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Patent Searching and Data


Matches 1 - 50 out of 39,190

Document Document Title
WO/2021/078534A1
A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; a controlled environment chamber and cleaning substance delivery mechanism. The particles of the cleaning substance delivered to membrane...  
WO/2021/081289A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. A method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chambe...  
WO/2021/081291A1
Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior a...  
WO/2021/077294A1
Disclosed are a mask plate (100) and a manufacturing method therefor, and a preparation method for an organic light-emitting device (200). The mask plate (100) comprises a substrate (1), and a first opening part (2) and a second opening ...  
WO/2021/080699A1
Techniques are described for preparing nanofiber films that include a controllable proportion of nano-scale or micro-scale pores. These techniques include preparing a suspension of both nanofibers and removable particles. Upon formation ...  
WO/2021/080294A1
A pellicle for extreme ultraviolet lithography has a center layer formed of one of BNNT, BNNT/SiMx, SiMx/BNNT, SiMx/BNNT/SiMx by utilizing a boron nitride nanotube (BNNT) and a silicon compound (SiMx). By forming the center layer utilizi...  
WO/2021/073994A1
To determine an optical phase difference (|φabs – φML|) of measurement light (1i, 1j) of a measurement light wavelength over a surface of a structured object (8), the following is carried out Initially, a series of 2D images of the o...  
WO/2021/073799A1
A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support for supporting the membrane; and a pressure pulse generating mechanism including one or more laser energy sources configured to generate a...  
WO/2021/072794A1
A method and a system for evaluating the process quality of an inverted trapezoidal or a T-shaped structure. The method comprises: designing a front-layer diffraction overlay structure as a benchmark of a target image layer, and a diffra...  
WO/2021/071790A1
A system for reducing printable defects on a pattern mask is disclosed. The system includes a controller configured to be communicatively coupled to a characterization sub-system, the controller including one or more processors configure...  
WO/2021/072343A1
Heights on a surface of a photomask are measured using broadband light interferometry. The heights include heights of patterned areas of the photomask. A focal map is produced from the measured heights on the surface of the photomask. To...  
WO/2021/072126A1
A door of a reticle pod includes a window having a lens, sidewall, and a ledge. The window may be positioned or affixed internally in a door between the housing and a cover. A compressive seal may be used in conjunction with the window. ...  
WO/2021/070865A1
The present invention is to produce a printing plate on which registering is easy and color reproducibility is high, while opacity of ink is suppressed. The present embodiment pertains to a platemaking method for producing a printing p...  
WO/2021/063635A1
A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system, providing t...  
WO/2021/060253A1
Provided is a substrate having a multilayer reflective film, the substrate being used in order to produce a reflective mask blank and a reflective mask having a multilayer reflective film that has high reflectance to exposure light and a...  
WO/2021/062040A1
Certain aspects relate to a method for improving a lithography configuration. In the lithography configuration, a source illuminates a mask to expose resist on a wafer. A processor determines a defect-based focus exposure window (FEW). T...  
WO/2021/059890A1
The present invention provides a mask blank equipped with a phase shift film capable of improving transmittance for exposure light from an ArF excimer laser and suppressing film thickness required to ensure a desired phase difference. ...  
WO/2021/061477A1
Devices, systems, and methods of generating and providing a target topographic map for finishing a photomask blank are disclosed. A method includes receiving topographic data corresponding to an uncompleted photomask blank, receiving fun...  
WO/2021/052918A1
A system and method for generating predictive images for wafer inspection using machine learning are provided. Some embodiments of the system and method include acquiring the wafer after a photoresist applied to the wafer has been develo...  
WO/2021/052533A1
The problem addressed by the invention of flexibly, effectively and quickly checking for defects and structures on photomasks for extreme ultraviolet lithography (EUVL) at a high spatial resolution using a compact laboratory source is so...  
WO/2021/052712A1
Described herein are methods of generating a characteristic pattern for a patterning process and training a machine learning model. A method of training a machine learning model configured to generate a characteristic pattern for a mask ...  
WO/2021/044917A1
The present invention provides a mask blank which enables the production of a phase shift mask that exhibits good optical performance and is capable of enhancing the phase shift effect with respect to exposure light that is an ArF excime...  
WO/2021/044890A1
Provided is a thin film-attached substrate for producing a reflective mask that does not have at least an adverse effect on the performance of the reflective mask, even when a thin film of the thin film-attached substrate, such as a refl...  
WO/2021/037508A1
The invention relates to an optical element (1) for reflecting EUV radiation (4), comprising: a substrate (2); a coating (3) applied to the substrate (2), which coating reflects the EUV radiation (4); a top layer (5) for protecting the r...  
WO/2021/039163A1
The present invention enables the achievement of a substrate with an electroconductive film for the production of a reflective mask, said substrate having an electroconductive film that has a low surface roughness (Rms), while having exc...  
WO/2021/037662A1
A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and ...  
WO/2021/037484A1
Systems and methods for predicting substrate geometry associated with a patterning process are described. Input information including geometry information and/or process information for a pattern are received; and, using a machine learni...  
WO/2021/040309A1
Embodiments of the present specification relate to a photomask, a method for manufacturing same, and a method for manufacturing a display device using same and, more specifically, to a photomask comprising: a base layer having a recessed...  
WO/2021/041963A1
A system uses machine learning models, such as neural networks for generating mask design from a circuit design. The machine learning models have inputs and outputs which are localized to a small region of the circuit design. The machine...  
WO/2021/031532A1
Provided are a touch array substrate and preparation method thereof, in the touch array substrate, an active layer, an insulating layer, a pixel electrode layer, a metal layer, a flat layer and a common electrode layer are sequentially a...  
WO/2021/034321A1
A system and method for scheduling optical proximity correction (OPC) or other resolution enhancement technique (RET) operations on a layout design is disclosed. A layout design is divided into a plurality of regions, such as a plurality...  
WO/2021/034937A1
A particulate matter detection device (100) and methods for detecting a particulate matter (112) in the environment. The particulate matter detection device (100) comprising an indicator (114) comprising a detection layer (102), an optic...  
WO/2021/034495A1
For lithography mask layout verification, training data is collected for each design intent in a set of design intents by identifying a set of failures that is expected to occur when the design intent is manufactured, and recording a fai...  
WO/2021/030302A1
An actuator for an optic mount in a vacuum environment includes a bellows around an actuator compartment. The bellows provides a seal around the actuator. A filter assembly is positioned between the actuator compartment and an interior o...  
WO/2021/028296A1
A code mark for a reticle such as a reticle in which the individual elements of the mark comprise diffraction gratings so that the apparent brightness of the elements depends on whether light from the element is diffracted into or outsid...  
WO/2021/028228A1
Described herein is a method for training a machine learning model configured to predict values of a physical characteristic associated with a substrate for use in adjusting a patterning process. The method involves obtaining a reference...  
WO/2021/026056A1
An extreme ultraviolet reflective element comprising a multilayer stack of absorber layers on a multilayer stack of reflective layers. The element comprises spacing layer and phase tuning layer. Methods of manufacturing extreme ultraviol...  
WO/2021/022602A1
Disclosed are a gray-tone mask and a method for manufacturing a display substrate. The gray-tone mask comprises a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the ligh...  
WO/2021/016947A1
A display substrate (101) and a display device. The display substrate (101) comprises a plurality of sub-pixel groups (110) and a plurality of signal line groups (120). The plurality of signal line groups (120) are arranged at intervals ...  
WO/2021/018379A1
A method for collimating a beam of material being deposited on a substrate at a deposition area of the substrate is disclosed. The substrate is masked with a stencil mask located at a mask distance from the substrate, the mask distance b...  
WO/2021/018777A1
A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped meta...  
WO/2021/013519A1
Disclosed is a patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device comprises target patterning elements for patterning at least ...  
WO/2021/012311A1
Provided is a photomask, comprising: a main pattern region comprising a first subcircuit pattern positioned at one end thereof and a second subcircuit pattern positioned at the other end thereof; a first virtual circuit pattern adjacent ...  
WO/2021/011737A1
A system generates a mask for a circuit design while enforcing symmetry and consistency across random areas of the mask. The system builds a mask solutions database mapping circuit patterns to mask patterns. The system uses the mask solu...  
WO/2021/008856A1
Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other s...  
WO/2021/004705A1
A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has be...  
WO/2021/001092A1
Disclosed is a surface treatment apparatus and method for surface treatment of substrates such as wafers or substrates. The surface treatment apparatus comprises one or more support structures for supporting one or more substrates and on...  
WO/2020/261986A1
Provided is a thin film-attached substrate having a thin film having excellent chemical resistance. The thin film-attached substrate is characterized by including a thin film on at least one main surface of two main surfaces of the subst...  
WO/2020/256064A1
Provided is a reflective mask blank for manufacturing a reflective mask capable of suppressing peeling of an absorber pattern while suppressing an increase in the thickness of an absorber film when EUV exposure is conducted in an atmosph...  
WO/2020/257217A1
To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. Whil...  

Matches 1 - 50 out of 39,190