Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 1 - 50 out of 2,334

Document Document Title
WO/2022/169662A1
A process for upgrading a heavy oil includes passing heavy oil and disulfide oil to a thermal cracking system that includes a thermal cracking unit and a cracker effluent separation system downstream of the thermal cracking unit and ther...  
WO/2022/159855A1
Nanocarriers are engineered to realize the potential of RNA therapeutics. This work reports the design of photo-crosslinked bioreducible nanoparticles (XbNPs) for stable siRNA encapsulation in high serum conditions, shielded surface char...  
WO/2022/113814A1
Provided are: a radiation-sensitive resin composition able to exhibit satisfactory levels of sensitivity, LWR performance and CDU performance; a method for forming a pattern; and an onium salt compound. This radiation-sensitive resin com...  
WO/2022/102190A1
Provided is a pattern formation method and a radiation-sensitive resin composition that can exhibit a sufficient level of sensitivity and CDU performance in a case in which next-generation technology is applied. A radiation-sensitive r...  
WO/2022/065090A1
A radiation-sensitive resin composition which exhibits sufficient sensitivity, LWR performance and CDU performance, a pattern forming method and an onium salt compound are provided. This radiation-sensitive resin composition comprises an...  
WO/2022/054554A1
Provided is a highly active actinic-ray-sensitive acid generator which, upon irradiation with actinic rays, comes to have cationic-polymerization performance or crosslinking reaction performance and which enables curable compositions con...  
WO/2022/024856A1
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a compound represented by general formula (I); an active-ray-sensitive or radiation-sensitive film formed by using the active-ray...  
WO/2022/018968A1
The present invention provides a useful photoacid generator which is contained in a photocurable composition, a chemically amplified positive photoresist composition and a chemically amplified negative photoresist composition, and which ...  
WO/2021/251086A1
A first problem addressed by the present invention is to provide an active-ray-sensitive or radiation-sensitive resin composition with which a pattern having a favorable form can be obtained. Further, a second problem addressed by the pr...  
WO/2021/251035A1
The present invention functions as a photoacid generator; and this photoacid generator provides a chemically amplified photoresist composition by being combined with a component that is a resin, the solubility of which in an alkali is in...  
WO/2021/245650A1
A photopolymer composition comprising at least one cycloaliphatic epoxy compound and a photoinitiator comprising a triarylsulfonium salt.  
WO/2021/241086A1
The present invention is provided with an actinic-ray-sensitive or radiation-sensitive resin composition, a resist film, a pattern formation method, an electronic device manufacturing method, a compound, and a compound production method ...  
WO/2021/230184A1
Provided is a compound that exhibits high sensitivity, high resolution, and a high degree of flatness. This compound is represented by formula (P-0). (In formula (P-0), Ar represents a moiety having a C6-60 aryl group, each ORTS independ...  
WO/2021/200179A1
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which increases in polarity by the action of an acid and (B) a compound which generates an acid upon irradiation with...  
WO/2021/200640A1
The purpose of the present invention is to provide an economical, convenient and reproducible method for evaluating an activity as a fluorinating agent. Provided is a method for evaluating an activity of a fluorinating agent, the metho...  
WO/2021/199841A1
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition from which a pattern having excellent LWR performance can be produced. Also provided are a resist film, a pattern formation method and an electronic device pro...  
WO/2021/186846A1
Provided are: a novel sulfonium salt highly photosensitive to active energy rays, in particular, i-rays or h-rays; and a novel photoacid generator which is highly photosensitive to i-rays or h-rays, and contains a sulfonium salt that is ...  
WO/2021/172111A1
The present invention provides a pattern formation method having (i) a step for forming an actinic ray-sensitive or radiation-sensitive film 700 nm or more thick by a specific actinic ray-sensitive or radiation-sensitive resin compositio...  
WO/2021/170913A1
Chemical modulators of PP2A, comprising tricyclic sulfonimidamides are disclosed. The compounds are useful in preventing or treating cancer, diabetes, autoimmune disease, solid organ transplant rejection, graft vs host disease, chronic o...  
WO/2021/171230A1
The present invention relates to novel compounds of the general formula (I) their pharmaceutically acceptable salts, pharmaceutically acceptable solvates, enantiomers, diastereomers and polymorphs. The invention also relates to processes...  
WO/2021/140761A1
The purpose of the present invention is to provide a radiation-sensitive resin composition and a resist pattern formation method, which enable formation of a resist pattern having excellent LWR performance and CDU performance and having ...  
WO/2021/131538A1
Provided are: a chemically amplified positive photosensitive resin composition that readily forms a resist pattern having a rectangular cross-sectional shape, the composition having excellent sensitivity and being capable of suppressing ...  
WO/2021/102624A1
Provided a proximity-enabled reactive therapeutics (PERx) approach to generate covalent protein drugs. A latent bioreactive amino acid FSY was incorporated into human programmed cell death protein 1 (PD-1), which selectively reacted with...  
WO/2021/108254A1
The present disclosure provides methods for preparing MCL1 inhibitors or a salt thereof and related key intermediates.  
WO/2021/099842A1
Provided herein are pentafluorobenzenesulfonamide compounds of Formula (I), pharmaceutical compositions comprising said compounds, and methods for using said compounds for the treatment of diseases. These compounds are covalent small mol...  
WO/2021/095356A1
This sulfonium salt is represented by general formula (1). (In general formula (1), R1 to R3 are each independently an alkyl group having 1-30 carbon atoms, an aryl group having 6-30 carbon atoms or a heteroaryl group having 4-30 carbon ...  
WO/2021/076710A1
N-Acylated histidine dipeptides of formula are disclosed (I). The compounds are useful for treating breast cancer.  
WO/2021/065450A1
An active light sensitive or radiation sensitive resin composition which contains (A) an acid-decomposable resin, (B) a compound represented by general formula (b1), and (C) a compound represented by general formula (c1), wherein the rat...  
WO/2021/048212A1
The invention relates to an improved process for preparing epoxides from aldehydes or ketones by reacting a ketone or aldehyde with at least one sulfonium salt, and to sulfonium salts that can be used in the process according to the inve...  
WO/2021/049592A1
Provided are a radiation-sensitive resin composition with which it is possible to form a resist pattern having excellent sensitivity to exposure light and having exceptional LWR performance and resolution, a resist pattern formation meth...  
WO/2021/048809A1
The present invention relates to novel heterocyclic compounds of general formula (I) their tautomers, stereoisomers, enantiomers, pharmaceutically acceptable salts and pharmaceutical composition. The compounds of general formula (I) belo...  
WO/2021/043541A1
The invention relates to a tape accelerator and a solid insulating material comprising said tape accelerator, as can be used for the production of an anhydride-free insulation system for motors and generators, for example in the form of ...  
WO/2021/039654A1
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition having a solid material concentration of 10% by mass or more, the active-ray-sensitive or radiation-sensitive resin composition comprising a...  
WO/2021/039244A1
Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained even when the composition has been stored for a long period of time. Also provided are a ...  
WO/2021/029422A1
Provided are a radiation-sensitive composition and method for forming a resist pattern which make it possible to form a resist pattern having excellent sensitivity, excellent resolution, and excellent LWR characteristics. The radiation-s...  
WO/2020/262648A1
The present invention provides a compound that has an excellent pest-controlling effect and that is represented by formula (I) [in the formula, L represents an oxygen atom or CH2, E represents a C2-C10 chain hydrocarbon group or the like...  
WO/2020/261885A1
[Problem] To provide: an actinic ray-sensitive or radiation-sensitive resin composition by which it is possible to obtain a pattern with excellent LWR characteristics even after being stored for a long period of time; and a resist film, ...  
WO/2020/262134A1
The present invention addresses the problem of providing a purification method for an actinic ray-sensitive or radiation-sensitive resin composition which can be used to form a pattern in which defects are inhibited. The present inventio...  
WO/2020/255585A1
The present invention provides a method for purifying a compound that generates an acid when irradiated with active light or radiation, said method being capable of reducing the content of metal impurities, while having excellent recover...  
WO/2020/250639A1
Provided are: a radiation-sensitive resin composition from which a resist pattern can be formed to have good sensitivity to exposure light, excellent LWR performance, and resolution; and a method of forming a resist pattern. The radiatio...  
WO/2020/233550A1
The present invention relates to a compound represented by formula (I) and a photoresist composition thereof. The compound of the present invention has dual functions of both acid generation and acid sensitivity, that is, same can be use...  
WO/2020/207620A1
The invention relates to a method for the photoredox catalytically selective activation of sulphur hexaflouride for the alpha-alkoxy pentaflourosulfonation of unsaturated carbon dioxide compounds and to a method for producing unsaturated...  
WO/2020/175495A1
Provided is a method for producing a salt by reacting M+X- with YH so as to generate XH and M+Y-, and then removing the generated XH so as to obtain M+Y-. M+X- is a salt of a cation represented by M+ and an anion represented by X-. M+Y- ...  
WO/2020/166677A1
Provided is, inter alia, a processing solution for semiconductor wafers for use in a semiconductor formation process. Provided is, inter alia, a processing solution that contains (A) hypochlorite ions and (B) an alkylammonium salt repres...  
WO/2020/130152A1
The present invention relates to compounds of formula I bearing a sulfoxonium ylide moiety as warhead, or salts thereof. Such compounds can be used as activity-based probes for cysteine proteases such as cathepsin X, in methods of detect...  
WO/2020/117608A1
Oxidized disulfide oil (ODSO) solvent compositions are derived from by-product disulfide oil (DSO) compounds produced as by-products from the generalized mercaptan oxidation (MEROX) processing of a refinery feedstock. The oxidized disulf...  
WO/2020/082817A1
The present application pertains to the technical field of pharmaceutical compounds and drugs, relates to an oxime-based naphthoquinone compound, a preparation method therefor and the uses thereof, and specifically relates to a formula (...  
WO/2020/081283A1
Stabilized thiosulfate blends are disclosed that include a compound having at least one thiosulfate functional group; and silica particles. The inventive blends may have a pH from about 4.5 to about 9, as measured according to ASTM D1293...  
WO/2020/073822A1
The present invention discloses a triphenylphosphonium salt compound as shown in the general formula (I), wherein R1 represents an electron withdrawing group and R2 represents an amplification group. Said compound shows significantly enh...  
WO/2020/067485A1
A compound represented by formula (1), a salt thereof or a solvate of the same [in formula (1), R1 represents a linear or branched alkyl group having 2 to 10 carbon atoms, a linear or branched alkyl group having 1 to 10 carbon atoms in w...  

Matches 1 - 50 out of 2,334