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JP3994680B2 |
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JP3994486B2 |
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JP3988038B2 |
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JP2007254576A |
To provide a method for manufacturing a cycloolefin copolymer, the one formed by copolymerizing a cycloolefin, an alkenyl aromatic hydrocarbon and an α-olefin, which method gives a higher molecular weight copolymer. The method manufactu...
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JP2007231033A |
To obtain a copolymer or a modified copolymer that comprises an acenaphthylene derivative with excellent low hygroscopicity, low dielectric constant property, heat resistance, etc., in a resin backbone and has heat-curability and/or phot...
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JP2007525543A |
Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the ca...
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JP3971476B2 |
To obtain the subject copolymer, having a specific recurring unit and capable of producing a copolymer excellent in electrical characteristics such as permittivity and dielectric loss tangent and heat resistance and exhibiting excellent ...
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JP3962893B2 |
To provide a polymer compound which is sensitive to high-energy rays, is excellent in sensitivity particularly in a wavelength range of 170 nm or lower, and has improved transparency and excellent plasma-etching resistance. This polymer ...
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JP3957409B2 |
To obtain the subject resin having physical properties allowing the use as a copolymer resin for photoresist by copolymerizing two specific kinds of monomers in such a manner as to form a copolymer having a specific structure and improve...
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JP3955489B2 |
To provide a positive resist composition suitable for use under an exposure light source of ≤160 nm, particularly F2 excimer laser light (157 nm) and to concretely provide a positive resist composition having satisfactory transmittance...
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JP3953780B2 |
To provide a new polymer which has a high fluorine content, can have polar groups in the same molecule, and can form films having high adhesiveness to substrates, to provide an anti-reflective material coated with the polymer, and to pro...
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JP3953713B2 |
To provide a well-balanced laminated stretch film for packaging food, excellent in packaging properties such as practical heal sealability, finish properties or the like while putting characteristics possessed by a film comprising a cycl...
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JP3952135B2 |
To provide a resist material, having superior transmittance for vacuum UV rays, resistance against decrease in the solubility of the resist (like a negative resist) and durability against dry etching and showing small surface roughness a...
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JP3946449B2 |
To provide a photoresist monomer suitably used for a bilayer resist and a photoresist polymer containing such a monomer. The photoresist polymer comprises a compound bearing a silicon-containing group of chemical formula (4), an alicycli...
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JP3945309B2 |
To obtain a cyclic olefin copolymer improved in transparency, heat resistance and water resistance (low water absorption) by resolving the problems in conventional transparent resins and further improved in low birefringence and an impro...
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JP3944724B2 |
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially a chemically amplifying resist material, a resist material, and to provide a method for forming a pattern...
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JP3943445B2 |
To provide a photoresist monomer and a photoresist polymer that can be used with a VUV (157 nm) light source. This photoresist monomer is represented by the following formula (1) (wherein R1 is a 1-10C, substituted or unsubstituted, stra...
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JP3936503B2 |
To provide a resist composition which retains satisfactory intrasurface uniformity even in a thin film process and reproduces the desired resist pattern with high sensitivity and high resolving power. The positive photoresist composition...
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JP2007516321A |
The invention relates to a colored decoration material which is composed of a cycloolefin co-oligomer whose refractive index nD (25° C.) is from 1.50 to 1.60 and whose Abbé number is from 50 to 60. The technical properties of this mate...
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JP3934053B2 |
A hydrocarbon resin is prepared by (1) thermally polymerizing a mixture consisting essentially of (a) about 5 % to 25 % by weight styrene or aliphatic or aromatic substituted styrene, and (b) about 95 % to 75 % by weight based on total m...
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JP3933445B2 |
To provide a packaging material which has a paper layer, a barrier layer inside the paper layer and further a polyethylene layer inside the barrier layer and makes the outward appearance of a container excellent when used as the containe...
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JP2007138044A |
To provide a resin composition for an optical element, which is capable of improving optical stability and maintaining the property for a long time period, an optical element, a beam condesing unit, and an optical pickup apparatus.The re...
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JP2007133226A |
To ensure stable refractive index characteristics of a high refractive index and low birefringence.An objective lens 10 as an optical element is an optical element obtained by molding a resin composition for an optical element based on a...
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JP2007131771A |
To provide a resin composition which has resistance to environmental changes and light irradiation for long time and is used for optical elements, to provide an optical element molded from the resin composition, and to provide an optical...
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JP2007119660A |
To provide a cycloolefin addition copolymer excellent in heat resistance, transparency, low water absorption and moldability and capable of forming an optical material having a high linear expansion coefficient (high in temperature respo...
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JP3916532B2 |
To provide an interlayer insulating film which is low in dielectric constant and hygroscopic property and which at the same time is superior in mechanical strengths. The interlayer insulating film comprises a polymer in which a first mon...
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JP2007511651A |
The invention relates to a material whose technical properties, in particular its optical properties, give it excellent suitability as a decoration material. The material involves oligomeric cycloolefins, in particular cycloolefin homo-o...
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JP2007112863A |
To provide a method for preparing a cyclic olefin copolymer which does not produce oxidatively deteriorated components from the cyclic olefin, and excels in polymerization activity, has high efficiency of copolymerization of the cyclic o...
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JP3912484B2 |
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity for the wavelength of 200 nm or below, particularly 170 nm or below, besides in which plasma-etching resistance is improved by introducti...
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JP3912512B2 |
To obtain a new polymer silicone compound which is preferably usable not only as a material for a two-layer resist method, having high sensitivity and high resolution, especially suitable for forming a pattern with a high aspect ratio bu...
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JP3912516B2 |
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially chemically amplifying resist material, a resist material, and to provide a method for forming a pattern. ...
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JP3912483B2 |
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristi...
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JP3909829B2 |
To provide a positive resist composition having satisfactory transmittance at the time of using an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) and improved in line edge roughness and development defects...
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JP3907485B2 |
To provide a positive resist composition having highly transparency to radiations ranging from vacuum ultraviolet rays to visible rays, good adhesion to substrates, high film-forming properties, etc., and comprising a new fluorocopolymer...
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JP2007084733A |
To obtain a resin composition having excellent infrared absorption property, heat resistance, low water absorption and high transparency and an infrared absorbing molding using the same.The resin composition comprises an epoxy group-cont...
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JP2007084764A |
To provide a coating material having high heat resistance and transparency, further having good electric insulation, low water absorption and a low dielectric constant, and especially suitable for an optical material and a printed circui...
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JP2007084667A |
To provide a new cyclized copolymer having all the excellent heat resistance, transparency and melt moldability and to provide a method for producing the same.The cyclized copolymer is obtained by polymerizing a norbornene-based monomer ...
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JP3900276B2 |
To provide a resist material having excellent transmittance for vacuum UV rays, in particular, to provide a chemically amplifying positive resist material and a method for forming a pattern by using this resist material. The resist mater...
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JP2007078812A |
To provide a photosensitive resin composition excellent in adhesion, with the view to the situation that a pattern of a resin composition used so far peels from a base because of weak adhesion to the base in the case of using an aqueous ...
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JP3899771B2 |
To provide a chemically amplified positive type resist composition which shows good properties such as sensitivity, resolution, adhesion to a sub strate and the like and shows less dependence on the substrate to give a good profile even ...
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JP3895886B2 |
To obtain a polymer excellent in etching resistance and heat resistance and capable of forming a fine pattern by a dry developing process by adding a polymerization initiator to an organic solvent in which two specified compounds have be...
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JP2007506846A |
The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepare...
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JP2007063409A |
To provide a process for producing a cycloolefin copolymer from ethylene and/or a 3-20C α-olefin and a cycloolefin compound in a simpler and more efficient manner on an industrial scale.The cycloolefin copolymer is produced by copolymer...
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JP3890979B2 |
To provide a positive chemical amplification type resist composition having favorable various kinds of resist performances such as sensitivity and resolution and particularly excellent in dry etching durability. The positive resist compo...
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JP3889685B2 |
To provide a photosensitive polymer containing a hydroxyalkyl vinyl ether monomer unit, and a resist composition using the same. The photosensitive polymer has a weight-average molecular weight of 3,000-50,000 and contains an alkyl vinyl...
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JP3885841B2 |
To obtain a copolymer having a narrow molecular weight distribution, useful as a tacky agent, an adhesive, etc., and having high performances, by copolymerizing a specific cyclopentadiene with dicyclopentadiene and a vinyl- substituted a...
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JP3882706B2 |
To provide a base material covered with a coating material having excellent heat resistance, moisture resistance, chemical resistance and transparency and excellent adhesion, adhesive properties and destruction characteristics and to pro...
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JP3879829B2 |
To provide a resist material which is sensitive to high-energy rays and is excellent in the sensitivity at a wave length of 200 nm or less, especially of 170 nm or less. The polymer compound has repeating units (m unit and n unit) expres...
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JP3876982B2 |
To provide a polymer compound having excellent reactivity, stiffness and adhesivity with a substrate and less swelling at the development, a resist material using the polymer compound as the base resin, and having largely improved resolu...
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JP3874061B2 |
To provide a resist material which exhibits a little absorption especially at the exposure wavelength of an F2 excimer laser, can be used as an alkali-developable resist material, can easily form a fine pattern vertical to a substrate bo...
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