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JP2001272785A |
To provide a chemical amplification type resist material having enhanced resolution by the narrow dispersing effect of a polymer as compared with a conventional base resin having a wide dispersity, giving a good resist pattern shape beca...
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JP2001516780A |
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radi...
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JP2001264985A |
To provide a chemical amplification type positive type photoresist composition which ensures improved edge roughness of a pattern, gives an excellent resist pattern profile and has high sensitivity.The positive type resist composition co...
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JP2001261743A |
To provide an olefin copolymer giving an elastomer having excellent flexing resistance and high adhesiveness and compatibility to other materials.The objective copolymer is composed of (a) a unit derived from a 3-12C α-olefin and (b) a ...
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JP3209562B2 |
PURPOSE: To obtain the transparent subject copolymer containing specific recurring units at a specific ratio, having each prescribed intrinsic viscosity and glass transition temperature, having excellent heat resistance and resistance to...
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JP3208602B2 |
PURPOSE: To obtain a copolymer suitable for photoresist being readily processed into thin film, etc., having high transparency in a far infrared region, comprising a specific adamantane, and a methacrylate derivative and a norbornene ske...
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JP3205339B2 |
119 The copolymer pellets of the invention are made from a cycloolefin random copolymer which is formed from ethylene and a cycloolefin and has a softening temperature of not lower than 70 .degree.C. The number of cyclohexane-insoluble f...
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JP2001235862A |
To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution.The radiation sensit...
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JP2001235865A |
To provide a positive photoresist composition giving a resist pattern with a suppressed change in line width when observed with a scanning electron microscope(SEM) in the production of a semiconductor device.The positive photoresist comp...
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JP3203029B2 |
PURPOSE: To obtain the title copolymer excellent in heat resistance and mechanical strengths by effecting the random copolymerization of ethylene with a specified aromatic-containing norbornene to form a product of a specified structure ...
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JP2001228612A |
To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in sensitivity, resolution, etc.The radiation sensitive resin composition contains (A) ...
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JP2001219434A |
To provide a method for manufacturing an optical film made of an amorphous cyclic olefin copolymer capable of solving a problem in manufacturing and having excellent transparency, surface properties and the like.In the case of manufactur...
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JP2001215703A |
To obtain a high molecular compound for a photoresist excellent in adhesion to a substrate and capable of accurately forming a fine pattern.The high molecular compound contains a monomer unit to formula I and may further contain at least...
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JP2001206915A |
To provide a styrenic copolymer which maintains the excellent characteristics of SPS, has a good balance between the glass transition temperature and the melting point, does not generate a gel after a heat treatment, and can be injection...
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JP2001509823A |
Blown films of linear low density polyethylene are produced by a high stalk process comprising extruding the linear low density polyethylene through an annular die to form an extruded tube of molten material, cooling the extruded tube wh...
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JP2001194786A |
To provide a positive type photoresist composition which solves the problem of the occurrence of development defects and scum in development in micro-photofabrication using far ultraviolet light and which is capable of giving a resist pa...
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JP2001187807A |
To provide a new photo resist polymer and a photoresist composition utilizing the same. The new photoresist polymer comprises a compound represented by formula 4 (wherein Y is H, R1 is H or a hydroxy protecting group, and the ratio a:b:c...
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JP3181955B2 |
PURPOSE: To markedly improve the activity of a polymerization catalyst, to develop a process which can dispense with any deashing step and to reduce equipment cost and energy cost by simply removing impurities such as a cyclic olefin oxi...
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JP2001154361A |
To provide a positive type photoresist composition which ensures the improved edge roughness of a resist pattern in the production of a semiconductor device and is excellent in preservability and density dependency.The positive type phot...
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JP2001154360A |
To provide a positive type photoresist composition which ensure the improved edge roughness of a resist pattern in the production of a semiconductor device and is excellent in low temperature preservability and density dependency.The pos...
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JP3173897B2 |
PURPOSE: To obtain a simply producible cyclic olefinic resin fiber having improved moldability, totally excellent strength, elasticity, heat resistance, handle, etc., comprising a random copolymer of ethylene and a cyclic olefin, etc. CO...
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JP3173841B2 |
PURPOSE: To provide a hydrogenated petroleum resin suitable for employment as an adhesive-imparting agent for white (pale colored) hot-melt adhesive compositions and having excellent compatibility, initial adhesive force (tack), adhesive...
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JP2001147536A |
To provide a positive type photoresist composition having sufficiently high sensitivity and resolving power in the formation of a contact hole pattern in the production of a semiconductor device, less liable to produce particles in a res...
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JP2001506293A |
The invention relates to a method for producing a cycloolefin copolymer by polymerization of 0.1-99.9 wt. %, with respect to the total amount of monomers, of at least one polycyclic olefin, 0-99.9 wt. %, with respect to the total amount ...
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JP2001125272A |
To obtain a positive type resist composition having high sensitivity and high resolving power, giving a rectangular photoresist, having good wettability with a developing solution, nearly free from development defects and ensuring a slig...
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JP2001122908A |
To provide a method for producing an indene-containing polymer, capable of improving the yield and the weight average molecular weight, and further to provide a molding material, a film or an additive, obtained by using the indene-contai...
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JP2001122912A |
To provide a method for producing an indene-containing polymer by which the yield and the weight average molecular weight are improved, and further to provide a molding material, a film or an additive obtained by using the indene-contain...
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JP2001122929A |
To provide a method for producing an indene-containing polymer and to obtain a molded material, a film or an additive using the indene- containing polymer excellent in low water absorbency, etc., and a component for an optical use using ...
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JP3160869B2 |
PURPOSE: To obtain a fluorocopolymer having a high Tg and suited for a coating material. CONSTITUTION: This fluorocopolymer comprises 30-65mol% repeating units derived from chlorotrifluoroethylene or tetrafluoroethylene, 5-45mol% repeati...
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JP2001106730A |
To provide a method for producing a cyclic olefin-based copolymer for improving its hue and light transmittance without harming its transparency, heat resistance, heat-aging resistance, chemical resistance, solvent resistance, dielectric...
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JP2001106737A |
To provide a photoresist resin composition that can improve the pattern appearance and has excellent durability and shows excellent durability, etching resistance, reproducibility, high resolving power and adhesion. The objective photore...
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JP2001106785A |
To obtain a photosensitive resin excellent in solubility in solvents and dry etching resistance which allows to easily produce a highly integrated semiconductor device. This photosensitive resin has at least three kinds of parts containi...
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JP2001098035A |
To provide a method of addition polymerizing (a) a norbornene type monomer having a carbon-carbon unsaturated bond in addition to a norbornene ring with high activity as in the case of (b) another norbornene type monomer such as 2-norbor...
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JP2001098036A |
To provide a resinous substance to be used in a tire tread to improve drag properties without reducing durability and tread abrasion resistance. A resinous substance comprises (1) 5-70 wt.% units derived from limonene, (2) 5-70 wt.% unit...
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JP3154999B2 |
The prodn. of cycloolefin polymers (COC) comprises the polymerisation of (a) 0.1-100 wt.% monomer(s) of formula (I), (II), (III) or (IV), (b) 0-99.9 wt.% cycloolefin of formula (V) and (c) acyclic 1-olefin(s) of formula (VI), at -78 to +...
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JP2001089538A |
To provide a method of producing an indene polymer capable of improving the yield and weight-average molecular weight, to obtain a molding material, a film or an additive using the indene-containing polymer excellent in low water absorpt...
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JP2001089537A |
To obtain an indene-containing polymer having low hygroscopicity and low birefringence properties, excellent in heat resistance and moldability and further having low permittivity properties and a molding material, a sheet or a film prep...
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JP3151862B2 |
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JP3150181B2 |
PURPOSE: To obtain a vibration-damping material showing vibration-damping properties in a wide temperature range by using a copolymer obtained by copolymerizing a cycloolefin with an α-olefin and having a specified Tg and a specified me...
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JP2001074915A |
To make decreasabe a region where harmful double refraction is generated near the surface of a lens molded body, and as a result, to avoid unnecessary increase in the width of the molded product and to decrease the cooling period for mol...
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JP2001072717A |
To obtain a film which is shrinkable at a low temp., which has a high shrinking rate and which hardly shows spontaneous shrinking by using a copolymer obtd. by copolymerizing ethylene and/or an α-olefin with a cyclic olefin and an arom....
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JP3141190B2 |
PURPOSE: To obtain the title copolymer having excellent thermal and mechanical characteristics by selecting the copolymer having structural units derived from a cyclic conjugatd diene, specific polymer chains, and a specified number aver...
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JP2001056927A |
To provide a substrate which is excellent in dimensional accuracy at the time of molding and has high dimensional stability at the time of practical usage by forming the substrate of cyclic olefinic copolymer selected from the copolymers...
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JP2001048910A |
To provide a process for producing a cycloolefin copolymer by copolymerizing a straight or branched-chain olefin and a cycloolefin in the presence of a catalyst containing a specific transition metal compound. A cyloolefin copolymer is p...
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JP2001026622A |
To provide the subject material which can prevent the deterioration of the durability and tread wear resistance of a polymer resin.A polymeric resinous material, comprising (l) 5-70 wt.% of a unit derived from limonene, (2) 5-70 wt.% of ...
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JP2001026692A |
To obtain a resin composition which has improved slippage, excellent transparence and surface gloss by making the composition comprise a cyclic olefin-based resin (A) or a resin composition composed of the cyclic olefin resin and a polyo...
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JP2001026693A |
To obtain a resin composition which has improved slippage, excellent transparence and surface gloss by making the composition comprise a cyclic olefin resin (A) or a resin composition composed of the cyclic olefin resin and a polyolefin ...
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JP2001019724A |
To obtain a film-forming composition having excellent coating performance and useful for electronic parts, insulation film, etc., by including an organic solvent and a polyphenylene derivative obtained by the reaction of a specific biscy...
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JP2001019723A |
To obtain the subject norbornene copolymer and trifluorostyrene (co)polymer excellent in heat resistance useful as a polyelectrolyte membrane for fuel cell by polymerizing norbornene, etc., and a monomer having doable bond which is induc...
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JP2001019710A |
To obtain an olefin polymer capable of eliminating or reducing the necessity of using a large amount of alumoxane cocatalyst by polymerizing an olefin monomer in the presence of a catalytic system containing a specific transition metal c...
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