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WO/2023/238534A1 |
A film formation simulation method according to an embodiment of the present disclosure includes a step for generating representative particles corresponding to incident radical flux, and calculating the attachment, desorption, migration...
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WO/2023/236135A1 |
The present invention relates to the technical field of material surface treatment, and provides a Gcr15 material surface strengthening treatment process and equipment. The present invention solves the problem that the anti-fatigue perfo...
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WO/2023/236344A1 |
A pixel array, a display panel and a metal mask. During the manufacturing of the pixel array, the spacing (Rr) between a red sub-pixel (100) and a red light evaporation opening (100') can be increased, thereby prolonging the service life...
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WO/2023/238478A1 |
Provided is a feature which makes it possible to perform highly accurate alignment by measuring more positions on a mask and a substrate. A film formation device for forming a film on a film formation surface of a substrate by using a ma...
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WO/2023/238479A1 |
The present invention provides: an alignment device which is capable of reducing the number of times of contact and separation of a substrate and a mask during alignment; a film forming apparatus; and an alignment method. The present i...
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WO/2023/237938A1 |
A solvent layer is coated on a metal layer carried by a donor substrate, allowing the fabrication of solid metal lines at a high resolution. The laser jetting involves ejecting metal particles, constrained within a solvent membrane, from...
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WO/2023/232547A1 |
The invention relates to a flat metal product and a component made therefrom.
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WO/2023/230668A1 |
Disclosed herein is a structure comprising a substrate having a polycrystalline transition metal di-chalcogenide nanolayer disposed on a substrate surface, wherein the polycrystalline transition metal di-chalcogenide nanolayer has a surf...
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WO/2023/232703A1 |
The present invention is directed to an article having a decorative coating, wherein the article comprises a plastic substrate having a front surface; a base hardcoating located over the front surface; one or more intermediate layers loc...
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WO/2023/230664A1 |
The present disclosure relates to coated articles with a low-E coating and their preparation methods. The coated article comprises a low-E coating which is supported by a substrate and comprises a metallic IR reflective layer, a protecti...
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WO/2023/234831A1 |
There is disclosed method for manufacturing a cutting device comprising the steps of a) providing a base comprising a cutting edge, wherein the base is made of a base material comprising a first element, b) applying a first coating layer...
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WO/2023/230665A1 |
The present disclosure relates to coated articles and their preparation methods. The coated article comprises a metallic layer, wherein the metallic layer bears a frequency selective surface configured to reduce attenuation of telecommun...
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WO/2023/232421A1 |
The present invention relates to a coated tool part (10) of a machining tool, having a substrate (12), which is coated with a wear coat (22) and an adhesive coat located between the substrate (12) and the wear coat (22). The wear coat (2...
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WO/2023/232869A1 |
The present invention relates to a coated cutting tool (1) comprising a substrate (5) and a coating (6), wherein the coating (6) comprises a nano- multilayer (8) of alternating layers of a first nanolayer (9) being Ti1-xAIxN, 0.55
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WO/2023/227219A1 |
The invention relates to a method of running a laser system (10) for providing a laser beam (20) capable of heating and/or evaporating and/or sublimating a target (120) located in a reaction chamber (110) of an evaporation system (100), ...
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WO/2023/228400A1 |
The vapor deposition device (1) comprises a crucible (11) that houses a vapor deposition material (M) and a heat source (12) that heats the vapor deposition material (M). The vapor deposition device is provided on a short side wall (11c)...
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WO/2023/230111A1 |
The disclosed and claimed method provides a method for producing high refractive index rutile TiO2 at moderate process temperatures.
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WO/2023/226187A1 |
The present application relates to a mask. A mask opening area is in a first initial shape before tensioning, and the mask opening area is in a first target shape in a vapor deposition process; the first initial shape is different from t...
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WO/2023/228602A1 |
The present invention manufactures a metal foil (1) with a release film that can transmit volatile components while having low electrical resistance and stably provides an electromagnetic shielding film (2) using the same. A metal foil (...
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WO/2023/223858A1 |
Provided is a gallium nitride semiconductor device comprising: an amorphous glass substrate; a gallium nitride semiconductor layer on a first surface of the amorphous glass substrate; and a compensation layer on a second surface of the a...
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WO/2023/224976A1 |
A semitransparent photovoltaic module includes a submodule with a first glass layer, a transparent conducting oxide layer, a semiconductor layer, and a metal back contact layer. The submodule further includes a plurality of interconnecti...
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WO/2023/225241A1 |
A razor blade with a substrate having a tip portion. A hard coating layer is deposited on the substrate. A non-fluorinated organic material is deposited in one or more monolayers on an outer bonding surface of the hard coating. The hard ...
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WO/2023/224437A1 |
The apparatus for manufacturing an organic light-emitting display device comprises a first deposition chamber, a second deposition chamber and a third deposition chamber. The first deposition chamber comprises a first evaporation source ...
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WO/2023/221572A1 |
The present invention relates to a coating system, comprising a vacuum chamber and a rotary tool disposed in the vacuum chamber. The rotary tool comprises a rotatably mounted rotary component, a first driving module, a second driving mod...
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WO/2023/221417A1 |
The present invention discloses a high-purity multi-element alloy sputter coating material for an advanced generation high-definition liquid crystal display, consisting of Mo, Ti, Ni, Cu and inevitable trace impurity elements, the conten...
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WO/2023/222198A1 |
A carrier (100) for holding a substrate (10) in a curved state is provided. The carrier (100) comprises a carrier body (110) having a curved substrate support surface (111), a sealing (120) for providing a sealing between an edge of the ...
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WO/2023/224084A1 |
Provided is at least any of a metallic material which includes a metal having a body-centered cubic structure and is suitable for use as a sputtering target, a method for producing the metallic material, a sputtering target including the...
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WO/2023/224026A1 |
Provided are: a rigid-film-coated object having hydrogen embrittlement resistance and wear resistance and having excellent unsusceptibility to separation; and a machine component and a bearing which include the rigid-film-coated object. ...
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WO/2023/216863A1 |
Disclosed in the present application are a sputtering method and a sputtering device for performing magnetron sputtering on a rotary target material. The sputtering method comprises: acquiring, online, morphology information of a target ...
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WO/2023/217406A1 |
According to the present invention a non-hydrogenated amorphous carbon coating such as an a-C and/or ta-C coating on a surface of a sliding part is disclosed, wherein the sliding part is foreseen for use under lubricated conditions and o...
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WO/2023/220455A1 |
A tray assembly comprises a plurality of trays. Each of the plurality of trays comprises a first tray portion and a second tray portion which are couplable together by a retainer and which are engageable with a cam member. Depending on t...
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WO/2023/218840A1 |
Provided is a gallium nitride film formation method comprising disposing a substrate in a vacuum chamber so as to be opposite from a target including nitrogen and gallium, heating the substrate, supplying a sputtering gas to the vacuum c...
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WO/2023/216313A1 |
An evaporation source apparatus, comprising a vacuum chamber (10), and a base (20), at least one vacuum box (30) and at least one control valve (40) located in the vacuum chamber (10). The at least one vacuum box (30) is arranged on the ...
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WO/2023/216407A1 |
A preparation method for a graphene/copper composite material combining physical vapor deposition (PVD) and chemical vapor deposition (CVD). According to the method, a layer of graphene material is deposited on the surface of a copper fo...
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WO/2023/216521A1 |
The embodiments of the present invention disclose a surface modification method for degradable pure magnesium or a degradable magnesium alloy, and a pure magnesium or magnesium alloy material, so as to solve the technical problems whereb...
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WO/2023/216413A1 |
A preparation method for a micromirror using an electrostatic-driven MEMS comb tooth structure. Insulating layers (01) are provided on the surfaces of comb teeth of the electrostatic-driven MEMS comb tooth structure, and the insulating l...
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WO/2023/214513A1 |
This method for producing a crystalline indium oxide semiconductor film has: a step for forming an indium oxide film via sputtering film deposition by sputtering a sputtering target with metal indium being a principal component thereof i...
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WO/2023/214005A1 |
The present disclosure relates to a device for vacuum deposition systems, comprising: a movable main body, at least one deposition source mounted on the movable main body, at least one coating window associated with the at least one depo...
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WO/2023/213189A1 |
Provided in the embodiments of the present application are a semiconductor process device and a method for forming a stacked film structure. The method for forming a stacked film structure comprises: a first sputtering step, involving: t...
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WO/2023/213720A1 |
The present invention relates to a process for obtaining perovskite thin films from powders of inorganic and organic materials by vapour deposition, characterized in that the crucible used to heat the powders is pre-heated above their su...
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WO/2023/215529A1 |
A system and associated method are described. The system includes a controlled power supply for generating electrical pulses for a plasma discharge source. The controlled power supply includes an output pulse rail, a direct current power...
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WO/2023/208249A1 |
A preparation method for a molybdenum alloy tube target material, a molybdenum alloy tube target material, and an application, which belong to the technical field of powder metallurgy. The target material is prepared from raw material po...
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WO/2023/211160A1 |
The present invention relates to an electromagnetic wave shielding material and to a method for manufacturing same, the shielding material comprising: a base material; and a Zn-NiCr shielding layer coated on the surface of the base mater...
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WO/2023/209241A1 |
An arrangement (10) for holding substrates (SS) curved along a main extension direction is adapted to be received in a vacuum chamber (14) of a coating apparatus (12) vis-a-vis to an evaporation source (16), and comprises a hub portion (...
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WO/2023/210436A1 |
An antireflection film (10) has a transparent film base material (11), a hard coat layer (12), and an antireflection layer (13) in this order. The dimension change ratio in a first direction from before to after a heat resistance test of...
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WO/2023/209052A1 |
The invention relates to a transparent substrate provided, on one of the main surfaces thereof, with a stack of thin layers, said stack consisting of the following layers, starting from the substrate: - a first dielectric module of one o...
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WO/2023/208597A1 |
The present invention relates to a coated cutting tool comprising a substrate and a coating comprising a first, a second and a third layer, wherein i) the first layer is a (Ti, Al)N layer adhered to the substrate, said first layer having...
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WO/2023/207950A1 |
The present application discloses a magnetron apparatus and a magnetron sputtering device. The magnetron apparatus is used for acting on a target assembly to sputter particles. The magnetron apparatus comprises a first magnetron, a secon...
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WO/2023/211245A1 |
The present invention relates to silicon-coated antioxidant iron, silicon-coated antioxidant nickel, and manufacturing methods therefor. More specifically, the present invention relates to an antioxidant iron that includes a surface coat...
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WO/2023/210096A1 |
A film deposition device having an alignment means for aligning a substrate and a mask using a substrate mark provided to the substrate a mask mark provided to the mask, a bonding means for bonding the aligned substrate and mask, and a f...
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