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Patent Searching and Data


Matches 701 - 750 out of 2,232

Document Document Title
JP2010215880A
To provide a novel liquid resin, and an adhesive composition blending it, which exhibits an excellent adhesive property.The terpene-based liquid resin is obtained by copolymerizing a terpene monomer with an aromatic monomer in the presen...  
JP4544389B2  
JP2010195704A
To provide a novel oxetane derivative necessary for preparation of a crosslinkable liquid crystal film excellent in orienting properties, heat resistance and molding processability, and a crosslinkable liquid crystalline polymer obtained...  
JP2010196045A
To provide a norbornene copolymer excellent in transparency, heat resistance, low water-absorbing property, and electric insulation characteristic.This norbornene copolymer is a high molecular weight addition copolymer of a norbornene co...  
JP2010530441A
A catalyst precursor resin composition includes an organic polymer resin; a fluorinated-organic complex of silver ion; a monomer having multifunctional ethylene-unsaturated bonds; a photoinitiator; and an organic solvent. The metallic pa...  
JP2010189619A
To provide a norbornene-based polymer that is variously applicable as a low-loss insulating material and an insulation material produced using the same.A norbornene-based polymer has at least one substituent selected from the group consi...  
JP4529245B2  
JP4529247B2  
JP4525912B2  
JPWO2008143302A1
(A)樹脂、(B)ブチルエーテル基を有す る架橋剤及び(C)溶剤を含有するレジスト 下層膜形成用組成物。  
JPWO2008143095A1
【課題】耐熱性、高解像度、高い光取り出し 効率を有するマイクロレンズ用材料を提供す る。【解決手段】芳香族縮合環又はその誘導 体を有する単位構造を含むアルカリ可溶...  
JPWO2008133311A1
イマージョンリソグラフィー用レジスト保護 膜組成物を提供する。ヒドロキシ基、カルボ キシ基、スルホン酸基、スルホニルアミド基 、アミノ基またはリン酸基を有する重合...  
JP4506968B2  
JP2010522253A
The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cy...  
JP4493660B2  
JP4487532B2  
JP2010520930A
It is a thermosetting lower layer constituent of the etching tolerance for using it in the multilayer lithography process for the two-layer coat board manufacture for photo lithography, the polymer in which the constituent includes the r...  
JP2010126545A
To provide a method for producing a cycloolefin/-olefin addition copolymer having excellent transparency, heat resistance and toughness, a high monomer conversion and a wide molecular weight distribution.The cycloolefin/-olefin addition ...  
JP2010519594A
It is an etching tolerance thermosetting lower layer constituent for using it in a multilayer lithography process which forms a photolithography two-layer application board, and is the constituent, (a) At least one repeat unit of structu...  
JP2010122579A
To provide a positive resist material improved in resolution, particularly in dependence on density distribution and faithfulness to a mask and excellent in etching resistance, and to provide a pattern forming method using the resist mat...  
JP2010519340A
Polymer includes the 1 type repeating unit denoted by chemical formula I, and the inside of a formula and X are -CH (s).2- -CH2-CH2- or -- it is chosen from -O- and;m is 0* about 5 integer --; -- here -- the 1 type repeating unit -- R1R2...  
JP4472409B2  
JP2010111853A
To provide a release layer material, a substrate structure including the same, and a method for manufacturing the substrate structure.The release layer material applied in a flexible electronic device is a cyclic olefin copolymer (COC) h...  
JP4459908B2  
JP2009042748A5  
JP2010090273A
To provide a method which can advantageously produce a high-molecular-weight -pinene polymer under higher temperature conditions than in the past.The method for producing the -pinene polymer includes subjecting -pinene or a monomer group...  
JP2010511746A
It is related with the manufacturing method of epoxidation, and/or hydroxylated alpha* オレフィン / diene copolymer, The copolymer precursor in which the comonomer unit which is a copolymer precursor which contains aalpha* オレフ...  
JP2010084134A
To provide a polymer for a chemically amplified resist, and a chemically amplified resist composition including the polymer.In chemical formula (1), X is a vinyl ether derivative or an olefin derivative; R1, R2, R3 and R4 are each a 1-30...  
JP4448767B2  
JP4447224B2  
JP2010072369A
To provide a simple manufacturing method of an optical waveguide, and to provide a manufacturing method of an optical waveguide capable of acquiring a clear core pattern.This manufacturing method of the optical waveguide includes: an act...  
JP4439686B2  
JPWO2008068897A1
[A]軟化温度(TMA)が120〜300 ℃である特定の環状オレフィン系重合体と、 [B]ガラス転移点(Tg)が50℃以下で ある特定の環状オレフィン系重合体とを...  
JP4432903B2  
JP4433933B2  
JPWO2008065912A1
本発明は、高い精度の光学特性を具備すると 共に、長期間にわたる高い耐久性を有し、か つ短期間での光学安定性に優れたプラスチッ ク光学素子、光ピックアップ用レンズ及...  
JP2010043268A
To provide an additive copolymer of norbornene (bicyclo[2.2.1]hept-2-ene) and a cyclic olefin-based compound, which is excellent in heat resistance, transparency, adhesion or close fitting property to other members, low in linear expansi...  
JPWO2008047468A1
本発明は、繰り返し構造単位の少なくとも一 部に脂環族構造を有する重合体100質量部 に対して、分子構造内に占める炭素原子の割 合が67重量%以上80重量%以下であ...  
JP2010031191A
To provide an optical film having not only developability of a high retardation value but also reverse wavelength dispersiveness.The reverse wavelength dispersive resin is a polymer (A) comprising the alkylidene norbornenes (a1) shown by...  
JP2010026221A
To provide an underlayer film forming composition which is superior in suitability to embedding, ensures a small amount of a sublimate, and can form an underlayer film superior in etching resistance and having a good refraction coefficie...  
JP4409366B2  
JP2010006985A
To provide a dampproof molding material which contains as a resin component a hydride of a copolymer excellent in solution stability when produced and which has high transparency, high dampproof properties and moderate heat resistance, a...  
JP4395997B2  
JP2010002909A
To provide a resist composition for liquid immersion exposure improved in mask shape reproducibility, pattern falling and exposure latitude and excellent in property of following an immersion liquid when applied to liquid immersion expos...  
JP4393010B2  
JPWO2008015969A1
電子線(以下、EBと略称する)、X線、極 紫外線(以下、EUVと略称する)による微 細パターン形成に好適なパターン形成方法等 を提供する。本発明の方法は、(1)放...  
JP4388429B2  
JP2009544498A
[Subject] The device and method for forming a structure on the surface of a polymer layer are provided. [Means for Solution] A substrate by which the present invention is a polymer layer (1) and a substrate (2) provided with an electric ...  
JP4382925B2  
JP4386200B2  

Matches 701 - 750 out of 2,232