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JP3557274B2 |
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JP2004235539A |
To provide a solar cell superior to flexibility, crashproof, transparency, and thermal resistance and having a semiconductor film formed by coating a composite for forming a silicon film on a base substance having a lower linear expansio...
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JP3554532B2 |
This invention relates to a chemically amplified positive photoresist composition comprising a polyatomic copolymer whose repeating units is represented by the following formula I, a low molecular additive represented by the following fo...
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JP3552828B2 |
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JP2004219822A |
To provide a positive type resist composition exhibiting sufficient permeability in the use of F2 excimer laser light (157 nm) as an exposure light source and satisfying coating property and compensating development defect.In the positiv...
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JP3550641B2 |
To provide a maleimide-norbornene copolymer composed of specific constituent units, capable of stably keeping the non-linear characteristics over a long period and giving a polymer material having good processability. The objective copol...
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JP2004210868A |
To provide a molding for automobile, excellent in marring resistance, having high gloss, and also excellent in weatherability.The molding for automobile has a part comprising an elastomer material containing an olefinic random copolymer ...
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JP3547376B2 |
To obtain the subject copolymer excellent in permeability at a specific wave length, etching resistance, heat resistance and adhesiveness by bringing the copolymer to contain a specific dicarboxylate compound having an aliphatic cyclic o...
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JP3545903B2 |
To obtain a copolymer, exposable to light by using the wavelength of an ArF excimer laser, good in resistance to dry etching and adhesive strength to a membranous material and used for a chemical amplification type resist developable wit...
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JP2004189764A |
To provide a tackifying resin excellent in tackifying performance, such as tackiness and holding power.The preparation process for the petroleum resin comprises copolymerizing a cyclopentadiene compound and an aromatic vinyl compound sub...
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JP2004190008A |
To provide a photosensitive resin composition curable at a low temperature.This resin composition contains a resin composed of a structural unit expressed by general formula (1) [R1 and R2 are each H, D (deuterium), F, Cl, Br, CF3, a 1-1...
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JP2004518018A |
The invention relates to the use of copolymers in cleaner formulations for preventing glass from corroding when cleaned in a dishwasher. The copolymers contain: a) 20 to 70% by weight of at least one monomer component (A) from the group ...
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JP2004161880A |
To provide a norbornene resin that has excellent molding processability and film processability and realizes both heat resistance and optical properties at the same time.The manufacturing process of the norbornene resin comprises copolym...
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JP3536015B2 |
To provide novel photoresist substances which can be used in the region of far ultraviolet rays. Photoresist compositions comprise a bisnor-bornene carboxylate represented by the formula or a polymer containing a bis(norbornene dicarboxy...
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JP3534127B2 |
PURPOSE: To obtain a new thermoplastic norbornene-based copolymer, excellent in transparency, low birefringent properties, moisture, water and chemical resistances, electrical characteristics and low eluting properties of impurities and ...
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JP2004514952A |
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a...
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JP2004144953A |
To provide a plastic-made optical element capable of easily maintaining excellent pickup characteristics by manufacturing a lens capable of maintaining highly accurate optical characteristics for a long time, and an optical pickup appara...
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JP2004512396A |
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containi...
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JP2004123994A |
To provide a method for manufacturing a copolymer from an α-olefin and a cyclic olefin, using a copolymerization catalyst that is more easily synthesized for industrial use, and has a high polymerization activity and can give a high deg...
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JP3520995B2 |
To provide a positive photoresist composition whose development defects are reduced in manufacturing of the positive photoresist composition and a pattern forming method using the same. The positive photoresist composition contains a res...
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JP3517471B2 |
PURPOSE: To obtain a high-mol.-wt. cycloolefin copolymer in a high yield by copolymerizing a 2C or higher α-olefin and a specific cycloolefin in the presence of a specific catalyst in a hydrocarbon solvent. CONSTITUTION: A cycloolefin c...
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JPWO2002014392A1 |
It relates to a method for producing a highly softening point aromatic petroleum resin having good solubility in a non-aromatic solvent and a printing ink containing the petroleum resin, and the production method has a boiling point of 1...
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JP2004109834A |
To provide a positive resist composition which is suitable when an exposure light source of ≤160 nm wavelength, in particular, F2 excimer laser light (at 157 nm) is used, and specifically, which exhibits sufficient transparency when a ...
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JP2004107385A |
To provide a new indene-hydroxystyrene copolymer and to provide a method for producing the copolymer and an epoxy resin composition comprising the copolymer compounded therein.The indene-containing copoloymer is a copolymer comprising 1-...
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JP3515949B2 |
To obtain a new photoresist monomer usable in a far ultraviolet region. This photoresist monomer is represented by formula (1) {E is any of substituent groups represented by formula (40), formula (41) or formula (42) [R1 to R13 are each ...
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JP3513202B2 |
PURPOSE: To obtain a fiber having good solvent resistance and thermal shape stability by specifying the residual catalyst amount of a cycloolefin copolymer. CONSTITUTION: At least a partially crystalline cycloolefin copolymer with 100 pp...
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JP2004093690A |
To provide a positive resist composition having satisfactory transmittance when F2 excimer laser light (157nm) is used and ensuring small line edge roughness, few development defects and excellent heat resistance.In the positive resist c...
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JP3506594B2 |
To provide the photosensitive film copolymer and its manufacture superior in etching resistance, heat resistance, and adhesiveness and capable of preventing rounding of the upper parts of a pattern and forming a sharp pattern high in res...
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JP2004074662A |
To improve adhesion/adhesive properties with another member by forming a film or a sheet having high appearance and shape stability without a wrinkle or a warp, providing a process which can remove the residual solvent of the film or the...
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JP2004077983A |
To provide a positive type resist composition with high sensitivity and of high resolution which shows sufficient transparency when a light source of ≤160 nm, concretely of F2 excimer laser light (157 nm) is used.The positive type resi...
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JP3503622B2 |
To provide a resist composition which is imaged with 193 nm radiation and developed to form a resist structure having high resolution and excellent etching resistance. The acid catalyst type positive type resist composition contains a co...
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JP2004067888A |
To provide a method for manufacturing an indene polymer wherein a polymer with a high molecular weight is easily obtained, and a polymer with excellent optical properties and low water absorption, and especially improved mechanical stren...
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JP2004059732A |
To provide a method for easily producing an indene-based polymer having good physical properties including optical properties, mechanical strength and low water absorptivity, and to provide high-quality and inexpensive molded products an...
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JP2004051949A |
To provide a material soluble in either one of toluene, cyclohexane and their mixture at 25°C, excellent in optical transparency, heat resistance and stiffness, having a small expansion coefficient and suitable for sheets, films and thi...
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JP2004505308A |
The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveg...
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JP2004504635A |
The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labil...
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JP3496237B2 |
PURPOSE: To obtain an acrylic copolymer having further improved strength characteristics, compression set, etc., by copolymerizing an alkyl (meth)acrylate, an alkoxyalkyl (meth)acrylate and a crosslinking monomer by a specific method. CO...
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JP2004503614A |
The present invention is directed to copolymers of norbornene and functional group containing norbornene comonomers and processes for the preparation thereof. These polymers may be random, alternating or block copolymers or terpolymers, ...
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JP2004026969A |
To economically provide a hydrogenated copolymer preferably used for a hot melt adhesive or the like as an adhesiveness donating agent having a high softening point and a high softening point copolymer used for its raw material.The high ...
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JP2004018753A |
To provide a method for producing an α-olefin-cycloolefin copolymer having high molecular weight and broad molecular weight distribution, keeping excellent polymerization activity especially even in a non-aromatic solvent without loweri...
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JP2004018832A |
To provide a coating material for a metal pipe which can improve a defect caused in graft-modification of a polyolefin using a conventional silane coupling agent and can express a high adhesive strength so far unattainable, and also to p...
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JP2004002721A |
To provide a copolymer having excellent heat resistance and usable for an optical product.The copolymer is obtained by copolymerizing ethylene and/or a linear α-olefin, a cycloolefin and the following vinyl compound (1): the vinyl compo...
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JP2004004703A |
To provide a positive chemically amplified resist composition suitable for F2 excimer laser lithography, which is good in various kinds of resist performance such as sensitivity and resolution, and is particularly excellent in dry etchin...
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JP2004500596A |
Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography are described. These photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneous...
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JP3476783B2 |
To provide a copolymer which can be easily processed to form e.g. a thin film, has high light transmittance in the far ultraviolet region, and is suitable for a photoresist in the semiconductor manufacturing technology. The copolymer is ...
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JP3476466B2 |
Addition polymers derived from norbornene-functional monomers are terminated with an olefinic moiety derived from a chain transfer agent selected from a compound having a terminal olefinic double bond between adjacent carbon atoms, exclu...
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JP2003345018A |
To provide a positive resist composition having a sufficient transmitting property at ≤160 nm wavelength, practically when a light source of F2 excimer laser light (at 157 nm) is used, and having high sensitivity, high resolution and a...
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JP2003335826A |
To provide a radiation-sensitive resin composition, particularly a copolymer useful as a resin component of the same, high in transparency to radiation; excellent in basic characteristics of a resist such as sensitivity, resolution, and ...
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JP2003535097A |
The invention relates to a method for producing special transition metal compounds, to novel transition metal compounds and to their use for the polymerization of olefins.
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JP3470967B2 |
To provide a photoresist composition having so improved resolution as to enable high resolution lithography performance using imaging radiation of 193 nm. The photoresist composition is obtained by using an imaging copolymer so as to imp...
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