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JP3773545B2 |
PURPOSE: To obtain a copolymer useful for moldings, etc., in a high space-time yield by polymerizing a polycyclic olefin, a cycloolefin, a noncyclic olefin, which are specified respectively and mixed in a specified ratio, in the presence...
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JP3773546B2 |
PURPOSE: To efficiently obtain the subject copolymer excellent in low temperature characteristics such as low temperature impact resistance and suitable as a molding material for automotive external parts, etc., by copolymerizing ethylen...
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JP2006106606A |
To provide an optical film which can be simply and inexpensively manufactured, is excellent in mechanical characteristics and thermal durability, has low specific gravity, low birefringence, low photoelastic modulus and low wavelength di...
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JP2006096812A |
To provide a cycloolefinic resin composition containing an epoxy group and most suitable for a surface protection film for a semiconductor element and provide a semiconductor device to improve poor workability in the production of a resi...
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JP3761078B2 |
To provide a polymer which contains repeating units derived from perfluoro-2,2-dimethyl-1,3-dioxole; and a chemical-amplification-type resist composition containing the same. This resist composition contains (a) a photosensitive polymer ...
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JP3758973B2 |
To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same. The photosensitive polymer is represented by formula I (wherein R1 is an a...
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JP3755361B2 |
To provide a copolymer capable of taking a structure contg. no halogen regarded questionable from a view point of environmental pollution, transparent, and excellent in flexibility and heat resistance, an efficient manufacturing method o...
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JP2006056920A |
To provide a molded product of a cyclic olefinic polymer maintaining transparency and suppressing discoloring or fading.The method for producing the molded product of the cyclic olefinic resin is carried out as follows. A polymer represe...
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JP2006057105A |
To provide a method for efficiently producing a copolymer transparent, excellent in flexibility and heat resistance and capable of containing no halogen viewed with suspicion from a viewpoint of environmental pollution.The method for pro...
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JP3749674B2 |
A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a h...
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JPWO2004035641A1 |
It has a structural unit derived from a fluorine-containing ethylenic monomer and / or a structural unit derived from a monomer that may contain a fluorine atom capable of imparting an aliphatic ring structure to the polymer main chain, ...
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JP3745620B2 |
The invention refers to a linear, isotactic polymer which has a structure of one or several C2 to C20 olefins, of which the isotacticity, due to a statistic distribution of stereoscopic errors in the polymer chain, is within the range of...
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JP2006036891A |
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen atom, a ha...
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JP2006036892A |
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen atom, a ha...
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JP2006036890A |
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The β-carboxy-α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen...
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JP2006028525A |
To provide a method of producing at least one homopolymer of a cationically polymerizable monomer, or producing a copolymer from the monomer and a norbornene-type monomer, and to provide a polymer which is obtained by the production meth...
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JP3741522B2 |
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JP2006022266A |
To provide a resin composition having improved transfer properties at molding of an optical lens or the like such as various kinds of lenses of a pickup lens, a collimator lens or the like for an optical system of an optical disk, hardly...
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JP3739251B2 |
To provide a positive type resist composition used for laser light in the vacuum ultraviolet region as a positive type resist composition containing a base resin having solubility in an alkaline aqueous solution varied by the action of a...
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JP3739401B2 |
Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
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JP2006016533A |
To provide a copolymerization catalyst system industrially more simply synthesizable and having high polymerization activity and high copolymerizability and to provide a method for producing a copolymer of an α-olefin and a cyclic olefi...
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JP3736994B2 |
To obtain a resist composition, which is resistant to dry etching and is adapted for lithography using an ArF exima laser, by comprising a specific type of photosensitive polymer for chemical amplification-type resist and a photo acid-ge...
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JP3737012B2 |
To provide an antireflection film forming composition for forming a high hardness antireflection film on an article and an article with an antireflection film formed using the composition. The antireflection film forming composition cont...
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JP3736606B2 |
To provide a resist material suitable to a fine pattern forming material for producing VLSI, which is responsed to high energy rays and excellent in sensitivity, resolution and resistance to oxygen plasma etching at ≤300 nm wavelengths...
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JP3734015B2 |
To obtain a resist material used for a method for forming a pattern, inducing high energy line and excellent in sensitivity, resolution and plasma etching resistance at ≤180 nm, especially ≤160 nm of wavelength. This polymer is chara...
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JP3732695B2 |
To provide the photoresist cross-linking agent superior in the cross- linking ability by low exposure energy by incorporating a specified compound. The compound to be incorporated is represented by the formula in which each of R1, R2, an...
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JP2005536589A5 |
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JP2005331824A |
To provide a radiation-sensitive resin composition having excellent latitude characteristics of the focal depth, line edge roughness characteristics and line end foreshortening characteristics while keeping high resolution as a chemicall...
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JP3721190B1 |
Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions ...
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JP3720970B2 |
To obtain a photosensitive compsn. which has extremely little absorption on a light source of a short wavelength and has excellent solubility, alkaline developability, resolution and dry etching resistance by incorporating a polymer incl...
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JP2005535780A |
The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least o...
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JP2005535709A |
The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, othe...
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JP3719308B2 |
To obtain a random addition copolymer of a cyclic olefin having a polar group such as an ester group or an acid anhydride group with ethylene. This copolymer has (a) a structural unit derived from ethylene and (b) a structural unit deriv...
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JP2005325349A |
To provide a thermoplastic resin material having extremely small refractive index variation with temperature and provide an optical element produced by using the material.The thermoplastic resin material contains surface-treated inorgani...
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JP2005321685A |
To provide fluorine-containing copolymer for plastic optical fiber that is amorphous, flexible, low in transmission loss, and has a sufficiently high glass transition temperature (Tg).The fluorine-containing copolymer for plastic optical...
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JP3712043B2 |
To obtain a material for an antireflection film excellent in dimensional accuracy and aligning accuracy and capable of reproducibly forming a fine resist pattern. The polymeric compound is obtained by polymerizing a cyclic perfluoro mono...
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JP3712048B2 |
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays. The resist material contains a polymer having repeating units each con...
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JP2005532413A |
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultravio...
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JP2005290375A |
To provide a catalyst complex for polymerization and copolymerization of a cyclic olefin.In a method for polymerization and copolymerization of the cyclic olefin such as norbornene, the catalyst complex showing a high activity for polyme...
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JP3706805B2 |
To provide a photosensitive polymer, a resist composition containing the polymer and a method for producing the polymer. The photosensitive polymer is represented by formula I (where R1 is an acid decomposable tertiary alkyl; R2 is γ-bu...
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JP2005281219A |
To provide a new alicyclic structure-containing monomer capable of obtaining a polymer having extremely low birefringence and high heat resistance as well as excellent transparency and non-water absorbency.A norbornene derivative contain...
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JP3705734B2 |
To provide a new photoresist monomer that can be used in the far ultraviolet ray area. This monomer is a bicyclo compound represented by formula (1) (B means a group selected from those represented by formula II (R is H, a 1-10C alkyl, -...
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JP3703525B2 |
PURPOSE: To obtain a thermoplastic cycloolefin copolymer having excellent tensile strength and transparency and a high viscosity number by polymerizing a cycloolefin with an acryclic olefin in the presence of a specified catalyst. CONSTI...
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JP2005255732A |
To provide a manufacturing method for a hydrogenated cyclic conjugated diene copolymer excellent in impact resistance, heat resistance and transparency, and a resin molded product for optical applications made of the same.The manufacturi...
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JP2005255731A |
To obtain a hydrogenated cyclic conjugated diene copolymer excellent in impact resistance, heat resistance and transparency, and to provide a resin molded product for optical applications made of the same.The hydrogenated cyclic conjugat...
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JP3698437B2 |
A process for the preparation of ethylene polymers is disclosed, comprising the polymerization reaction of ethylene in the presence of a catalyst consisting of the reaction product of: (A) a mixture of the racemic and meso isomers of a s...
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JP2005247942A |
To obtain a low-molecular weight α-olefin/cycloolefin copolymer having many reactive double bonds on its terminals.This α-olefin/cycloolefin copolymer is the one comprising (A) a 2 to 30C linear or branched α-olefin and (B) a specifie...
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JP2005527662A |
A hydrocarbon mixture containing modified polycyclic aromatic compounds or modified PAC having a chemical structure of mean molecular weight ranging between 300 and 10,000, the chemical structure being represented by formula (I): (A)x(PA...
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JP2005527673A |
A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III:wherein R<1>, R<4>, R<5 >and R<6 >are each independen...
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JP2005227718A |
To provide a micropattern forming method using a highly practical fluorine-containing polymer capable of improving dry etching resistance with respect to a fluorine-containing polymer having high transparency to exposure light of a short...
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