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JP2021183596A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).A carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2021183598A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having a good mask error factor.A carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2021183602A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity.A carboxylate represented by formula (I), a carboxylic acid generator, and a resist compositi...
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JP2021183594A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.A carboxylate represented by formula (I), a carboxylic acid g...
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JP6972102B2 |
A method, comprising i) contacting an aqueous solution of an organic ligand salt of the formula AX(L−X) with a mesoporous material (MPM) to form an impregnated mesoporous salt material of the formula AX(L−X)/MPM, ii) treating the imp...
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JP2021175731A |
To provide carboxylate, a carboxylic acid generator including the carboxylate and a resist composition including the generator from which a resist pattern having an excellent line edge roughness (LER) can be produced.Carboxylate expresse...
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JP2021175725A |
To provide carboxylate, a carboxylic acid generator including the carboxylate and a resist composition including the generator from which a resist pattern having an excellent pattern collapse margin (PCM) can be produced.Provided is carb...
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JP2021175723A |
To provide carboxylate, a carboxylic acid generator and a resist composition including the same from which a resist pattern having an excellent CD uniformity (CDU) can be produced.Carboxylate expressed by a formula (I-2) and synthesized ...
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JP6959022B2 |
To provide a crystal of PCA (protocatechuic acid) cation salt excellent in dissolubility and stable under a high humidity condition and a manufacturing method therefor.There is provided a manufacturing method of a crystal of a PCA (proto...
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JP6945525B2 |
The present invention is directed to methods of acetate quantification and acetate complexes useful in the methods of acetate quantification. Such methods and complexes are useful for any application where acetate quantification is desir...
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JP2021151990A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the sam...
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JP6935064B2 |
The present invention relates to a biaryl derivative expressed by the chemical formula 1, a method for producing the biaryl derivative, a pharmaceutical composition comprising same, and use of same, the biaryl derivative expressed by the...
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JP2021135497A |
To provide a resist material having high sensitivity and small LWR and CDU regardless of whether it is a positive resist material or a negative one, and a pattern forming process using the same.A resist composition comprises a quencher c...
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JP2021123580A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.There are provided a carboxylate represented by formula (I), an acid generator, and a resi...
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JP2021119170A |
To provide dosage forms including 3-(3-dimethylamino-1-ethyl-2-methyl-propyl)-phenol compounds.The invention provides a salt or cocrystal of (a) 3-(3-dimethylamino-1-ethyl-2-methyl-propyl)-phenol and (b1) at least one acid selected from ...
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JP2021096464A |
To provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU), and to provide a carboxylate and a carboxylic acid generator.The resist composition contains a carboxylate represented by (IA) or (IB)...
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JP2021095389A |
To provide a method for producing 3,3',4,4'-benzophenone tetracarboxylic acid by nitric acid oxidation of a 1,1-bis-(3,4-dimethylphenyl)-alkane, which reduces or prevents discharge of nitric oxide and avoids the risk of oxygen inhibiting...
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JP2021513526A |
[Task] The present invention discloses a bioactive polysubstituted benzene compound and a method and application thereof. The compound of the present invention has good biological activity and activity for suppressing the growth of tumor...
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JP2021081702A |
To provide a resist composition which achieves higher sensitivity and is excellent in lithographic characteristics, and a resist pattern forming method using the resist composition.The resin composition contains an onium salt-based acid ...
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JP2021073170A |
To provide compounds that target the lanthionine synthetase C-like protein 2 pathway.The present invention provides a compound represented by the following formula. Q is, for example, piperazine-1,4-diyl, benzene-1,4-diamine-N1, N4-diyl ...
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JP2021511369A |
The present application provides a method for synthesizing roxadustat using a compound of formula (VIII) as a raw material, reacting it with an ether containing phenol and vinyl, an acid, and hydroxylamine, and further reacting it with g...
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JP2021038156A |
To provide a solid, high-purity cyclic compound or a derivative thereof, a production method capable of producing the cyclic compound or the derivative thereof at a high yield, and a high-quality chemical.A production method of a cyclic ...
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JP2021028338A |
To provide crystalline forms of tenofovir alafenamide.The present invention relates to novel crystalline forms of salts and/or co-crystals of tenofovir alafenamide, pharmaceutical formulations, and therapeutic uses thereof in treating vi...
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JP2021505622A |
Provided with this are compounds that react with reactive lipid species to form non-toxic or active products. Methods of reducing reactive lipid species are also provided. In addition, methods of treating mitochondria in patients with mi...
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JP2021008451A |
To provide a method for producing a gallic acid-containing composition having a low content ratio of protocatechuic acid from microorganism culture solution.Provided is a method for producing a gallic acid-containing composition, includi...
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JP2020201480A |
To provide a radiation-sensitive composition excellent in resolution and sensitivity.The radiation-sensitive composition of the present invention contains a compound having a metal atom and a ligand, and a solvent. The ligand is derived ...
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JP2020196723A |
To provide compositions and methods useful for treatment of diseases caused by EBNA1 activity such as cancer, infectious mononucleosis, chronic fatigue syndrome, multiple sclerosis, systemic lupus erythematosus, and rheumatoid arthritis....
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JP2020196668A |
To provide a novel porous coordination polymer increasing a gas storage capacity.A porous coordination polymer includes a first metal ion, a ligand cross-linking the first metal ion, and a second metal ion as a group 2 element metal ion....
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JP6787788B2 |
Cosmetic use of at least one salicylic acid derivative of following formula (I) in which L represents a linear or branched hydrocarbon radical comprising from 1 to 12 carbon atoms and having or not having one or more ethylenic unsaturati...
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JP2020530855A |
A method for demethylating a methylated phytocannabinoid compound of formula I to form a phytocannabinoid compound of formula II, in which at least a portion of the methylated phytocannabinoid compound is demethylated to form a phytocann...
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JP6752783B2 |
Processes for producing 2,5-dichlorophenol and 3,6-dichloro-2-methoxybenzoic acid are described. Various processes for isomerizing 2,4-dichlorophenol over a zeolite catalyst to form 2,5-dichlorophenol are provided. Processes for preparin...
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JP6749234B2 |
The invention provides compositions and methods for wound healing and scar reduction. The compositions and methods of the invention include at least one EP4 agonist set forth herein. Wounds and or scars that can be treated by the composi...
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JP2020128367A |
To provide a compound excellent in the luminance life of a light emitting element.An example of the invention is the following compound E-Cs.SELECTED DRAWING: None
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JP6731855B2 |
The present application discloses the first rare-earth-free metal organic framework (MOF) yellow phosphors that can be effectively excited by blue light and assembled in a white light emission (WLED) device with a blue chip. The compound...
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JP2020521723A |
Provide a method of treating cachexia. The method comprises administering an effective amount of a complement inhibitor to a person in need of treatment for cachexia. Complement inhibitors include 5,5'-methylenebis (2-hydroxybenzoic acid...
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JP2020105118A |
To provide a novel porous polymer metal complex having a layered structure of two-dimensional square lattice network structures, and also to provide a gas adsorbent having excellent gas adsorption properties using the same.The porous pol...
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JP6708616B2 |
Certain cyclopentadienone monomers having polar moieties are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers in electronics applications.
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JP6702264B2 |
A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
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JP6695329B2 |
A process for cross-linking siloxane and organic polymers comprising reacting (a) a silyl hydride with (b) an unsaturated polymeric compound in the presence of (d) a platinum diene compound with a chelating dianionic ligand.
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JP6682384B2 |
To provide an inkjet ink that can form an image having silver gloss.An inkjet ink contains a stilbene compound represented by general formula (1) where, Rand Rindependently represent a C1-20 alkyl group, a C1-20 alkenyl group, a phenyl g...
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JP6663677B2 |
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developin...
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JP2020037545A |
To provide an oxygen isotope-labeled carboxylate compound useful as a supply source of oxygen isotope.There is provided an oxygen isotope-labeled carboxylate compound obtained by reacting pivalonitrile represented by the following formul...
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JP2020506884A |
Disclosed are compounds of the formula provided herein that demonstrate efficacy in inhibiting SOX18 protein activity, particularly in relation to the ability of SOX18 to bind to DNA and / or specific protein partners. In addition, metho...
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JP2020505439A |
The compounds represented by formula (II) are useful in regulating voltage-gated sodium channel activity. Their preparation and use to reduce the severity of convulsive activity in a subject, for example in the treatment of epilepsy, is ...
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JP6644719B2 |
Provided are: a method for producing fluorenylidene diallylphenols represented by formula (1), the method including a reaction step for reacting fluorenones represented by formula (2) and allylphenols represented by formula (3) in the pr...
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JP6626924B2 |
To provide a multiple branch cationic phosphonic salt that is a forward osmosis extract.A multiple branch cationic phosphonic salt has a structure represented by a formula (1). In the formula, each of R, R, and R is independently straigh...
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JP2019202997A |
To provide compounds that are useful as charge transport and emissive materials for fabrication of electronic devices such as diodes, transistors, and photovoltaic devices.The invention provides compounds of the formula D-S-A-S-B. (A rep...
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JP6609964B2 |
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JP6600472B2 |
in which Ra1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra2 and Ra3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X− represents a coun...
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JP2019178072A |
To provide a porous coordinated polymer capable of increasing a gas adsorption amount.The porous coordinated polymer 1 of the present disclosure is represented by formula (1): [CuXY]where X indicates a primary ligand 12 that is a hydroxy...
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