| Document |
Document Title |
|
JP3355045B2 |
A polymer alloy containing a) one or more cycloolefin copolymers and b) one or more types of core/shell particles.
|
|
JP2002348324A |
To provide a polymer having a polycyclic cycloolefin, and having a high viscosity and a high glass transition temperature. A polycyclic cycloolefin such as norbornene in an amount of 0.1-100 wt.%, and at least one of 0-99.9 wt.% of a mon...
|
|
JP2002348333A |
To provide a norbornene copolymer for a photoresist which has transparency, high sensitivity, high resolution and etching resistance in order to be suitable for fine fabricating ultrahigh integrated semiconductor by excimer laser; a meth...
|
|
JP2002338627A |
To obtain a polymer compound which exhibits a high etching resistance when used for a photoresist.This polymer compound contains at least one kind of monomer unit selected from monomer units represented by formulas (Ia)-(Ig) [wherein Ra ...
|
|
JP2002338633A |
To provide a polymer compound which is sensitive to a high-energy ray, is excellent in sensitivity, resolution, and etching resistance, and hence is useful for fine processing using an electron beam or ultraviolet rays.This polymer compo...
|
|
JP3350951B2 |
|
|
JP2002332304A |
To provide a copolymer latex excellent in stability during polymerization, and capable of giving excellent workability, adhesive strength, and blister resistance when used as a binder for paper coating.In this manufacturing method for a ...
|
|
JP2002332315A |
To obtain a coating material composition which has low foaming properties and excels in mechanical stability, chemical stability, water washability, and operating characteristics, and to prepare a paper coating copolymer latex from which...
|
|
JP2002327022A |
To provide a fluorine-containing maleimide-based copolymer which can be used for various applications including an electronics material, substrate material or the like since it has excellent heat resistance and thermal stability and it c...
|
|
JP2002322185A |
To provide a composition of a highly reactive trialkoxysilyl group- containing norbornene compound which shows high reactivity when used in various polymerization processes and also shows high modification rate when used as a resin-modif...
|
|
JP2002322450A |
To newly develop a resin tackifier having a good color tone, easy polymerized and having excellent adhesive properties such as adhesion, cohesion power and tackifying ability.This tackifier resin is obtained by polymerizing (A) 8-10C aro...
|
|
JP2002303981A |
To provide a positive type photoresist composition for exposure with far UV having high resolving power, good fitness for a halftone phase shift mask (side lobe light resistance) and lowered density dependency.The positive type photoresi...
|
|
JP3334106B2 |
To obtain a cycloolefin-based polymer having a large viscosity number and a high glass transition temperature, and useful for the extrusion molding of film, or the like, by copolymerizing a polycyclic olefin and an acyclic olefin under a...
|
|
JP3332368B2 |
The prodn. of cycloolefin polymers (COC) comprises the polymerisation of (a) 0.1-100 wt.% monomer(s) of formula (I), (II), (III) or (IV), (b) 0-99.9 wt.% cycloolefin of formula (V) and (c) acyclic 1-olefin(s) of formula (VI), at -78 to +...
|
|
JP2002531648A |
A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonaptha...
|
|
JP2002265890A |
To provide a substrate which is used for an adhesive tape, generates no poisonous gas such as chlorine gas, is scarcely tacky, and has the same flexibility as that of polyvinyl chloride tape.This substrate for the adhesive tape comprises...
|
|
JP2002265530A |
To obtain a resin for photoresist which is excellent in homogeneity and can give a fine pattern with a high resolution.A compound represented by formula (1) (wherein Ra is H or methyl; and R1 is a 1-10C hydrocarbon group) is provided.
|
|
JP2002529573A |
(57) [Summary] The present invention is (A) at least one substantially random interpolymer of 0.1-100 wt% (based on the total weight of the coating formulation) and (1) (i) at least one vinyl. Alternatively, a vinylidene aromatic monomer...
|
|
JP3320475B2 |
|
|
JP2002241442A |
To obtain a resin for photoresist capable of giving a fine pattern having high resolution excellent in homogeneity.In the resin for photoresist there is used a compound represented by general formulas (1a) and (1b) (wherein, R1 is a hydr...
|
|
JP2002526623A |
The present invention relates to a polymer composition comprising one or more cycloolefin copolymers and one or more suitably formulated additives, having improved resistance to stress cracking in air or else in contact with media which ...
|
|
JP3315729B2 |
|
|
JP2002220424A |
To provide a useful maleimide copolymer as a resist resin excellent in the drying etching resistance.The copolymer contains the units represented by the formulas (1) and (2) [R is an alkyl group which may have a substituted group; Z ring...
|
|
JP2002214786A |
To provide a positive photoresist composition excellent in PED stability and capable of preventing the occurrence of development defects in the production of a semiconductor device.The positive photoresist composition contains a compound...
|
|
JP2002523571A |
Olefins such as ethylene and propylene may be polymerized by using as catalysts novel selected transition metal complexes of bis(carboximidamidatonates) in which the carboximidamidatonate groups are connected together through covalent bo...
|
|
JP2002202607A |
To provide a positive type photoresist composition for exposure with far UV having improved exposure margin and defocus latitude in the resolution of a contact hole pattern.The positive type photoresist composition contains a compound wh...
|
|
JP2002202605A |
To provide a positive type photoresist composition for exposure with far UV capable of preventing the occurrence of particles in the dissolution of solid components in a solvent and in storage over time and a variation of sensitivity due...
|
|
JP2002201226A |
To provide a radiation-sensitive resin composition which exhibits high transmission of various radiations, especially of far-ultraviolet rays represented by KrF excimer laser, and is excellent in sensitivity, resolution, adhesion to subs...
|
|
JP2002202606A |
To provide a positive type photoresist composition for exposure with far UV having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, capable of preventing the occurrence of particles in ...
|
|
JP2002521534A |
The invention relates to a process for the polymerization of ethene and optionally one or more other olefin monomers by contacting the monomers under polymerization conditions with a catalyst system obtainable by combining: (a) a palladi...
|
|
JP2002521464A |
The invention relates to the preparation of novel microparticles that can be obtained from at least one cyclic olefin copolymer using formulating materials, preferably diatom earth, and to the use of the microparticles for the controlled...
|
|
JP3301448B2 |
PURPOSE: To obtain a new modified copolymer rich in adhesivity, printability, hydrophilicity, polymer modifying properties, etc., by copolymerizing an α-olefin with a cyclic polyene and then modifying the resultant produced random copol...
|
|
JP2002196495A |
To provide a positive type resist composition which has high transmittance at 157 nm of a F2 excimer laser.The chemical amplification type positive type resist composition for a F2 excimer laser comprises a polymerization unit derived fr...
|
|
JP2002519487A |
Copolymers containing repeating units polymerized from at least one polycyclic monomer and at least one acrylic monomer are disclosed. The copolymer is formed by addition polymerization in the presence of a Group VIII transition metal ca...
|
|
JP2002179875A |
To obtain a heat-resistant resin composition having excellent thermal aging resistance and especially suitable as a liquid crystal substrate material, a semiconductor coating material and an adhesive for lens by compounding a cyclic olef...
|
|
JP2002179744A |
To obtain a maleimide-based polymer useful as a resin for a photoresist having excellent dry-etching resistance.This maleimide-based polymer comprises at least a unit expressed by the formula (1) (where ring Z denotes a polycyclic hydroc...
|
|
JP2002178453A |
To provide a laminate of cyclic olefin copolymers which is excellent in heat melting adhesion properties, a method for heat melting adhesion of the laminate, and a method for the heat melting adhesion between an olefin resin and a non-ol...
|
|
JP2002173513A |
To provide a fluorine-containing copolymer containing hydroxy group and having high transparency, ≤1.42 low refractive index (nD) and high glass transition temperature.This fluorine-containing copolymer comprises 1-60 mol% perfluorocyc...
|
|
JP2002174901A |
To provide a positive type photoresist composition for exposure with far UV excellent in density dependence of a contact hole pattern.The positive type photoresist composition contains (A) a compound which generates an acid when irradiat...
|
|
JP2002169290A |
To provide a photoresist resin which can form a fine pattern with excellent homogeneity and high resolution.The polymer to be used for the photoresist resin contains at least one kind of monomer unit expressed by formula (I). In the form...
|
|
JP2002155117A |
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristi...
|
|
JP3280445B2 |
PURPOSE: To obtain the subject copolymer free from catalyst residue, having excellent transparency and heat-resistance and useful for optical material, etc., by polymerizing ethylene and a specific cycloolefin, etc., in the presence of a...
|
|
JP3280444B2 |
PURPOSE: To obtain the subject copolymer free from catalyst residue, having excellent transparency and heat-resistance and useful for optical material, etc., by polymerizing a specific cycloolefin, a specific α-olefin and ethylene in th...
|
|
JP2002121231A |
To provide a method for producing an indene compound polymer and effective for easily improving the weight-average molecular weigh and the yield in the cationic polymerization of a copolymer containing an indene derivative monomer and an...
|
|
JP3277568B2 |
PURPOSE: To obtain a resin excellent in heat resistance, moisture resistance, transparency, low birefringent properties, chemical resistance, electrically insulating properties, mechanical properties, etc., by using a small amount of a h...
|
|
JP2002116544A |
To provide a positive type photoresist composition less liable to cause development defects in the production of a semiconductor device, excellent in adhesion on an inorganic antireflection film and excellent also in exposure margin (in ...
|
|
JP2002114827A |
To provide a cycloolefin polymer film or sheet having excellent heat- resistance and dimensional stability as well as excellent transparency, moisture- proofness, tearability, seal-openability, incineration suitability, low birefringence...
|
|
JP2002114820A |
To provide pellets for molding comprising molded cyclic olefin resin enabling a molding excellent in yield of products in a continuous operation suppressing generation of black spots, and a method of manufacturing the pellets for molding...
|
|
JP2002511503A |
The invention refers to a linear, isotactic polymer which has a structure of one or several C2 to C20 olefins, of which the isotacticity, due to a statistic distribution of stereoscopic errors in the polymer chain, is within the range of...
|
|
JP2002105131A |
To provide a cyclic olefinic polymer which has low birefringence, excellent mechanical characteristics, precision moldability, moisture resistance (low water absorption), and the like, is especially free from even a slight color, and has...
|
