| Document |
Document Title |
|
JP3876164B2 |
To provide a high molecular compound having excellent reactivity, inflexibility and adhesion to a substrate and less liable to swell in development and a resist material using the high molecular compound as a base resin and having much h...
|
|
JP3874094B2 |
To provide a resist material which is sensitive to high-energy radiation and excellent in sensitivity to rays of a wavelength of 200 nm or shorter, particularly 170 nm or shorter. This resist material comprises a polymer compound having ...
|
|
JP3874093B2 |
To provide a resist material which is sensitive to high-energy rays and is excellent in the sensitivity at a wave length of 200 nm or less, especially of 170 nm or less. The polymer compound contains repeating units expressed by formulae...
|
|
JP3874070B2 |
To obtain a resist material responsive to a high-energy ray, having excellent sensitivity, resolution and oxygen plasma etching resistance at a wavelength of ≤300 nm, consequently the resist material capable of being made into an excel...
|
|
JP3871721B2 |
PURPOSE: To provide a cycloolfin copolymer which is excellent in clarity, resistance to heat distortion, and hardness and is chemically inert and resistant to hydrolysis. CONSTITUTION: This cycloolefin copolymer has a solution viscosity ...
|
|
JP3872808B2 |
To provide novel catalyst compositions useful for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers. Transition metal compounds such as...
|
|
JP3871024B2 |
To provide a resist material having a high contrast in alkali dissolution rate before and after exposure, having high sensitivity and high resolution and exhibiting superior etching resistance by adding a high molecular compound obtained...
|
|
JP3869166B2 |
To obtain a new compound of a polyalicyclic derivative containing oxygen or sulfur in the cyclic compound, and having hydroxy group, excellent in etching resistance and useful for a photoresist. This new compound is a photoresist monomer...
|
|
JP3868196B2 |
To obtain both a photosensitive polymer suitable for a lithographic technique with an ArF excimer laser and a resist composition prepared from the polymer. This photosensitive polymer is represented by the chemical formula 1: [R1 is t-bu...
|
|
JP2007004131A |
To suppress adherence of dust and stain due to the environment, to obtain an optical element that can maintain optical characteristics for a long period of time, and to have superior durability and reliability, and to obtain an optical p...
|
|
JP3867778B2 |
To provide a resist material such as a chemical amplification type resist material having very high contrast between velocity of dissolution in alkali before exposure and that after exposure, high sensitivity, high resolution and particu...
|
|
JP2006342290A |
To provide a modified low molecular weight ethylenic polymer excellent in adhesiveness, printability, compatibility in polymer blends, mold releasability at high temperatures, fixability at low temperatures, dispersibility of pigments, i...
|
|
JP3859585B2 |
To obtain a cyclic diene copolymer which is prepared by copolymerizing an unsaturated compound with an easily producible cyclic conjugated diene monomer having a high polymerization activity. This bicyclic conjugated diene copolymer is p...
|
|
JP3859391B2 |
To obtain a photosensitive polymer having high etching resistance and further excellent in adhesive strength to a lower film material, a dissolution suppressant and a chemical amplification type photoresist composition containing the pho...
|
|
JP2006335774A |
To provide a method for producing a fluorine-containing polymer for photoresist transparent in a vacuum ultraviolet region, especially F2 laser (157 nm) beams and having excellent solubility in alkali developers and to provide a photores...
|
|
JP3855770B2 |
To provide a radiation-sensitive resin composition having high transparency for radiation, excellent basic performances as a resist such as sensitivity, resolution, dry etching durability, pattern profile, and suitable as a chemical ampl...
|
|
JP3854494B2 |
To provide a method for producing an olefin-based copolymer having a cyclic structure, which comprises ethylene and dicyclopentadiene or tricyclopentadiene, and a cyclic olefin to be introduced at need, for copolymerization. A catalyst c...
|
|
JP3847783B2 |
Polymers are disclosed consisting essentially of units derived from the monomers ethylene and a compound of the formula CH2=CH(CH2)mCO2R<1>, wherein R<1> is hydrogen, hydrocarbyl or substituted hydrocarbyl, and m is 0 or an integer from ...
|
|
JP3847454B2 |
To provide a photoresist having an excellent pattern profile and an excellent substrate close contact characteristic by making resin that is dissolved by the action of acid to thereby increase its soluble characteristic to alkali, contai...
|
|
JP3847991B2 |
To solve a problem of malodor and to provide a photoresist having an excellent resolution. A copolymer resin is obtained from a law material containing a monomethyl-cis-5-norbornene-endo-2,3-dicarboxylate monomer. A photoresist comprises...
|
|
JP2006307194A |
To provide a cyclic olefinic copolymer excellent in the balance between thermal resistance and strength.This cyclic olefinic copolymer is produced by copolymerizing an α-olefin having a carbon number of 2 to 30 with a cyclic olefin repr...
|
|
JP2006299194A |
To provide a new (meth)acrylic copolymer with low water absorption property that is suitable for use as a material for a molded article such as an optical material, a sheet suffering from the problem of curling caused by water absorption...
|
|
JP2006301278A |
To provide a positive resist composition for liquid immersion exposure which is used in manufacturing processes of a semiconductor such as an IC, fabrication of a circuit board of a liquid crystal, a thermal head or the like, and other p...
|
|
JP2006297843A |
To provide a fluororesin laminate of a fluorine-containing imparting strong adhesive properties to polyamide resin, copolymer general-purpose resins such as a polyolefin resin and various kinds of engineering resins.This laminate (I)/(II...
|
|
JP3841406B2 |
To provide a resist composition excellent in sensitivity, resolving power and profile. The resist composition contains a specified sulfonium compound which contains a group having a -CON- bond or a -SO2N- bond and generates an acid upon ...
|
|
JP3839218B2 |
To provide a new polymeric silicon compound having high sensitivity and high resolution, which is not only used preferably as a material for two- layered resist method particularly suitable for forming a pattern of high aspect ratio, but...
|
|
JP2006293331A |
To provide an optical compensation sheet which has a small optical characteristic change with respect to an environmental temperature/humidity changes and has high freedom of design of in-plane retardation Re and film-thickness-direction...
|
|
JP3835506B2 |
To obtain a new compound useful as a monomer for a copolymer resin, for photoresist, which is used for ultra-short wavelength light sources such as ArF, has high transparency at a specific wavelength, high etching resistance, a high prot...
|
|
JP3830739B2 |
To obtain a fluorine-containing copolymer soluble in many general-purpose solvents, capable of giving a transparent coating film and comprising a principal chain having a ring structure having a saturated perfluoro group. A fluorine-cont...
|
|
JP3828577B2 |
|
|
JP3829913B2 |
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays. The resist material contains a polymer having repeating units each con...
|
|
JP2006255996A |
To provide a sheet suitable as the material of a packaging member high in flexibility and moistureproofness and having hygroscopicity, a packaging sheet comprising the sheet, and a PTP and blister pack package obtained by molding the she...
|
|
JP2006241399A |
To provide a composition exhibiting high-level processability and sufficient compatibility with ordinary polymers used in forming packaging materials, and having significant deoxigenating capacity either singly or as part of a film or ar...
|
|
JP2006233117A |
To obtain an olefin-terpenoid copolymer having a low gel content and to provide a method for producing the same.The olefin-terpenoid copolymer is obtained by copolymerizing an olefin with a terpenoid containing at least one unsaturated b...
|
|
JP3817015B2 |
To obtain a cycloolefin copolymer having high heat insulating properties and a high clarity by selecting a cycloolefin copolymer comprising structural units derived from a linear or branched α-olefin, a cycloolefin, and an arom. vinyl c...
|
|
JP2006206630A |
To provide an ethylene-acenaphthylene copolymer excellent in optical properties and its manufacturing method.The ethylene-acenaphthylene random copolymer is obtained by copolymerizing ethylene and an acenaphthylene derivative represented...
|
|
JP3805988B2 |
To obtain a photosensitive polymer comprising an alkyl vinyl ether copolymer and a resist composition containing the same. The photosensitive polymer comprises an alkyl vinyl ether/ maleic anhydride copolymer represented by formula I [wh...
|
|
JP2006203213A |
To provide a lens composition of a light-emitting diode device for a liquid crystal display which has high resistance to heat and high transparency, and also to provide a light-emitting diode device comprising the same, a backlight unit ...
|
|
JP3803173B2 |
To obtain the subject rubber composition capable of exhibiting excellent hermetically sealing property, weatherability, creep resistance, etc., by including an ethylene α-olefin-polyene amorphous copolymer exhibiting a specific structur...
|
|
JP3804735B2 |
To obtain an antireflection material which exhibits a high surface hardness, a high scratch resistance, an excellent durability, a low reflectance, a high light transmission, a good adhesion to a transparent material, and an excellent fi...
|
|
JP2006193554A |
To provide a cyclohexene copolymer which consists of ethylene and/or a 3-20C α-olefin and of a substituted and/or an unsubstituted cyclohexene, and an industrially manufacturing method thereof, and also a molded body comprising this cop...
|
|
JP3800554B2 |
To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole. The resist composition includes: (a) a photosensitive polymer comprising (a-1) ...
|
|
JP3800318B2 |
To provide a resist material, a base resin of which is a polymer compound by this invention, which is useful for the microfabrication by the electron beam or far ultraviolet ray because the material is sensitive to a high energy beam and...
|
|
JP3801018B2 |
To obtain a cycloolefin based addition copolymer that contains a reactive silyl group having a specific structure, has excellent optical transparency, heat resistance and adhesiveness, and can produce crosslinked substance having improve...
|
|
JP3796568B2 |
To provide a resist material excellent in stability when allowed to stand in vacuum after exposure with electron beams, hardly causing trail on a Cr substrate and excellent in sensitivity, resolution and plasma etching resistance. The re...
|
|
JP2006178150A |
To provide an optical lens having small distribution of refractive index and small aberration of the lens (the deviation of focal length) in the inside part of of the lens.The optical lens is obtained by forming an α-olefin monomer norb...
|
|
JP3793453B2 |
To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer. This acid-labile polymer is represented by the formula 1 wherein R...
|
|
JP2006152173A |
To provide a resin composition which has excellent electric characteristics and gives a resin layer for a circuit board having a good adhesion to the base material and can have micro via holes created by laser, also to provide a carrier ...
|
|
JP2006143930A |
To provide an optical element improved in light stability and capable of sustaining the stability for a long time, to provide a method for producing the same, and to provide an optical pick-up device given by using the optical element.Th...
|
|
JP3783780B2 |
To provide (1) a resist material containing a polymer compound as a base resin which contains an ester compound giving a polymer compound with excellent acid decomposing property as a structural unit and which realizes the sensitivity, r...
|
