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WO/2023/138864A1 |
Disclosed herein is a substrate arrangement for use in a lithographic apparatus, the substrate arrangement comprising: a resist; a photosensitive resist under-layer; and a substrate; wherein the exposure threshold of the resist under-lay...
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WO/2023/140386A1 |
This resist composition contains: a resin component (A1) having a constituent unit (a1) that includes an acid-decomposable group the polarity of which increases under the action of acid, a constituent unit (a10) represented by general fo...
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WO/2023/140293A1 |
The present disclosure relates to a photosensitive resin composition for permanent resists containing: (A) an acid-modified vinyl group-containing resin, (B) an elastomer, (C) a photoinitiator, (C) a curing agent, and (E) an inorganic fi...
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WO/2023/139814A1 |
The present invention enables patterning to be performed without generating residues during development and provides a high elastic modulus and a low linear expansion coefficient. This resin composition contains a high molecular weight c...
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WO/2023/140468A1 |
The present invention relates to an image-based overlay measurement overlay mark for determining relative mismatch between two or more pattern layers and comprises first to fourth overlay marks. The first overlay mark forms a pair of fir...
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WO/2023/139682A1 |
The present disclosure relates to a photosensitive resin composition for permanent resists containing: (A) an acid-modified vinyl group-containing resin, (B) an elastomer, (C) a photoinitiator, (C) a curing agent, and (E) an inorganic fi...
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WO/2023/140289A1 |
A photosensitive resin composition for a permanent resist, according to the present disclosure, comprises: (A) an acid-modified vinyl group-containing resin; (B) a thermosetting resin; (C) a photopolymerization initiator; (D) a photopoly...
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WO/2023/140344A1 |
The present invention addresses the problem of providing a photoresist remover composition which has the high ability to remove cured resists and is effective in inhibiting the corrosion of substrate-constituting metals in contact therew...
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WO/2023/140364A1 |
This resist composition generates an acid upon exposure to light and changes in solubility in developing solutions by the action of the acid, and includes a polymer including a constituent unit derived from a compound represented by gene...
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WO/2023/140248A1 |
A lens is produced by a method comprising: a step for applying a radiation-sensitive composition onto a base material to form a coating film; a step for irradiating a portion of the coating film with a radioactive ray to generate an acid...
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WO/2023/140257A1 |
A polymer including a structural unit represented by formula (NB), a structural unit represented by formula (AD), and at least one structural unit selected from among structural units represented by formula (1-2) and structural units rep...
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WO/2023/140345A1 |
The present invention addresses the problem of providing a photoresist stripping composition that exhibits a high stripping performance even with respect to a hardened resist, and that, even when the amount of water in the make-up is sma...
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WO/2023/140191A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin that contains a repeating unit having an acid group having a pKa value of 8.0 to 12.0 inclusive, a repeating unit (a2) ha...
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WO/2023/140231A1 |
A resist composition including a resinous component (A1) having a constituent unit (a01) derived from a compound represented by general formula (a0-1). In the formula, R01 is a hydrogen atom, etc., L01 is a divalent linking group, Ra01 a...
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WO/2023/139694A1 |
A photosensitive resin composition for a permanent resist, according to the present disclosure, comprises: (A) an acid-modified vinyl group-containing resin; (B) a thermosetting resin; (C) a photopolymerization initiator; (D) a photopoly...
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WO/2023/141438A1 |
Provided are patterned films comprising nanostructures and one or more UV-cured monomers wherein the nanostructure films comprise between about 60 wt% and about 95 wt% nanostructures. Also provide are methods of making the patterned film...
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WO/2023/137952A1 |
A layout splitting method and apparatus (100) suitable for double lithography technology, and an electronic device (200), which fall within the field of integrated circuit mask designs. The layout splitting method comprises the following...
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WO/2023/140047A1 |
The purpose of the present invention is to provide a colored composition which enables the formation of a colored coating film having a small color difference before and after post-baking. The present invention relates to a colored compo...
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WO/2023/133943A1 |
A cross-linked polyamic acid ester. The cross-linked polyamic acid ester has structural units linked by means of a cross-linked structure. Each structural unit has a structure as shown in general formula I, wherein Ar1 is a dianhydride m...
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WO/2023/135658A1 |
This method for manufacturing an electronic device includes: acquiring a pulse spectral shape of pulsed laser light, and a target integrated spectral shape to be realized via pulsed laser light of a plurality of pulses generated on the b...
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WO/2023/136726A1 |
The invention relates to a composite article and a method for manufacturing such article. The composite article comprises a substrate, wherein at least part of the substrate comprises a texture, and a coating layer, wherein at least part...
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WO/2023/136727A1 |
The invention relates to flexible stamp configured for imprinting, in particular nanoimprinting, and a method for manufacturing such stamp. The stamp (200) comprises a substantially flexible substrate (201), said substrate comprising at ...
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WO/2023/136845A1 |
A method for semiconductor metrology includes depositing first and second film layers on a substrate, patterning the layers to define a first target including a first feature in the first layer and a second feature in the second layer ad...
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WO/2023/135255A1 |
A method to control the solid content of a development liquid (L) in a washer configured to develop an exposed relief precursor using the development liquid (L), said method comprising the steps: determining of a value representative for...
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WO/2023/136250A1 |
A composition for forming a silicon-containing resist underlayer film, the composition containing component [A]: a carbon-carbon triple bond–containing polysiloxane, and component [C]: a solvent.
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WO/2023/136203A1 |
The present invention addresses the problem of providing a resin composition that can form a novel film having excellent properties. The present invention relates to a resin composition comprising a resin (A), inorganic particles (B) a...
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WO/2023/134662A1 |
An apparatus (300) for substrate processing, the apparatus comprising: a coating device (301) configured to coat a substrate (30), which is conveyed at a first speed in a feeding direction, with a material; a drying device (302) configur...
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WO/2023/136885A1 |
Embodiments of the present disclosure generally relate to methods for forming features having small and large line widths on the same substrate or device. In some embodiments, the methods described and discussed herein can be used to pro...
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WO/2023/134937A1 |
An optical apparatus for a reticle stage of a lithographic apparatus is disclosed. The optical apparatus comprises: a reflective optical element comprising a surface for exposure to radiation; at least two electrodes located at the surfa...
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WO/2023/134175A1 |
The present invention relates to the technical field of semiconductors, and in particular to a negative development photoresist model optimization method. The method comprises the following steps: obtaining an initial negative developmen...
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WO/2023/136028A1 |
Provided are a colored composition capable of forming films having excellent moisture resistance, a film, a structure, a color filter, and a display device. The colored composition comprises colorants and a resin and is for use in formin...
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WO/2023/135133A1 |
The invention relates to an illumination system (27) for a lithography projection exposure device having an illumination optical unit (4), which guides illumination light (14) to an object field (5). A field multi-channel optical unit of...
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WO/2023/134989A1 |
A system for use in a lithographic apparatus comprises: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configura...
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WO/2023/136105A1 |
A photosensitive resin composition comprising a binder polymer, a photopolymerizable compound, a photopolymerization initiator and a tetraarylbenzidine compound represented by general formula (d1). [In formula (d1): R11, R12, R13, R14, R...
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WO/2023/136333A1 |
The present invention provides a photosensitive resin composition that has various improved characteristics as a result of the types and proportions of at least the acid comonomer components of the comonomer components of an alkali-solub...
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WO/2023/134957A1 |
Disclosed is a method of performing a lithographic performance qualification test. The method comprises: obtaining one or more exposure layouts, each relating to exposure of multiple exposure fields on a substrate; performing a dummy exp...
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WO/2023/136135A1 |
The present invention provides a novel resin which includes a constituent unit having a heterocycle. A composition including this resin gives cured films with excellent solvent resistance even when heated at low temperatures, e.g., 150°...
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WO/2023/134906A1 |
A microlithographic system (100), comprising: a climate chamber (110) enclosing an atmosphere; a printing device (120) for projection of an optical beam onto a photo-sensitive resist, the printing device being arranged in the climate cha...
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WO/2023/136260A1 |
Provided are: a method for producing a semiconductor substrate using a cleaning fluid excellent in terms of the property of cleaning peripheral portions of substrates and waste-liquid stability; a method for forming a resist underlayer f...
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WO/2023/134917A1 |
The invention relates to a mirror, in particular for a microlithographic projection exposure system, having an optical active surface (711), a mirror substrate (712), a reflective layer system (721) for reflecting electromagnetic radiati...
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WO/2023/136136A1 |
The purpose of the present invention is to provide a compound which has a high molar extinction coefficient at the maximum absorption wavelength (λmax) within the range of 600 nm to 750 nm, while exhibiting good stability before and aft...
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WO/2023/135131A1 |
When reproducing illumination and imaging properties of an optical production system during the illumination and imaging of an object by means of an optical measuring system of a metrology system, the optical measuring system is initiall...
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WO/2023/136084A1 |
Provided is a production method for a resin cured product in which sensitivity and resolution are stable and in which it is possible to obtain a good resin layer state after a lamination step. The present invention is a method for produc...
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WO/2023/131476A1 |
A method of grouping pattern features of a substantially irregular pattern layout for patterning a substrate in a lithographic process. The method comprises obtaining at least one substantially irregular pattern representation, each at l...
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WO/2023/130579A1 |
The present invention relates to a flow control device and an automatic liquid refilling system. The flow control device comprises: a housing comprising a water discharging hole located at the bottom of the housing; a liquid inlet pipe c...
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WO/2023/131536A1 |
A laser beam amplification system comprising a plurality of laser amplifiers configured to amplify a laser beam in series, wherein at least one of the laser amplifiers is supported by a plurality of actuators which are configured to move...
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WO/2023/131570A1 |
Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the...
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WO/2023/131085A1 |
The present invention relates to the technical field of advanced optical materials, and in particular to a composition for preparing a top anti-reflective film for a photoresist, a top anti-reflective film for a photoresist, and a fluori...
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WO/2023/132937A1 |
The present disclosure generally relates to optical molecules, including but not limited to 1,3-thiazolidin-4-ones and other molecules comprising an aza-heterocyclic ring system containing a chalcogen. In some embodiments, the molecules ...
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WO/2023/131589A1 |
A fast and dynamic waveplate is described. The present systems and methods utilize the stress birefringence that generates inside a plate when force is applied on sides of the plate. The force is applied using a set of piezoelectric actu...
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