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WO/2023/228544A1 |
A compound according to one embodiment of the present disclosure is represented by formula (1).　In formula (1), R1 to R4 each independently is an optionally substituted hydrocarbon group.
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WO/2023/223865A1 |
Provided is a resist composition which generates an acid upon exposure to light and of which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) of which th...
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WO/2023/222909A1 |
The inventors have now succeeded in developing arylsulfonium salts, in particular triarylsulfonium salts and dibenzothiophenium salts and a new use of said arylsulfonium salts. These compounds have the advantage of having a thioaryl grou...
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WO/2023/218970A1 |
Provided are, inter alia, an active-ray-sensitive or radiation-sensitive resin composition containing a resin that increases in polarity under the action of acid and a compound having a specified structure, an active-ray-sensitive or rad...
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WO/2023/199907A1 |
The present invention employs a resist composition which generates an acid upon exposure to light and changes the solubility with respect to a developer solution by the action of the acid, and which contains a compound that is represente...
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WO/2023/200916A1 |
An acid medium is provided comprising one or more water-soluble oxidized disulfide oil ODSO compounds. The use of such an acid medium is disclosed as a replacement for conventional acids. Embodiments of the present disclosure are directe...
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WO/2023/189961A1 |
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the...
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WO/2023/181856A1 |
Provided is a compound constituted from a heteropolyacid anion, a photoreactive cation represented by formula (1), and a hydrogen cation. Also provided is a photosensitive composition containing this compound. (In formula (1), R1 and R2 ...
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WO/2023/181060A1 |
The present invention describes synthesis of Toluidine blue O for a formulation to be used for screening and biopsy site identification in oral cancer. The invention discloses two formulations and a method of delivery of the said formula...
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WO/2023/176546A1 |
The present invention provides a resist composition which contains a base material component (A) and a compound (B0) that is represented by general formula (b0). In the formula, Rpg represents an acid-decomposable group; Rl0 represents a...
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WO/2023/171670A1 |
This resist composition, which generates an acid by being exposed to light and of which the solubility in a developer changes due to the action of the acid, contains a resin component (A1) of which the solubility in a developer changes d...
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WO/2023/162836A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (P) which can be decomposed by the action of an acid to increase the polarity thereof and a compound (Q) represented by a...
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WO/2023/162907A1 |
This resist composition includes a base component (A) and a compound (B0) represented by general formula (b0). In the formula, Ar0 is an arylene group or a hetero arylene group. Rm1 and Rm2 are substituents other than an iodine atom. L01...
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WO/2023/157635A1 |
The present invention provides an actinic-ray-sensitive or a radiation-sensitive resin composition having excellent roughness performance and roughness performance after the passage of time. This actinic-ray-sensitive or radiation-sensit...
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WO/2023/126377A1 |
The present invention provides a method for obtaining ionic compounds of formula (I) which comprises two-steps carried out in a one-pot manner. Said method includes the reaction of a N-(sulfinyl)sulfonamide of formula R1SO2N=S=O with a s...
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WO/2023/120250A1 |
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition, etc. that, when forming an ultra-fine pattern (for example, a line and space pattern of 25 nm or less, or a hole pattern with a hole diameter of 25 nm or less...
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WO/2023/119910A1 |
Provided is a radiation-sensitive composition containing: a polymer having an acid dissociable group; and at least one compound (b) selected from the group consisting of a compound represented by formula (1) and a compound represented by...
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WO/2023/102162A1 |
Described herein are novel compounds, compositions and methods for treatment of diseases including cancer using such compounds, compositions, and methods. The compounds include those of Formula (I):
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WO/2023/100574A1 |
Provided are: a radiation-sensitive resin composition that can be formed into a resist film having satisfactory levels of sensitivity and CDU performance even when a next-generation technology is applied; and a pattern formation method.ã...
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WO/2023/085367A1 |
Provided is a compound having a GCL inhibitory activity.　A compound represented by general formula (I) (all symbols in the formula are as defined in the description) or a salt thereof has GCL inhibitory activity, and therefore is usefu...
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WO/2023/063203A1 |
Provided is a resist composition which generates an acid upon exposure to light and for which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) for which ...
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WO/2023/053877A1 |
Provided are: a compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to actinic energy, e.g., EB or EUV, have excellent resolution in lithography, and can give fine patterns r...
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WO/2023/053977A1 |
The present invention provides a method for producing a salt (P) of an organic cation and an organic anion, the method comprising: (1) a step for obtaining a product which contains the salt (P) by subjecting a salt (I) of the organic cat...
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WO/2023/048168A1 |
The present invention provides a resist composition which contains a base material component (A) and a compound (D0) that is represented by general formula (d0). In the formula, Rd0 represents a fused ring group wherein an aromatic ring ...
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WO/2023/048128A1 |
This resist composition contains a base material component (A), and a compound (B0) represented by general formula (b0). In the formula, Rb0 is a fused ring group in which an aromatic ring and an alicyclic ring are fused. The alicyclic r...
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WO/2023/045910A1 |
The present application discloses a small-molecule compound having a naphthol ether structure, and a use thereof. Disclosed in the present application are a compound having a structure represented by general formula (I), a pharmaceutical...
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WO/2023/048244A1 |
The present invention provides a method for producing a tetrafluorosulfanyl group-containing aryl compound, wherein a tetrafluorosulfanyl group-containing aryl compound represented by general formula (1) is synthesized by carrying out a ...
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WO/2023/040736A1 |
A substituted sulfite compound, and a preparation method therefor and a use thereof. The substituted sulfite compound has a structure represented by formula (I), and has excellent acaricidal effect.
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WO/2023/030279A1 |
Provided are a 3, 3-difluoroallylic onium salt as represented by formula (C), and a preparation method of the substance. Cheap industrial raw materials are used to prepare the important fluorine-containing reagent, which can be used as a...
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WO/2023/007426A1 |
The present invention relates to a novel styrene compound of Formula (I) or a salt thereof Formula (I) wherein, the definition of Q, R2, and m are as described in the description. The present invention also relates to a process for the p...
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WO/2023/008345A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition which contains a compound (I) that produces an acid when irradiated with active light or radiation, while having an ionic structure and a ...
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WO/2023/006789A1 |
Compounds of formula I wherein the substituents are as defined in claim 1, and the agrochemically acceptable salts, stereoisomers, enantiomers, tautomers and N-oxides of those compounds, can be used as insecticides.
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WO/2023/008354A1 |
The present invention provides a resist composition which contains a resin (A) and a solvent (B) containing a compound (B1) represented by general formula (b-1), and which contains an active ingredient in an amount of 45 mass% or less wi...
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WO/2021/048809A9 |
The present invention relates to novel heterocyclic compounds of general formula (I) their tautomers, stereoisomers, enantiomers, pharmaceutically acceptable salts and pharmaceutical composition. The compounds of general formula (I) belo...
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WO/2023/285787A1 |
A process for preparing a compound of formula I, or a salt thereof, as defined herein. Also, compounds of formula I and intermediate compounds useful in the preparation of a compound of formula I.
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WO/2023/285788A1 |
A process for preparing a compound of formula (I), or a salt thereof, as defined herein. Also, compounds of formula I and intermediate compounds useful in the preparation of a compound of formula (I).
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WO/2022/270230A1 |
Provided is an active-light-sensitive or radiation-sensitive resin composition that yields a pattern having exceptional cross-sectional rectangularity. This active-light-sensitive or radiation-sensitive resin composition contains: a resi...
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WO/2022/272226A1 |
A sulfonic acid derivative compound represented by Formula (I): (Formula (I)), wherein R is a substituted or unsubstituted C1-C12 alkyl group; and Z is selected from the group consisting of a substituted or unsubstituted polycyclic C3-C3...
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WO/2022/265034A1 |
The resist composition comprises a resin component (A1) and a compound (B0) represented by general formula (b0) (In the formula, X0 is a bromine atom or iodine atom. Rm is a hydroxy group, etc. nb1 is 1 to 5, nb2 is 0 to 4, and 1 ≤ nb1...
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WO/2022/230745A1 |
The present invention provides a compound which is represented by formula (1). (In formula (1), each of R1, R2, R3 and R4 independently represents a hydrogen atom, a polymerizable functional group having 1 to 50 carbon atoms or an alkyl ...
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WO/2022/225019A1 |
A resist composition containing a base component (A) and a compound (B0) represented by general formula (b0) wherein: Rb0 represents a fused ring group containing a fused ring containing one or more aromatic rings, said fused ring group ...
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WO/2022/220201A1 |
The present invention provides: an active light-sensitive or radiation-sensitive resin composition which contains a compound represented by general formula (S1) and an acid-decomposable resin; a resist film which is formed using this act...
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WO/2022/218721A1 |
The invention relates to a process for the preparation of a dimethyl-C17-32-alkyl sulfonium salt, preferably a dimethyl-C17-32-alkyl sulfonium halide, more preferably a dimethyl-C17-32-alkyl sulfonium chloride, still more preferably dime...
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WO/2022/202402A1 |
The present invention aims to provide: a production method for a semiconductor substrate that has excellent pattern rectangularity; and a composition for forming a resist underlayer film. The semiconductor substrate production method com...
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WO/2022/196001A1 |
Provided are: a radiation-sensitive resin composition which can be formed into a resist film having satisfactory levels of sensitivity and CDU performance even when a next-generation technology is applied; and a pattern formation method....
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WO/2022/190599A1 |
Provided is a radiation sensitive resin composition that can form a resist film having sufficient levels of sensitivity, CDU performance, and development residue-inhibiting properties when next generation technology is used. Also provide...
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WO/2022/186304A1 |
The present invention provides a production method or the like that enables efficient synthesis of a SF5 group-containing compound. The present invention pertains to a method for synthesizing a SF5 group-containing compound represented b...
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WO/2022/172685A1 |
Provided are a method for forming a resist pattern having excellent performance including sensitivity during a light exposure process, LWR performance and CDU performance even when a next-generation light exposure technology is applied t...
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WO/2022/169662A1 |
A process for upgrading a heavy oil includes passing heavy oil and disulfide oil to a thermal cracking system that includes a thermal cracking unit and a cracker effluent separation system downstream of the thermal cracking unit and ther...
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WO/2022/159855A1 |
Nanocarriers are engineered to realize the potential of RNA therapeutics. This work reports the design of photo-crosslinked bioreducible nanoparticles (XbNPs) for stable siRNA encapsulation in high serum conditions, shielded surface char...
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