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Matches 701 - 750 out of 2,204

Document Document Title
JP2010090273A
To provide a method which can advantageously produce a high-molecular-weight -pinene polymer under higher temperature conditions than in the past.The method for producing the -pinene polymer includes subjecting -pinene or a monomer group...  
JP2010511746A
It is related with the manufacturing method of epoxidation, and/or hydroxylated alpha* オレフィン / diene copolymer, The copolymer precursor in which the comonomer unit which is a copolymer precursor which contains aalpha* オレフ...  
JP2010084134A
To provide a polymer for a chemically amplified resist, and a chemically amplified resist composition including the polymer.In chemical formula (1), X is a vinyl ether derivative or an olefin derivative; R1, R2, R3 and R4 are each a 1-30...  
JP4448767B2  
JP4447224B2  
JP2010072369A
To provide a simple manufacturing method of an optical waveguide, and to provide a manufacturing method of an optical waveguide capable of acquiring a clear core pattern.This manufacturing method of the optical waveguide includes: an act...  
JP4439686B2  
JPWO2008068897A1
[A]軟化温度(TMA)が120〜300 ℃である特定の環状オレフィン系重合体と、 [B]ガラス転移点(Tg)が50℃以下で ある特定の環状オレフィン系重合体とを...  
JP4432903B2  
JP4433933B2  
JPWO2008065912A1
本発明は、高い精度の光学特性を具備すると 共に、長期間にわたる高い耐久性を有し、か つ短期間での光学安定性に優れたプラスチッ ク光学素子、光ピックアップ用レンズ及...  
JP2010043268A
To provide an additive copolymer of norbornene (bicyclo[2.2.1]hept-2-ene) and a cyclic olefin-based compound, which is excellent in heat resistance, transparency, adhesion or close fitting property to other members, low in linear expansi...  
JPWO2008047468A1
本発明は、繰り返し構造単位の少なくとも一 部に脂環族構造を有する重合体100質量部 に対して、分子構造内に占める炭素原子の割 合が67重量%以上80重量%以下であ...  
JP2010031191A
To provide an optical film having not only developability of a high retardation value but also reverse wavelength dispersiveness.The reverse wavelength dispersive resin is a polymer (A) comprising the alkylidene norbornenes (a1) shown by...  
JP2010026221A
To provide an underlayer film forming composition which is superior in suitability to embedding, ensures a small amount of a sublimate, and can form an underlayer film superior in etching resistance and having a good refraction coefficie...  
JP4409366B2  
JP2010006985A
To provide a dampproof molding material which contains as a resin component a hydride of a copolymer excellent in solution stability when produced and which has high transparency, high dampproof properties and moderate heat resistance, a...  
JP4395997B2  
JP2010002909A
To provide a resist composition for liquid immersion exposure improved in mask shape reproducibility, pattern falling and exposure latitude and excellent in property of following an immersion liquid when applied to liquid immersion expos...  
JP4393010B2  
JPWO2008015969A1
電子線(以下、EBと略称する)、X線、極 紫外線(以下、EUVと略称する)による微 細パターン形成に好適なパターン形成方法等 を提供する。本発明の方法は、(1)放...  
JP4388429B2  
JP2009544498A
[Subject] The device and method for forming a structure on the surface of a polymer layer are provided. [Means for Solution] A substrate by which the present invention is a polymer layer (1) and a substrate (2) provided with an electric ...  
JP4382925B2  
JP4386200B2  
JP4375785B2  
JP2009256468A
To provide a polymer of fluorine-containing norbornenes having a chemically stable terminal structure and narrow molecular weight distribution.A method of producing the fluorine-containing polymer essentially comprising a repeating unit ...  
JPWO2009128513A
[Subject] The resist pattern forming method using an effective resist lower layer film formation constituent for lithography at the time of semiconductor substrate processing and the resist lower layer film formation constituent and a ma...  
JP2009244904A
To provide a photoresist composition which can be used on the far-ultraviolet ray region and contains a copolymer for photoresist excellent in post-exposure heat treatment delay stability.The photoresist composition which contains a poly...  
JP4347179B2  
JP2009235286A
To provide a copolymer of a cyclic olefin monomer having a polar group and a 2-12C -olefin monomer, excellent in heat resistance, strength and molding workability, and a production method therefor free from generation of black metal deri...  
JP2009235375A
To provide a film of low hygroscopicity and moisture permeability, having proper elasticity, having no brittleness, and excellent in mechanical strength; and a polarizing plate and an image display using the same.This copolymer contains ...  
JP2009235414A
To provide a polycyclic polymer and a polycyclic resist composition useful for a photoresist composition transparent to a short wavelength of image focusing irradiation, and having resistance in a dry etching method.The present invention...  
JP4344119B2
Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line ed...  
JP2009227810A
To provide a cycloolefin copolymer having a glass transition point suitable for an optical material and a film excellent in productivity and surface properties.The cycloolefin copolymer is obtained by addition copolymerization of at leas...  
JP2009535444A
The present invention indicates the manufacturing method of Al Ken * acrylate * norbornene the copolymer of 3 yuan which polymerizes the monomer mixture which consists of Al Ken, acrylate, and norbornene by a radical initiator under exis...  
JP4336326B2  
JP2009534710A
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer...  
JP2009215379A
To provide a film having low hygroscopicity and moisture permeability, adequate elasticity, no fragility, and excellent mechanical strength, and to provide a polarizing plate using the film and an image display.The film contains a copoly...  
JPWO2007129528A1
優れた光安定性を長時間に亘って維持する。 本発明に係る光学素子としての対物レンズ1 0は、樹脂組成物から構成されている光学素 子であって、前記樹脂組成物が熱可塑性...  
JP2009203479A
To provide a catalyst composition, a manufacturing method thereof, and a using method thereof for manufacturing a polymer from an ethylenic unsaturated monomer.Disclosed are the catalyst composition containing a specific neutral metal pa...  
JP4327360B2  
JP2009198962A
To provide a resin composition having high sensitivity to light and excelling in patterning property, especially a resin composition suitably usable for formation of a spacer provided joined to the functional surface side of a semiconduc...  
JP2009185298A
To provide a new photoresist composition having sufficiently low optical density for short wavelength radiation at 193 nm and below.A method of polymerizing polycyclic olefin monomers encompassing (a) combining a monomer composition cont...  
JP2009179749A
To provide a norbornene-based polymer film having good peeling-off properties and high productivity.The norbornene-based polymer comprises 0.01-2.00 mol%, in the total repeating units, of a repeating unit (1) derived from a norbornene-ba...  
JP2009179769A
To provide an organic and inorganic composite material having a high transparency and refractive index, and excellent in heat resistance and moldability.This organic and inorganic composite material is provided by dispersing inorganic fi...  
JP4312268B2  
JP2009173824A
To provide a cyclic olefin addition copolymer containing a cyclic olefin-functional polysiloxane, to provide a method for producing the same, to provide a composition for crosslinking use, to provide a crosslinked form, and to provide a ...  
JP4307663B2  
JP4310028B2  

Matches 701 - 750 out of 2,204