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WO/2023/143899A1 |
The invention relates to a method for coating a substrate (1), at least comprising the following steps: a) providing the substrate (1); and b) coating a surface (2) of the substrate (1) with a coating (3), wherein the coating process tak...
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WO/2023/145955A1 |
A mask according to the present invention comprises: a first layer which comprises a first surface, a second surface that is positioned on the reverse side of the first surface, at least one first opening that penetrates the first layer ...
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WO/2023/143719A1 |
A method of operating a coating system provided in a vacuum chamber is described. The coating system includes a coating drum for transporting a substrate, at least one electron beam gun for evaporating a coating material, and an electron...
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WO/2023/145440A1 |
The present invention provides a method for producing a novel electrical wiring line which is suited to the demands for weight saving and space saving, and which can be produced at a low cost. A method for producing a film wire, wherei...
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WO/2023/145951A1 |
A vapor deposition mask according to the present disclosure is provided with a silicon-containing mask substrate, a mask layer having a first surface and a second surface that is located on the opposite side from the first surface and th...
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WO/2023/143884A1 |
The invention relates to a transparent substrate (1000) provided, on one of its main surfaces, with a stack (1001) of thin layers, the stack (1001) of layers consisting of the following layers starting from the substrate (1000): - a firs...
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WO/2023/141967A1 |
An oxide semiconductor target and thin film, a thin film transistor, and a method for improving the stability and mobility of the thin film transistor. The oxide semiconductor target comprises a matrix oxide semiconductor material and po...
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WO/2023/145498A1 |
A sputtering target material according to the present invention is composed of oxides containing indium (In), zinc (Zn), and tantalum (Ta) such that the atomic ratios of the respective elements satisfy all of formulae (1) to (3). (1) 0.1...
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WO/2023/143857A1 |
The invention relates to a method for producing an MxAl1-xN-based thin film with a metastable cubic crystal structure exhibiting a high thermal stability allowing its use in high temperature applications, wherein M = Ti, V or Zr, wherein...
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WO/2023/143772A1 |
The present invention relates to a coating chamber and to a method for coating substrates with a distance detection for the substrates.
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WO/2023/145808A1 |
[Problem] To provide: a crystal having excellent shape memory properties and corrosion resistance; a multilayer structure, an electronic device and an electronic instrument each containing the crystal; and methods respectively for produc...
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WO/2023/145499A1 |
A sputtering target according to the present invention is formed by using a bonding material to bond a plurality of sputtering target members to a substrate. The sputtering target members are composed of oxides containing indium (In), zi...
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WO/2023/144222A1 |
The invention relates to a transparent substrate (1000) provided on one of its main surfaces with a stack (1001) of thin layers, said stack (1001) of layers consisting of the following layers starting from the substrate (1000): - a first...
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WO/2023/141145A1 |
Embodiments of the present disclosure generally relate to composite PVD target. The target has a diameter, a connection face, a substrate face opposite the connection face, a thickness between the connection face and the substrate face, ...
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WO/2023/138768A1 |
The invention is related to a method of using a thermal laser evaporation (TLE) system (100), the system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction...
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WO/2023/138769A1 |
The invention is related to a method of using a thermal laser evaporation (TLE) system (100), the system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction...
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WO/2023/141332A1 |
A method includes applying a bond layer of a first chemical composition to a first surface of a first metal body. The metal body is of a second chemical composition. The method further includes disposing a second metal body of the second...
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WO/2023/139214A1 |
An electrode for electrochemical applications is coated with a layer of a-C, wherein the layer of a-C comprises at least 10 each of first and second sub-layers, being • (i) first sub-layers having high conductivity with a sp2 content o...
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WO/2023/140536A1 |
This mask assembly comprises: a frame comprising long side portions each extending in a first direction and being spaced apart from one another in a second direction crossing the first direction, and short side portions which are connect...
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WO/2023/138625A1 |
The present invention provides a micro-channel matrix optical waveguide flat plate. The micro-channel matrix optical waveguide flat plate is formed by vertically overlapping two optical element groups; each optical element group is compo...
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WO/2023/141409A1 |
A method of manufacturing is provided. The method can include determining a cross- sectional shape of an object to be inspected using a sensor configured with a sensor coil. The method can also include providing a substrate having a prof...
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WO/2023/139957A1 |
In a case in which the capacitance of a capacitance element that is provided to an antenna is increased, a current is made to flow sufficiently evenly to each second electrode of said capacitance element. An antenna (3) comprises an ante...
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WO/2023/138767A1 |
The present invention relates to a temperature control system (10) for adjusting a temperature (60) of a vacuum chamber (102), the temperature control system (10) comprising conduits (20) which can be thermally coupled to a chamber wall ...
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WO/2023/140105A1 |
The present invention provides an article comprising an intermediate layer positioned on a substrate, and a surface treatment layer which is positioned on the intermediate layer and formed from a surface treatment agent including a fluor...
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WO/2023/139347A1 |
The invention relates to a method of depositing a coating layer comprising a step of sputtering a target comprising silicon, aluminium and samarium under an atmosphere comprising a noble gas, oxygen and nitrogen to form the coating layer...
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WO/2023/136096A1 |
This holding device, which is for holding an object on a first surface of a disk-shaped first plate member, comprises: the first plate member having the first surface and a second surface provided at the side opposite to the first surfac...
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WO/2023/136144A1 |
Provided are: a surface treatment agent from which a surface layer having excellent friction durability can be formed; an article having the surface layer; and a method for manufacturing the article. A surface treatment agent accordin...
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WO/2023/136546A1 |
Provided are a mask, a mask assembly including the mask, and a substrate transport equipment including the mask. The present invention includes a mask including a frame including an opening, an accommodation structure disposed on the fra...
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WO/2023/136212A1 |
A surface-coated cutting tool wherein: 1) a coating layer includes a layer in which layer A and layer B are alternately laminated; 2) layer A is represented by Al1-aTiaN (0.30≤a≤0.70); 3) layer B is represented by Cr1-cM2cN (M2 is at...
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WO/2023/136143A1 |
Provided are a surface treatment agent capable of forming a surface layer having exceptional friction durability, an article having the surface layer, and a method for producing the article. The surface treatment agent according to the...
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WO/2023/134484A1 |
Provided in the embodiments of the present application is a coating apparatus, which can form a high-precision pattern coating on a base film, thereby improving the performance of an assembly (such as a current collector) comprising the ...
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WO/2023/132144A1 |
The present disclosure addresses the problem of providing an oxide film having a low carrier concentration and high carrier mobility, and an oxide sputtering target suitable for forming said oxide film. Provided is an oxide film containi...
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WO/2023/131379A1 |
The invention relates to a method for producing at least one photoactive layer of a layer system of an organic electronic component, wherein, when the at least one photoactive layer is being applied, energy is introduced into the at leas...
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WO/2023/132276A1 |
Provided are: a composition capable of forming a surface layer having excellent lubricity; a method for producing the composition; a coating liquid; an article; and a method for producing the article. This composition contains two or m...
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WO/2023/132130A1 |
This surface treatment device (10) is for forming a film on a surface of a material to be treated (W) in a chamber (20), said device comprising: an HCD electrode (210) (electrode) (or a sputtering electrode (220) (electrode)), which is a...
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WO/2023/131099A1 |
The present invention provides a method, device and system for preparing a composite metal foil. The device comprises: primary and secondary double-sided coating modules (10, 20) which are arranged spaced apart. The primary double-sided ...
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WO/2023/126387A1 |
The invention relates to a nuclear fuel cladding produced with a substrate (14), which is made of pure zirconium or of a zirconium-based alloy, and a multilayer protective coating (16), which covers a surface (14B) of the substrate (14),...
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WO/2023/125502A1 |
A base (9) grounding detection apparatus and method. A voltage signal acquisition unit (302) acquires a voltage signal of a base (9). A voltage detection unit (304) determines, according to the voltage signal and a preset voltage signal,...
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WO/2023/123537A1 |
A white-light-transmitting composite film layer, provided with a medium layer and an indium coating, the medium layer being closer to a white light source than the indium coating. The medium layer is a transparent coating containing 0.5-...
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WO/2023/127195A1 |
Provided is an oxide sintered body comprising an indium (In) element, a tin (Sn) element, and a silicon (Si) element, with the balance consisting of indium, oxygen and inevitable impurities, wherein the Sn content is 50 mass% to 70 mass%...
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WO/2023/127799A1 |
A reflective mask blank for EUV lithography comprising a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and an absorption film that absorbs EUV light, in t...
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WO/2023/126462A1 |
The invention is directed to a connector (12) for a process tube (8), comprising an annular body (18); an engagement bore (42) formed in the annular body (18), for receiving an end of the process tube (8); a sealing groove (20) formed in...
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WO/2023/124251A1 |
Provided in the embodiments of the present application are a planetary disc structure and an evaporative deposition apparatus. The planetary disc structure comprises: a rotary disc and at least one substrate disc, a first rotational conn...
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WO/2023/122900A1 |
The embodiments of the present application relate to the technical field of magnetron sputtering. Provided are a magnetron sputtering device and a control method therefor. The magnetron sputtering device in the embodiments of the present...
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WO/2023/124481A1 |
The present invention provides a preparation method for a large-area nanodisk. The method comprises: preparing a polystyrene microsphere colloidal solution, and spin-coating and dispersing the colloidal solution onto a clean substrate; s...
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WO/2023/121281A1 |
The present invention relates to a method for manufacturing an aluminum sputtering target, and the method may comprise the steps of: casting an aluminum raw material to form an aluminum billet; extruding the aluminum billet into an alumi...
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WO/2023/120112A1 |
This laminate structure is for a semiconductor manufacturing device, the laminate structure including: a base body containing aluminum and having a first surface; an intermediate layer disposed on the first surface of the base body and c...
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WO/2023/117207A1 |
The present invention relates to a coating source for a coating installation, to a coating installation having such a coating source, and to a method for coating substrates using such a coating source. The present invention further relat...
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WO/2023/120488A1 |
A program according to one embodiment of the present disclosure causes a computer to execute a process for: acquiring process data including at least two among the type and flow rate of gas supplied to the inside of a semiconductor manuf...
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WO/2023/116961A1 |
The invention relates to an in-line system for coating individual or groups of substrates, comprising multiple chambers which are arranged one after another and can be evacuated via pumps, namely a loading chamber, a waiting chamber, at ...
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