| Document |
Document Title |
|
WO/2024/030562A1 |
A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a th...
|
|
WO/2024/027361A1 |
The present invention provides a film coating device and method capable of improving deep hole filling. The device comprises a cavity, a target material bearing disc, a magnetic control assembly, a base, and a corrector. The target mater...
|
|
WO/2024/029429A1 |
This laminate structure has an underlying insulating layer, a metal oxide layer disposed on the underlying insulating layer, and an oxide semiconductor layer disposed in contact with the metal oxide layer. The oxide semiconductor layer h...
|
|
WO/2024/027645A1 |
The present invention relates to the technical field of integrated black panel display devices, and provides an anti-reflection film, and a preparation method therefor and an application thereof. The anti-reflection film comprises a subs...
|
|
WO/2024/029221A1 |
This alignment apparatus performs alignment of a substrate and a mask using a substrate mark provided to the substrate and a mask mark provided to the mask. A plurality of detection means detect the substrate mark and the mask mark. A de...
|
|
WO/2024/026939A1 |
A polymer composite material and a preparation method therefor. The polymer composite material comprises a polymer base layer and a metal thin film layer arranged on the surface of the polymer base layer, wherein the material forming the...
|
|
WO/2024/024343A1 |
The present disclosure provides a powder surface film-forming device, which makes it possible to reduce the aggregation of a powder by disintegrating aggregates of the powder at a proper timing during the delivery of the powder when the ...
|
|
WO/2024/025333A1 |
The present specification relates to a load-lock chamber for anti-reflection coating and anti-fingerprint coating, and a coating process system, the chamber accommodating, in the load-lock chamber supplying product trays, coating materia...
|
|
WO/2024/021527A1 |
The present invention belongs to the technical field of aeronautical engine thermal barrier coatings and relates to a lanthanum-gadolinium-samarium-based high-entropy thermal barrier coating material and a preparation method thereof, the...
|
|
WO/2024/022558A1 |
The invention relates to a method for evaporating a cathode by means of an arc evaporation process in a vacuum chamber, in which method an arc is ignited and the speed and motion of the cathode spot of the arc on a predetermined track on...
|
|
WO/2024/024658A1 |
Provided is a metal mask having a perforated region, a surrounding region, and an alignment region. The surrounding region is a region surrounding the perforated region and comprises a non-perforated surface. The alignment region is a re...
|
|
WO/2024/023153A1 |
This disclosure relates to a coated element having a surface, wherein at least a part of the surface of the element is coated by a coating, a system or kit, comprising the coated element, a closed system comprising the coated element, an...
|
|
WO/2024/024584A1 |
The corrosion-resistant member according to the present disclosure is a multilayer body comprising a substrate and a first layer laminated on the substrate. The first layer comprises a rare earth element compound containing a rare earth ...
|
|
WO/2024/024267A1 |
This film formation device includes a vacuum chamber, a substrate support part that supports a substrate, a target support part that supports a target including nitrogen and gallium, a sputtering gas supply unit that supplies a sputterin...
|
|
WO/2024/022579A1 |
An evaporation source (100) for depositing a material on a substrate (10) is described. The evaporation source (100) includes a crucible (110) for evaporating the material. Further, the evaporation source (100) includes a distributer (12...
|
|
WO/2024/024268A1 |
This film formation device comprises: a vacuum chamber; a substrate support part that supports a substrate in the vacuum chamber; a target support part that supports a target which includes gallium and nitrogen in the vacuum chamber; a s...
|
|
WO/2024/024266A1 |
This film thickness measurement device comprises: a light reception unit that is provided to a film forming chamber for performing film formation on a substrate or to a transfer chamber for transferring the substrate to the film forming ...
|
|
WO/2024/022578A1 |
A processing apparatus (100) for processing a flexible substrate (10) is described. The processing apparatus (100) includes a vacuum processing chamber (110) including at least one deposition source (111) for depositing a layer of materi...
|
|
WO/2024/025765A1 |
Methods for selective deposition are described herein. The methods include depositing an oxide on a first portion of a substrate surface selected from the group consisting of a metal surface, a metal nitride surface and a metal silicide ...
|
|
WO/2024/017631A1 |
The present invention relates to a coating plant for coating substrates by cathode sputtering, and to a method for replacing a target in such a coating plant.
|
|
WO/2024/018742A1 |
This vacuum chamber is characterized by comprising: a chamber of which the inside can be decompressed; a reinforcement member 125 provided along the wall surface of the chamber; a fixture tool 127 for attaching the reinforcement member 1...
|
|
WO/2024/016182A1 |
A method for surface modification, comprising the following steps: a) providing a first substrate comprising a metal material; b) forming a colored precursor layer on the first substrate by means of vapor deposition, such that the colore...
|
|
WO/2024/017553A1 |
A method for manufacturing an edge emitting semiconductor laser diode comprising the following steps is provided: - providing an edge emitting semiconductor body (2) configured for generating electromagnetic laser radiation during operat...
|
|
WO/2024/017119A1 |
The present invention discloses a target palladium membrane selection method, a hydrogen-related reaction execution method, and an osmosis diffusion rate determination method and system. The selection method comprises: according to a tar...
|
|
WO/2024/018686A1 |
A film according to the preset invention, which protects a ceramic-based composite material from a high-temperature environment that contains sand and dust, is provided with an upper layer on at least one side that is exposed to the envi...
|
|
WO/2024/019169A1 |
Provided are: a base film which has high heat resistance, flexibility, and dimensional stability and is used for providing a vapor deposition layer on at least one surface thereof; and a vapor deposition film comprising said base film an...
|
|
WO/2024/019920A1 |
A spacing guide for use on a dark space shield of a sputtering chamber includes a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on an end of the dark space...
|
|
WO/2024/011678A1 |
The present disclosure relates to a magnetic control assembly, a physical vapor deposition apparatus and method, and a control apparatus. The magnetic control assembly (310) is connected to a back plate (321) of a reaction chamber (320),...
|
|
WO/2024/014528A1 |
This method for manufacturing an electronic device comprises: a preparation step for preparing a first laminate, which includes a first surface and a second surface positioned on the side opposite to the first surface, the first laminate...
|
|
WO/2024/012550A1 |
The present invention relates to the technical field of batteries, and in particular to an aluminum composite current collector and a preparation method therefor, a positive electrode plate, a battery, and an electric device. The prepara...
|
|
WO/2024/012225A1 |
The present application provides a silver alloy and a preparation method therefor, a conductive film, and a display device. The silver alloy comprises silver, a first doping substance, and a second doping substance' the first doping subs...
|
|
WO/2024/011538A1 |
The present invention relates to the technical field of batteries, in particular to an aluminum composite current collector, a preparation method therefor, a positive electrode sheet, a battery and an electric apparatus. The preparation ...
|
|
WO/2024/014156A1 |
This Co-Cr-Pt-oxide-based sputtering target comprises 50 at% or more of Co, more than 0 at% and 20 at% or less of Cr, and more than 0 at% and 25 at% or less of Pt, with the remainder made up of one or more oxides and unavoidable impuriti...
|
|
WO/2024/014069A1 |
Provided are a palladium cobalt oxide target, a delafossite-type oxide target, and a method for producing a palladium cobalt oxide target. The palladium cobalt oxide target has a compactness of 60-80%, the compactness being calculated on...
|
|
WO/2024/013620A1 |
The present invention relates to method for manufacturing a paperboard based packaging laminate, said method comprising: a) providing a paperboard base layer, b) providing a vacuum coated film layer, c) applying an adhesive composition t...
|
|
WO/2024/011752A1 |
The present application relates to an evaporation device, an evaporation system, and an evaporation method. The evaporation device comprises: a base having an evaporation cavity, the evaporation cavity comprising a first evaporation area...
|
|
WO/2024/014207A1 |
The present invention addresses the problem of providing a reflection-type mask blank for which machining error is small when machining by charged particle radiation is carried out. A reflection-type mask blank (10a) includes, in the g...
|
|
WO/2024/013227A1 |
The present invention relates to a method of preparing a perovskite structure on a substrate surface wherein the perovskite has a general structure of ABX3 where A is at least partly an organic compound and where the method uses a source...
|
|
WO/2024/014068A1 |
Provided are: a palladium cobalt oxide thin film; a delafossite-type oxide thin film; a schottky electrode having a delafossite-type oxide thin film; a method for producing a palladium cobalt oxide thin film; and a method for producing a...
|
|
WO/2024/012820A1 |
The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the c...
|
|
WO/2024/011536A1 |
The present invention relates to the field of lithium ion batteries, and specifically to a copper composite current collector, a preparation method therefor and an application thereof. The preparation method for a copper composite curren...
|
|
WO/2024/011535A1 |
The present invention relates to the technical field of batteries, and particularly relates to an aluminum composite current collector, a preparation method therefor, and the use thereof. The preparation method for the aluminum composite...
|
|
WO/2024/010939A1 |
Apparatus for processing a semiconductor substrate are described herein. The apparatus include an electrostatic chuck within a physical vapor deposition process chamber. The electrostatic chuck is covered by a cover plate and has an edge...
|
|
WO/2024/009809A1 |
This reflective mask blank has, in the following order, a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and a phase shift film that shifts the phase of th...
|
|
WO/2024/010126A1 |
A linear evaporation source may comprise: a plurality of partition walls that are accommodated in a deposition space of a crucible, spaced apart from each other in the left and right directions, and divide the deposition space into a plu...
|
|
WO/2024/008903A1 |
The invention relates to a coated substrate, preferably coated tool for use in manufacturing processes, such as machining processes or forming processes, comprising a coated surface, said coated surface formed by a substrate surface made...
|
|
WO/2024/009125A1 |
A vapor source (50) for depositing an evaporated material on a substrate is provided. The vapor source includes a vapor distribution pipe (60) with a plurality of nozzles, wherein at least one nozzle (100) of the plurality of nozzles inc...
|
|
WO/2024/008038A1 |
The present application relates to an apparatus for lithium supplementation by evaporation deposition. The apparatus for lithium supplementation by evaporation deposition comprises: a vacuum oven provided with a vacuum chamber; a winding...
|
|
WO/2023/206084A9 |
The present disclosure relates to a mask, a display panel and a display device. By means of providing a universal first opening (121) in a mask main body (12) and matching a sheet (13) which is provided with different kinds of second ope...
|
|
WO/2024/009229A1 |
The invention relates to the technique of vacuum deposition of metal and ceramic coatings, in particular to a device for high-rate magnetron sputtering, and can be used in the manufacture of products with coatings of metals, glass, polym...
|
