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Matches 1 - 50 out of 2,481

Document Document Title
WO/2023/228544A1
A compound according to one embodiment of the present disclosure is represented by formula (1). In formula (1), R1 to R4 each independently is an optionally substituted hydrocarbon group.  
WO/2023/223865A1
Provided is a resist composition which generates an acid upon exposure to light and of which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) of which th...  
WO/2023/222909A1
The inventors have now succeeded in developing arylsulfonium salts, in particular triarylsulfonium salts and dibenzothiophenium salts and a new use of said arylsulfonium salts. These compounds have the advantage of having a thioaryl grou...  
WO/2023/218970A1
Provided are, inter alia, an active-ray-sensitive or radiation-sensitive resin composition containing a resin that increases in polarity under the action of acid and a compound having a specified structure, an active-ray-sensitive or rad...  
WO/2023/199907A1
The present invention employs a resist composition which generates an acid upon exposure to light and changes the solubility with respect to a developer solution by the action of the acid, and which contains a compound that is represente...  
WO/2023/200916A1
An acid medium is provided comprising one or more water-soluble oxidized disulfide oil ODSO compounds. The use of such an acid medium is disclosed as a replacement for conventional acids. Embodiments of the present disclosure are directe...  
WO/2023/189961A1
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the...  
WO/2023/181856A1
Provided is a compound constituted from a heteropolyacid anion, a photoreactive cation represented by formula (1), and a hydrogen cation. Also provided is a photosensitive composition containing this compound. (In formula (1), R1 and R2 ...  
WO/2023/181060A1
The present invention describes synthesis of Toluidine blue O for a formulation to be used for screening and biopsy site identification in oral cancer. The invention discloses two formulations and a method of delivery of the said formula...  
WO/2023/176546A1
The present invention provides a resist composition which contains a base material component (A) and a compound (B0) that is represented by general formula (b0). In the formula, Rpg represents an acid-decomposable group; Rl0 represents a...  
WO/2023/171670A1
This resist composition, which generates an acid by being exposed to light and of which the solubility in a developer changes due to the action of the acid, contains a resin component (A1) of which the solubility in a developer changes d...  
WO/2023/162836A1
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (P) which can be decomposed by the action of an acid to increase the polarity thereof and a compound (Q) represented by a...  
WO/2023/162907A1
This resist composition includes a base component (A) and a compound (B0) represented by general formula (b0). In the formula, Ar0 is an arylene group or a hetero arylene group. Rm1 and Rm2 are substituents other than an iodine atom. L01...  
WO/2023/157635A1
The present invention provides an actinic-ray-sensitive or a radiation-sensitive resin composition having excellent roughness performance and roughness performance after the passage of time. This actinic-ray-sensitive or radiation-sensit...  
WO/2023/126377A1
The present invention provides a method for obtaining ionic compounds of formula (I) which comprises two-steps carried out in a one-pot manner. Said method includes the reaction of a N-(sulfinyl)sulfonamide of formula R1SO2N=S=O with a s...  
WO/2023/120250A1
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition, etc. that, when forming an ultra-fine pattern (for example, a line and space pattern of 25 nm or less, or a hole pattern with a hole diameter of 25 nm or less...  
WO/2023/119910A1
Provided is a radiation-sensitive composition containing: a polymer having an acid dissociable group; and at least one compound (b) selected from the group consisting of a compound represented by formula (1) and a compound represented by...  
WO/2023/102162A1
Described herein are novel compounds, compositions and methods for treatment of diseases including cancer using such compounds, compositions, and methods. The compounds include those of Formula (I):  
WO/2023/100574A1
Provided are: a radiation-sensitive resin composition that can be formed into a resist film having satisfactory levels of sensitivity and CDU performance even when a next-generation technology is applied; and a pattern formation method....  
WO/2023/085367A1
Provided is a compound having a GCL inhibitory activity. A compound represented by general formula (I) (all symbols in the formula are as defined in the description) or a salt thereof has GCL inhibitory activity, and therefore is usefu...  
WO/2023/063203A1
Provided is a resist composition which generates an acid upon exposure to light and for which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) for which ...  
WO/2023/053877A1
Provided are: a compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to actinic energy, e.g., EB or EUV, have excellent resolution in lithography, and can give fine patterns r...  
WO/2023/053977A1
The present invention provides a method for producing a salt (P) of an organic cation and an organic anion, the method comprising: (1) a step for obtaining a product which contains the salt (P) by subjecting a salt (I) of the organic cat...  
WO/2023/048168A1
The present invention provides a resist composition which contains a base material component (A) and a compound (D0) that is represented by general formula (d0). In the formula, Rd0 represents a fused ring group wherein an aromatic ring ...  
WO/2023/048128A1
This resist composition contains a base material component (A), and a compound (B0) represented by general formula (b0). In the formula, Rb0 is a fused ring group in which an aromatic ring and an alicyclic ring are fused. The alicyclic r...  
WO/2023/045910A1
The present application discloses a small-molecule compound having a naphthol ether structure, and a use thereof. Disclosed in the present application are a compound having a structure represented by general formula (I), a pharmaceutical...  
WO/2023/048244A1
The present invention provides a method for producing a tetrafluorosulfanyl group-containing aryl compound, wherein a tetrafluorosulfanyl group-containing aryl compound represented by general formula (1) is synthesized by carrying out a ...  
WO/2023/040736A1
A substituted sulfite compound, and a preparation method therefor and a use thereof. The substituted sulfite compound has a structure represented by formula (I), and has excellent acaricidal effect.  
WO/2023/030279A1
Provided are a 3, 3-difluoroallylic onium salt as represented by formula (C), and a preparation method of the substance. Cheap industrial raw materials are used to prepare the important fluorine-containing reagent, which can be used as a...  
WO/2023/007426A1
The present invention relates to a novel styrene compound of Formula (I) or a salt thereof Formula (I) wherein, the definition of Q, R2, and m are as described in the description. The present invention also relates to a process for the p...  
WO/2023/008345A1
The present invention provides: an active light sensitive or radiation sensitive resin composition which contains a compound (I) that produces an acid when irradiated with active light or radiation, while having an ionic structure and a ...  
WO/2023/006789A1
Compounds of formula I wherein the substituents are as defined in claim 1, and the agrochemically acceptable salts, stereoisomers, enantiomers, tautomers and N-oxides of those compounds, can be used as insecticides.  
WO/2023/008354A1
The present invention provides a resist composition which contains a resin (A) and a solvent (B) containing a compound (B1) represented by general formula (b-1), and which contains an active ingredient in an amount of 45 mass% or less wi...  
WO/2021/048809A9
The present invention relates to novel heterocyclic compounds of general formula (I) their tautomers, stereoisomers, enantiomers, pharmaceutically acceptable salts and pharmaceutical composition. The compounds of general formula (I) belo...  
WO/2023/285787A1
A process for preparing a compound of formula I, or a salt thereof, as defined herein. Also, compounds of formula I and intermediate compounds useful in the preparation of a compound of formula I.  
WO/2023/285788A1
A process for preparing a compound of formula (I), or a salt thereof, as defined herein. Also, compounds of formula I and intermediate compounds useful in the preparation of a compound of formula (I).  
WO/2022/270230A1
Provided is an active-light-sensitive or radiation-sensitive resin composition that yields a pattern having exceptional cross-sectional rectangularity. This active-light-sensitive or radiation-sensitive resin composition contains: a resi...  
WO/2022/272226A1
A sulfonic acid derivative compound represented by Formula (I): (Formula (I)), wherein R is a substituted or unsubstituted C1-C12 alkyl group; and Z is selected from the group consisting of a substituted or unsubstituted polycyclic C3-C3...  
WO/2022/265034A1
The resist composition comprises a resin component (A1) and a compound (B0) represented by general formula (b0) (In the formula, X0 is a bromine atom or iodine atom. Rm is a hydroxy group, etc. nb1 is 1 to 5, nb2 is 0 to 4, and 1 ≤ nb1...  
WO/2022/230745A1
The present invention provides a compound which is represented by formula (1). (In formula (1), each of R1, R2, R3 and R4 independently represents a hydrogen atom, a polymerizable functional group having 1 to 50 carbon atoms or an alkyl ...  
WO/2022/225019A1
A resist composition containing a base component (A) and a compound (B0) represented by general formula (b0) wherein: Rb0 represents a fused ring group containing a fused ring containing one or more aromatic rings, said fused ring group ...  
WO/2022/220201A1
The present invention provides: an active light-sensitive or radiation-sensitive resin composition which contains a compound represented by general formula (S1) and an acid-decomposable resin; a resist film which is formed using this act...  
WO/2022/218721A1
The invention relates to a process for the preparation of a dimethyl-C17-32-alkyl sulfonium salt, preferably a dimethyl-C17-32-alkyl sulfonium halide, more preferably a dimethyl-C17-32-alkyl sulfonium chloride, still more preferably dime...  
WO/2022/202402A1
The present invention aims to provide: a production method for a semiconductor substrate that has excellent pattern rectangularity; and a composition for forming a resist underlayer film. The semiconductor substrate production method com...  
WO/2022/196001A1
Provided are: a radiation-sensitive resin composition which can be formed into a resist film having satisfactory levels of sensitivity and CDU performance even when a next-generation technology is applied; and a pattern formation method....  
WO/2022/190599A1
Provided is a radiation sensitive resin composition that can form a resist film having sufficient levels of sensitivity, CDU performance, and development residue-inhibiting properties when next generation technology is used. Also provide...  
WO/2022/186304A1
The present invention provides a production method or the like that enables efficient synthesis of a SF5 group-containing compound. The present invention pertains to a method for synthesizing a SF5 group-containing compound represented b...  
WO/2022/172685A1
Provided are a method for forming a resist pattern having excellent performance including sensitivity during a light exposure process, LWR performance and CDU performance even when a next-generation light exposure technology is applied t...  
WO/2022/169662A1
A process for upgrading a heavy oil includes passing heavy oil and disulfide oil to a thermal cracking system that includes a thermal cracking unit and a cracker effluent separation system downstream of the thermal cracking unit and ther...  
WO/2022/159855A1
Nanocarriers are engineered to realize the potential of RNA therapeutics. This work reports the design of photo-crosslinked bioreducible nanoparticles (XbNPs) for stable siRNA encapsulation in high serum conditions, shielded surface char...  

Matches 1 - 50 out of 2,481