...
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WO/2022/128719A1 |
In the device for forming amorphous carbon layers on component surfaces having reduced surface roughness, a plasma (8) is generated under vacuum conditions by means of an electric pulsed current source (5) between a target (1) connected ...
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WO/2022/128593A1 |
An energy filter assembly (1, 100, 200, 300) for ion implantation system is provided comprising an energy filter (25), a first filter frame (40), and at least one coupling element (50). The energy filter (25) has at least one filter elem...
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WO/2022/125781A1 |
Improved process flows and methods are provided herein for forming a passivation layer on sidewall surfaces of openings formed in an amorphous carbon layer (ACL) to avoid bowing during an ACL etch process. More specifically, improved pro...
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