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JP2011111573A |
To further improve the thermal imprinting property of an amorphous cyclic olefin polymer while maintaining properties such as transparency, heat resistance and mechanical properties of the amorphous cyclic olefin polymer.The resin compos...
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JP4696681B2 |
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JP4696682B2 |
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JP4694153B2 |
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JP2011105791A |
To provide a photosensitive resin composition simultaneously having developability, low loss and heat resistance; to provide a photosensitive resin composition for forming optical wave guide paths; to provide a film for forming optical w...
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JP4687197B2 |
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JP2011090328A |
To provide an optical waveguide of which the heat resistance is excellent and the water absorption property is low, and of which the cost of materials is reduced, and to provide an optical waveguide structure.The optical waveguide struct...
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JP4674089B2 |
The present invention provides a method for producing a hydrogenated petroleum resin employed as a tackifying resin and formed from a cyclopentadiene compound and a vinyl aromatic compound, wherein both enhancement of adhesion performanc...
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JP4667555B2 |
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JP4665043B2 |
The present invention provides novel photoresist monomers, and photoresist polymers derived from monomers comprising the same. The photoresist monomers of the present invention are represented by the following formula:where Z1, Z2, R1, R...
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JP4666177B2 |
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JP2011063629A |
To provide a cyclic olefin-based resin suitable for manufacturing a film provided with high heat-resistance and tensile characteristic, and a film using the cyclic olefin-based resin.In the cyclic olefin-based resin, a glass transition p...
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JP4663075B2 |
The present invention provides novel photoresist monomers, and photoresist polymers derived from monomers comprising the same. The photoresist monomers of the present invention are represented by the following formula:where Z1, Z2, R1, R...
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JP2011057945A |
To provide a transparent thermoplastic resin excellent in low hygroscopicity and heat resistance and useful as an optical material.The alicyclic hydrocarbon copolymer includes structures represented by general formula (1) and general for...
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JP2011060275A |
To calculate an intrinsic birefringence index of a polymer with high accuracy.This intrinsic birefringence index calculation method is a method for calculating the birefringence index of a polymer in an information processor, and include...
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JP4654739B2 |
To provide a highly reliable organic EL element with superior performance such as high transparency and low water absorptivity. The organic EL element is provided with a substrate, a lower-side electrode, an insulating film, an organic m...
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JP4645858B2 |
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JP4645849B2 |
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JP4645787B2 |
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JP2011043628A |
To provide a retardation film for a touch panel.The touch panel 100 is formed by arranging two substrates 110, 120 each having a transparent conductive film formed on the surface while leaving a predetermined gap so that the transparent ...
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JP2011042713A |
To provide a new fluorine-containing copolymer having cyclic structure useful for a coating raw material, a semiconductor material, and an optical material, and a method for producing the same.The fluorine-containing copolymer has a poly...
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JP4642452B2 |
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JP2011038106A |
To provide a method for producing a polycyclic olefin polymer usable for photoresist compositions.The method for producing a polycyclic olefin polymer includes (a) combining a monomer composition containing polycyclic olefin monomers, a ...
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JP4632009B2 |
To provide a cycloolefinic copolymer which is crosslinkable and capable of giving excellent properties in heat resistance, transparency, chemical resistance, solvent resistance, bonding and adhesion, its composite material, these erossli...
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JP4631229B2 |
To provide a chemical amplification positive resist composition suitable for the lithography by excimer laser such as ArF and KrF laser and having the characteristics with excellent performance balance of resolution and sensitivity. The ...
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JP2011026372A |
To provide a method for manufacturing a copolymer for an organic antireflection film.The method for manufacturing a copolymer for an organic antireflection film includes manufacturing a copolymer, which contains at least two kinds of rep...
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JP4626736B2 |
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JP4626023B2 |
To obtain a cycloolefin copolymer and an optical material both excellent in optical characteristics, heat resistance, adhesiveness, tightly contacting properties, and resistance to moisture absorption. The cycloolefin copolymer contains ...
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JP4619218B2 |
Top anti-reflective coating polymer compounds (I) are new. Top anti-reflective coating polymer compounds of formula (I) are new. R 1, R 2H, CH 3or fluoromethyl; R 3, R 41-10C hydrocarbon or 1-10C hydrocarbon in which H atoms are wholly o...
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JP4620530B2 |
A catalytic composition, including a cationic metal-pair complex, is disclosed, along with a method for its preparation. A method for the polymerization of ethylenically unsaturated monomers using the catalytic composition, and the addit...
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JP4615248B2 |
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JP4610335B2 |
This invention provides novel fluorine containing polymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered carbocyclic ring and, optionally, other componen...
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JP4595140B2 |
To obtain both a new propylene-based copolymer capable of providing a thermoplastic resin composition having excellent flexibility, transparency, resistance to flexural whitening, resistance to damage and heat resistance by blending the ...
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JP2010270254A |
To provide a rubber composition capable of exerting excellent dry and wet grip performances when used as a rubber composition for a tire, and to provide a pneumatic tire using the same.The rubber composition comprises: 100 pts.mass rubbe...
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JP4588150B2 |
The present application relates to polymeric resinous material comprising (1) from 15 to 39 weight percent units derived from limonene; (2) from 15 to 39 weight percent units derived from dicyclopentadiene; and (3) from 46 to 70 weight p...
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JP4587679B2 |
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JP4587635B2 |
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JP4576737B2 |
A radiation-sensitive resin composition used as a chemically amplified positive tone resist responsive to short wavelength active radiation such as KrF excimer laser and ArF excimer laser is disclosed. The resin composition comprises: (A...
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JP4578971B2 |
This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or...
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JP4567158B2 |
A photosensitive polymer having a cyclic backbone and containing an alicyclic compound and a resist composition obtained therefrom are provided. The photosensitive polymer has a weight-average molecular weight of between about 3,000-100,...
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JP2010215880A |
To provide a novel liquid resin, and an adhesive composition blending it, which exhibits an excellent adhesive property.The terpene-based liquid resin is obtained by copolymerizing a terpene monomer with an aromatic monomer in the presen...
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JP4544389B2 |
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JP2010195704A |
To provide a novel oxetane derivative necessary for preparation of a crosslinkable liquid crystal film excellent in orienting properties, heat resistance and molding processability, and a crosslinkable liquid crystalline polymer obtained...
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JP2010189619A |
To provide a norbornene-based polymer that is variously applicable as a low-loss insulating material and an insulation material produced using the same.A norbornene-based polymer has at least one substituent selected from the group consi...
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JP4529245B2 |
A chemically amplified positive resist composition is provided which is excellent in sensitivity and resolution; and comprises a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the act...
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JP4529247B2 |
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JP4525912B2 |
A chemically amplified resist composition using an alternating copolymer of alpha-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etch...
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JPWO2008133311A1 |
Provided is a resist protective film composition for immersion lithography. A polymerizable compound having a hydroxy group, a carboxy group, a sulfonic acid group, a sulfonylamide group, an amino group or a phosphoric acid group (m)b bR...
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JP4506968B2 |
A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less...
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JP4493660B2 |
There is provided a retardation film that has high moisture resistance and good dimensional stability and can be incorporated into, for example, a liquid crystal display, to be effectively used for improvements in the visual quality of l...
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