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Matches 1 - 50 out of 3,406

Document Document Title
WO/2021/065450A1
An active light sensitive or radiation sensitive resin composition which contains (A) an acid-decomposable resin, (B) a compound represented by general formula (b1), and (C) a compound represented by general formula (c1), wherein the rat...  
WO/2021/048212A1
The invention relates to an improved process for preparing epoxides from aldehydes or ketones by reacting a ketone or aldehyde with at least one sulfonium salt, and to sulfonium salts that can be used in the process according to the inve...  
WO/2021/049592A1
Provided are a radiation-sensitive resin composition with which it is possible to form a resist pattern having excellent sensitivity to exposure light and having exceptional LWR performance and resolution, a resist pattern formation meth...  
WO/2021/048809A1
The present invention relates to novel heterocyclic compounds of general formula (I) their tautomers, stereoisomers, enantiomers, pharmaceutically acceptable salts and pharmaceutical composition. The compounds of general formula (I) belo...  
WO/2021/043541A1
The invention relates to a tape accelerator and a solid insulating material comprising said tape accelerator, as can be used for the production of an anhydride-free insulation system for motors and generators, for example in the form of ...  
WO/2021/039654A1
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition having a solid material concentration of 10% by mass or more, the active-ray-sensitive or radiation-sensitive resin composition comprising a...  
WO/2021/039244A1
Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained even when the composition has been stored for a long period of time. Also provided are a ...  
WO/2021/029422A1
Provided are a radiation-sensitive composition and method for forming a resist pattern which make it possible to form a resist pattern having excellent sensitivity, excellent resolution, and excellent LWR characteristics. The radiation-s...  
WO/2020/262648A1
The present invention provides a compound that has an excellent pest-controlling effect and that is represented by formula (I) [in the formula, L represents an oxygen atom or CH2, E represents a C2-C10 chain hydrocarbon group or the like...  
WO/2020/261885A1
[Problem] To provide: an actinic ray-sensitive or radiation-sensitive resin composition by which it is possible to obtain a pattern with excellent LWR characteristics even after being stored for a long period of time; and a resist film, ...  
WO/2020/262134A1
The present invention addresses the problem of providing a purification method for an actinic ray-sensitive or radiation-sensitive resin composition which can be used to form a pattern in which defects are inhibited. The present inventio...  
WO/2020/255585A1
The present invention provides a method for purifying a compound that generates an acid when irradiated with active light or radiation, said method being capable of reducing the content of metal impurities, while having excellent recover...  
WO/2020/250639A1
Provided are: a radiation-sensitive resin composition from which a resist pattern can be formed to have good sensitivity to exposure light, excellent LWR performance, and resolution; and a method of forming a resist pattern. The radiatio...  
WO/2020/233550A1
The present invention relates to a compound represented by formula (I) and a photoresist composition thereof. The compound of the present invention has dual functions of both acid generation and acid sensitivity, that is, same can be use...  
WO/2020/207620A1
The invention relates to a method for the photoredox catalytically selective activation of sulphur hexaflouride for the alpha-alkoxy pentaflourosulfonation of unsaturated carbon dioxide compounds and to a method for producing unsaturated...  
WO/2020/175495A1
Provided is a method for producing a salt by reacting M+X- with YH so as to generate XH and M+Y-, and then removing the generated XH so as to obtain M+Y-. M+X- is a salt of a cation represented by M+ and an anion represented by X-. M+Y- ...  
WO/2020/166677A1
Provided is, inter alia, a processing solution for semiconductor wafers for use in a semiconductor formation process. Provided is, inter alia, a processing solution that contains (A) hypochlorite ions and (B) an alkylammonium salt repres...  
WO/2020/130152A1
The present invention relates to compounds of formula I bearing a sulfoxonium ylide moiety as warhead, or salts thereof. Such compounds can be used as activity-based probes for cysteine proteases such as cathepsin X, in methods of detect...  
WO/2020/117608A1
Oxidized disulfide oil (ODSO) solvent compositions are derived from by-product disulfide oil (DSO) compounds produced as by-products from the generalized mercaptan oxidation (MEROX) processing of a refinery feedstock. The oxidized disulf...  
WO/2020/082817A1
The present application pertains to the technical field of pharmaceutical compounds and drugs, relates to an oxime-based naphthoquinone compound, a preparation method therefor and the uses thereof, and specifically relates to a formula (...  
WO/2020/081283A1
Stabilized thiosulfate blends are disclosed that include a compound having at least one thiosulfate functional group; and silica particles. The inventive blends may have a pH from about 4.5 to about 9, as measured according to ASTM D1293...  
WO/2020/073822A1
The present invention discloses a triphenylphosphonium salt compound as shown in the general formula (I), wherein R1 represents an electron withdrawing group and R2 represents an amplification group. Said compound shows significantly enh...  
WO/2020/067485A1
A compound represented by formula (1), a salt thereof or a solvate of the same [in formula (1), R1 represents a linear or branched alkyl group having 2 to 10 carbon atoms, a linear or branched alkyl group having 1 to 10 carbon atoms in w...  
WO/2020/044771A1
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition from which a pattern having excellent LWR performance can be produced. Also provided are a resist film, a pattern formation method and an electronic device man...  
WO/2020/045535A1
The present invention provides: an active light sensitive or radiation sensitive resin composition that contains (A) a compound which generates an acid when irradiated with active light or radiation, and which has a specific structure; a...  
WO/2020/036329A1
The present invention relates to a fluorescent probe for detecting NAD(P)H in mitochondria, and a detection method using same. A probe of the present invention exhibits high selectivity and sensitivity to NAD(P)H and emits strong red flu...  
WO/2019/229103A1
The present invention relates to a process for preparing a polyfluorinated compound of formula Ar-Ri(l), wherein Ar-Ri(l) is an aromatic ring system wherein R1 is selected from the group consisting of SF4CI, SF3, SF2CF3, TeFS, TeF4CF3, S...  
WO/2019/225185A1
Provided are: a novel sulfonium salt having high photosensitivity to i-rays; and a novel photoacid generator, etc. comprising a sulfonium salt and having high photosensitivity to i-rays, and having high compatibility with cationically po...  
WO/2019/187445A1
Provided are: an active-ray-sensitive or radiation-sensitive resin composition which can be prevented from the change in line width of a pattern due to post-exposure delay; a resist film using the active-ray-sensitive or radiation-sensit...  
WO/2019/087626A1
Provided are: a compound which can be used suitably as a photodegradable base in a resist composition that has good sensitivity to an active energy, has excellent resolution in lithography and enables the reduction in line width roughnes...  
WO/2019/047734A1
Provided are a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition containing the sulfonium salt photoinitiator, and the use thereof. The sulfonium salt photoinitiator has a structure as represented b...  
WO/2019/044814A1
A method for producing a pentafluorosulfanyl aromatic compound represented by general formula (2): Ar-(SF5)k (in the formula, Ar is a substituted or unsubstituted aryl group or a heteroaryl group, k is an integer of 1-3) that includes re...  
WO/2019/039290A1
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent resolution, exposure latitude, and pattern shape properties; and a resist film, a pattern-forming method, a method for producing an electr...  
WO/2019/023147A1
In one aspect, compounds of Formula AA, or a pharmaceutically acceptable salt thereof, are featured.The variables shown in Formula AA are as defined in the claims. The compounds of formula AA are NLRP3 activity modulators and, as such, c...  
WO/2019/023145A1
In one aspect, compounds of Formula AA, or a pharmaceutically acceptable salt thereof, are featured. The variables shown in Formula AA are as defined in the claims. The compounds of formula AA are NLRP3 activity modulators and, as such, ...  
WO/2018/225018A1
The present invention relates to novel heterocyclic compounds of the general formula (I) their pharmaceutically acceptable salts, pharmaceutically acceptable solvates, enantiomers, diastereomers and polymorphs. The invention also relates...  
WO/2018/211442A1
The present invention relates to 4-substituted amidine derivatives of the general formula (I), wherein A1-A4, D, L, Q, R7, R7' and integer's v and w have the meanings as defined in description. The invention further relates to methods fo...  
WO/2018/186331A1
The purpose of the present invention is to provide a modification method for a mixture containing a trifluorosulfanyl aromatic compound and a fluorosulfinyl aromatic compound, wherein one or both of these compounds are converted into der...  
WO/2018/168252A1
Provided are: an active light sensitive or radiation sensitive resin composition, from which a pattern having low line width roughness (LWR) is formed; a resist film which uses this active light sensitive or radiation sensitive resin com...  
WO/2018/159515A1
Provided is a method for producing a pentafluorosulfanyl aromatic compound represented by general formula (3), Ar-(SF5)k, (in the formula, Ar is a substituted or unsubstituted aryl group or heteroaryl group, and k is an integer between 1...  
WO/2018/159560A1
The purpose of the present invention is to provide: a radiation-sensitive resin composition which has excellent LWR performance, resolution, rectangularity of a cross-sectional shape, depth of focus and film shrinkage suppressing propert...  
WO/2018/147204A1
Provided is a charge transporting varnish comprising: a charge transporting substance such as an aniline derivative and a thiophene derivative; an onium borate salt such as a compound represented by the formula; and an organic solvent.  
WO/2018/116916A1
Provided are: an active light sensitive or radiation sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of -1.40 or more when irradiated with active light or radiation, and (B) a resi...  
WO/2018/102433A1
Thionyl tetrafluoride gas reacts efficiently with primary amines to form reactive iminosulfur oxydifluoride compounds. These dual SVI-F loaded iminosulfur oxydifluoride compounds, in turn, readily react with secondary amines or aryloxy s...  
WO/2018/101339A1
Provided are a radiation-sensitive resin composition including an acid generating agent that gives an acid having sufficient acid strength even when no fluorine atoms are present at the proximal carbon of a sulfonic acid group, an onium ...  
WO/2018/087064A1
The invention relates to a method for producing triarylorganoborates from organoboronic acid esters in the presence of an n-valent cation 1/n Kn+, comprising the anhydrous treatment of the reaction mixture, and to the use of the obtained...  
WO/2018/084050A1
Provided are: a metal-containing onium salt compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to ionizing radiation such as extreme ultraviolet (EUV), are excellent in term...  
WO/2018/074382A1
Provided are an onium salt and a composition which are appropriately usable in a resist composition for a lithography process, wherein two kinds of active energy rays including first active energy rays such as electron beams or extreme u...  
WO/2018/071327A1
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions con...  
WO/2018/028461A1
Disclosed are a novel cationic photoinitiator, and a preparation method therefor and applications thereof. The cationic photoinitiator has a structure represented by formula (I), can match a longer absorption wavelength in the applicatio...  

Matches 1 - 50 out of 3,406