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JP2024501780A |
The present disclosure relates, in part, to compounds for modulating the activity of aldehyde dehydrogenases, such as ALDH2, or pharmaceutically acceptable salts or solvates thereof, and/or alcohol use disorders, alcohol-induced disorder...
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JP2024500645A |
The present invention provides formula (I): [Formula 1] (wherein the variables are as defined in the claims and specification) and compositions containing these compounds. The invention also relates to the use of said malonamide compound...
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JP2023184479A |
To provide a salt, a resist composition, and the like which allow a resist pattern having a good focus margin to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formu...
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JP2023184474A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate of a triphenylsulfonium cation of a specific structure having a cyc...
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JP2023184477A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formul...
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JP2023184476A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having a good mask error factor to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP7406264B2 |
Provided herein are compounds, pharmaceutical compositions comprising the compounds, methods of preparing the compounds, and methods of using the compounds and compositions in treating diseases or disorders in a subject where the subject...
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JP2023550853A |
The present invention provides a method for preparing 2-oxetanemethanamine, which belongs to the technical field of organic synthesis. In the present invention, [2-(1-ethoxyethoxy)methyl]propylene oxide is used as an initial raw material...
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JP2023171324A |
To provide a carboxylate and the like and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a carboxylate represented by a specific formula and the like; and a resist com...
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JP2023171327A |
To provide a salt and the like and a resist composition which allow a resist pattern having a good pattern collapse margin to be produced.There are provided a salt represented by formula (I), an acid generator, a resin, and a resist comp...
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JP2023171323A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.There are provided: a salt of a sulfonium cation of a specific structure and a sulfonate anion of a specific stru...
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JP2023171328A |
To provide a carboxylate and the like and a resist composition which allow a resist pattern having good resolution to be produced.There are provided: a carboxylate represented by formula (I) and the like; and a resist composition contain...
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JP7389567B2 |
To provide a compound that makes it possible to produce a resist pattern with excellent line edge roughness (LER).The present invention provides, for example, the following compound (IA-1).SELECTED DRAWING: None
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JP7387818B2 |
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions con...
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JP2023546100A |
Glutamine analogs, compositions containing glutamine analogs and uses thereof.
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JP7367933B2 |
To provide a photocationically curable composition which rapidly cures during light irradiation without causing gelatinization even if stored at a high temperature or room temperature for a long time in a photocationically curable compos...
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JP2023123607A |
To provide a compound having a neural protecting and/or repairing effect.A compound represented by general formula (I) or a salt thereof has a potent neural protecting and/or repairing effect and, therefore, is usable as a therapeutic ag...
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JP7337790B2 |
Provided herein are compounds, compositions, and methods useful for modulating the integrated stress response (ISR) and for treating related diseases; disorders and conditions.
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JP2023536137A |
Dual modulators of mGluR5 and 5-HT2A receptors and uses thereof are disclosed. More specifically, compounds that act simultaneously as modulators of mGluR5 and antagonists of 5-HT2A receptors and their use as pain therapeutic agents are ...
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JP2023117396A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin to be produced.There are provided: a salt represented by formula (I); an acid generator containing the salt...
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JP2023535323A |
The present invention uses the formula (I) [wherein R1, R2, R3, R4and m are as defined herein] or a pharmaceutically acceptable salt or solvate thereof. The invention further relates to pharmaceutical compositions containing cyclic cyano...
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JP7317524B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good line edge roughness.The salt is represented by formula (I), and the resist composition contains the salt. [In the formula, Q, Q, Qand Qeach repres...
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JP2023528173A |
The present invention relates to the expression The use of the strobilurin-type compounds of I and their N-oxides and salts, and methods of combating such fungi. The invention also relates to novel compounds, methods of preparing these c...
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JP2023527661A |
The present invention relates to the expression The use of the strobilurin-type compounds of I and their N-oxides and salts, and methods of combating such fungi. The invention also relates to novel compounds, methods of preparing these c...
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JP2023527660A |
The present invention relates to the expression The use of the strobilurin-type compounds of I and their N-oxides and salts, and methods of combating such fungi. The invention also relates to novel compounds, methods of preparing these c...
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JP2023527498A |
Provided herein are compounds useful for inhibiting signaling and activators of transcription 5a and 5b (STAT5), and pharmaceutical compositions comprising the compounds. Additionally, the compounds and compositions are useful for treati...
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JP7296808B2 |
To provide a salt for an acid generator used for fine processing of a semiconductor, an acid generator containing the salt, a resist composition and a method for producing a resist pattern.The present invention provides a salt represente...
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JP2023526707A |
The present invention relates to cabazitaxel weakly basic derivatives and formulations thereof, specifically to the synthesis of cabazitaxel weakly basic derivatives, liposomal formulations containing said derivatives and their use in dr...
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JP7292517B2 |
A process and intermediate for the preparation of a compound of formula (I), or salt thereof.
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JP2023524980A |
Formula (II): or a pharmaceutically acceptable salt thereof, wherein R1, n, and Y1is as defined herein. Also provided is a pharmaceutically acceptable composition comprising a compound of formula (II), or a pharmaceutically acceptable sa...
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JP2023520668A |
The present invention relates to nanoparticles containing drug dimers and uses thereof. Nanoparticles containing drug dimers of the present invention can increase drug content and improve drug dispersibility. In addition, the nanoparticl...
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JP2023520477A |
The present invention provides a synthetic method for synthesizing oxetane derivatives using a microreactor. The synthesis method includes 3-ethyl-3-hydroxymethyloxetane and general formula R-(X)n(X is a halogen element.) A step of trans...
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JP7269928B2 |
Also disclosed herein are uses of a compound disclosed herein in the potential treatment or prevention of an IDO-associated disease or disorder. Also disclosed herein are compositions comprising a compound disclosed herein. Further discl...
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JP7261654B2 |
To provide a compound and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The compound represented by formula (I) and the resist composition containing the compound are provided. Rrepresents hyd...
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JP2023514787A |
The present invention relates to compounds of formula (I) and their use as herbicides. In the above formula, R1~R9represents a group such as hydrogen, halogen or an organic group such as alkyl, alkenyl, alkynyl or alkoxy, X is a bond or ...
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JP2023512786A |
Provided are compounds of formula (II): or a pharmaceutically acceptable salt thereof, wherein R1, R2, R3, R4, R5, R6, and p are as defined herein. Also provided is a pharmaceutically acceptable composition comprising a compound of formu...
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JP7240070B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity.The salt is represented by formula (I). In the formula, Q, Q, Qand Qeach represent F or a perfluoroalkyl group; R, R, Rand Reach rep...
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JP7240069B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).There are provided a sulfate ester salt having a group represented by formula (I) and a resist composition containing the sulf...
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JP2023509898A |
The present specification relates to a compound represented by Chemical Formula 1, a coating composition containing the compound represented by Chemical Formula 1, an organic light emitting device using the same, and a method for manufac...
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JP2023509495A |
The present invention relates to the technical field of drugs, specifically to RORγt inhibitors, methods for their production and use. Further, a pharmaceutical composition of said compound, a process for preparing said pharmaceutical c...
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JP7233948B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).The salt has a group represented by formula (I), and the resist composition contains the salt. [In the formula, Rrepresents an...
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JP2023508955A |
The present invention provides compounds of general formula (I), their tautomers, their stereoisomers, their pharmaceutically acceptable salts, pharmaceutical compositions containing them, methods for their preparation, these compounds i...
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JP2023508930A |
The present invention provides compounds, pharmaceutically acceptable compositions thereof, and methods of using them. [Selection figure] None
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JP2023508952A |
[Theme] Kind Code: A1 Various embodiments of the present disclosure are directed to Formula 1, Formula 2, Formula 2A, Formula 3, Formula 3A, Formula 3B, and/or pharmaceutically acceptable salts thereof. The compounds are suitable for inh...
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JP7224331B2 |
Provided herein are novel lipase inhibitors and methods for using the same to treat inflammation, multisystem organ failure, necrotic pancreatic acinar cell death, acute pancreatitis, sepsis (e.g., culture negative sepsis), burns, and ac...
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JP7220255B2 |
To provide a salt capable of producing a resist pattern with a good shape, an acid generator, and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the same...
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JP2023021085A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023016040A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023503601A |
Syntheses of various pentylbezen-1,3-diol compounds of Formula I are disclosed. These compounds bind to cannabinoid 1 and 2 receptors (CB1 and CB2) and are presumed to be useful in modulating the activity of such receptors. Accordingly, ...
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JP2023014042A |
To provide a salt that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.The present invention provides a salt represented by the formula (I), an acid generator and a resist co...
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