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JP2006016606A |
To provide a catalyst for addition polymerization of a cyclic olefin, having excellent addition polymerization activity of the cyclic olefin containing a hydroxy group and/or an acetyl group; to provide a method for producing an addition...
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JP3734012B2 |
To obtain a resist material sensitive to high energy beams, excellent in sensitivity, resolution and etching resistance, useful in micro-fabrication with electron beams or far UV and capable of easily forming a minute pattern perpendicul...
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JP3730661B2 |
PCT No. PCT/AU94/00433 Sec. 371 Date Jan. 26, 1996 Sec. 102(e) Date Jan. 26, 1996 PCT Filed Jul. 29, 1994 PCT Pub. No. WO95/04026 PCT Pub. Date Feb. 9, 1995Compounds of general formula (I) (I) characterised in that R1 and R2 are independ...
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JP3721190B1 |
Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions ...
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JP3719734B2 |
PURPOSE: To transmit light from UV rays to near IR rays with low loss while keeping heat resistance, solvent resistance and flame retardant property by forming a coating layer around a refractive index distribution type fluorine- contg. ...
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JP3719735B2 |
PURPOSE: To prevent leaking of light by using a noncrystalline fluorine-contg. polymer having no C-H bond to constitute a refractive index distribution type optical fiber, and forming an outer layer with a fluorine-contg. polymer having ...
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JP2005325033A |
To provide a norbornene-based derivative capable of being used as a monomer for a polymer having an excellent transparency and heat resistance, and capable of expressing a controlled and desired birefringence and wave length dispersion, ...
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JP2005322795A |
To provide the design method of a resist molecule for improving transparency of fluororesin resist in 157 nm lithography.The structure of a model molecule is determined where a frame of fluorine content resin is extracted, and a fluorine...
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JP2005290375A |
To provide a catalyst complex for polymerization and copolymerization of a cyclic olefin.In a method for polymerization and copolymerization of the cyclic olefin such as norbornene, the catalyst complex showing a high activity for polyme...
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JP3705734B2 |
To provide a new photoresist monomer that can be used in the far ultraviolet ray area. This monomer is a bicyclo compound represented by formula (1) (B means a group selected from those represented by formula II (R is H, a 1-10C alkyl, -...
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JP2005272336A |
To obtain a carboxy group-containing tetracyclododecene compound for providing a resin film having excellent patterning performance, heat resistance, etc., when used in a radiation-sensitive composition.The new carboxy group-containing t...
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JP3703525B2 |
PURPOSE: To obtain a thermoplastic cycloolefin copolymer having excellent tensile strength and transparency and a high viscosity number by polymerizing a cycloolefin with an acryclic olefin in the presence of a specified catalyst. CONSTI...
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JP2005263644A |
To provide a method for producing a polycyclic compound by the Diels Alder addition reaction of a cyclic diene to a polar group-containing dienophile, having a high yield of an objective substance and less byproducts.This method for prod...
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JP3698437B2 |
A process for the preparation of ethylene polymers is disclosed, comprising the polymerization reaction of ethylene in the presence of a catalyst consisting of the reaction product of: (A) a mixture of the racemic and meso isomers of a s...
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JP2005226015A |
To provide a polymer material improved in transparency in a visible light region and an infrared region in electric/electronic material and optical material, particularly optical waveguide material field.The subject deuterated cyclic ole...
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JP2005213471A |
To provide a new polymer comprising a repeating unit having an alicyclic epoxy group structurally controlled.In the polymer comprising the repeating unit having the alicyclic epoxy group obtained by an anion polymerizing method using 1,1...
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JP3680920B2 |
To obtain a new compound capable of obtaining a high molecular compound excellent in acid degradability, and, when the compound is formulated with a resist material as a base resin, further capable of providing a high molecular compound ...
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JP3678754B2 |
Addition polymers containing functionally substituted polycyclic repeat units are prepared in the presence of a single or multicomponent catalyst system containing a palladium metal ion source. The catalysts are not poisoned by functiona...
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JP3675485B2 |
Compounds of the formula wherein: M is selected from the group consisting of Os and Ru; R<9> and R<10> are independently selected from the group consisting of hydrogen, substituted or unsubstituted alkyl and substituted or unsubstituted ...
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JP2005189501A |
To provide a chemically amplified resist composition suitable for use of an exposure light source of ≤250 nm, particularly F2 excimer laser light (157 nm), and to more specifically provide a chemically amplified resist composition exce...
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JP2005171234A |
To provide a new (co)polymer having carboxylic acid silyl ester residues, to provide a method for producing the same, and to provide a method for producing a carboxyl group-containing (co)polymer.This (co)polymer has structural units exp...
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JP2005518476A |
Provided are polymers derived from fluoroalkyl norbornenes, fluorinated crotonates, fluorinated allyl alcohols, and combinations of two or more thereof for use in a wide variety of applications, including photoresist compositions. Also p...
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JP2005516382A |
The present invention provides a composition comprising: (a) dielectric material; and (b) porogen comprising at least two fused aromatic rings wherein each of the fused aromatic rings has at least one alkyl substituent thereon and a bond...
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JP2005136383A |
To provide an organic semiconductor device with high mobility.The organic semiconductor device that a polymer layer that contacts the organic semiconductor is provided independently of a gate insulating film, and the polymer layer is a s...
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JP2005133088A |
To provide a resin composition excellent in electrical property and workability and to provide a process for producing a norbornene polymer in a short time.The invention relates to the process for producing the norbornene polymer compris...
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JP2005514659A5 |
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JP3646020B2 |
To provide a new compound that bears one or more carboxylic acid an butyl groups and can readily produce a large amount of photoresist resins for electron beams and X-rays in low costs. This new compound is represented by formula I (R1 a...
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JP3646334B2 |
PURPOSE: To efficiently obtain a cyclic olefin polymer by using minute amounts of catalyst consisting mainly of a palladium compound component and a specific compound component. CONSTITUTION: This polymer is obtained by polymerizing a cy...
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JP3642316B2 |
To provide a chemical amplification resist having a high light transparency for the light of ≤220 nm, having a high etching resistance and excellent in close adhering property to a substrate. This chemical amplification resist is prepa...
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JP2005105143A |
To provide a sealing material suppressing occurrence of crack, having high adhesiveness and transparency to an object to be sealed and capable of reducing deterioration with time, and to provide a surface mounting type LED (light emittin...
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JP2005099276A |
To provide a resist material which shows sufficient transparency when a light source at ≤160 nm wavelength, specifically F2 excimer laser light (at 157 nm) is used for the manufacture of a semiconductor device, which reduces a pattern ...
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JP2005068424A |
To obtain a catalytic composition and to provide its preparation and its use for preparing a polymer from an ethylenically unsaturated monomer.The catalytic composition, containing a cationic metal-pair complex, is disclosed, along with ...
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JP2005070316A |
To provide a resist composition which exhibits satisfactory transmittance when a light source of ≤160 nm, particularly F2 excimer laser light (157 nm) is used, and ensures good profile because of suppressed trailing, and to provide a p...
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JP3623891B2 |
To obtain a molding methacrylic material having excellent transparency, heat resistance, and mechanical strengths, low water absorption, and low birefringence by a high-productivity industrially practicable manner by polymerizing an α-s...
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JP2005029527A |
To provide a new fluorine-based cyclic compound, a fluorine-based polymerizable monomer and a fluorine-based polymer compound and to provide a resist material having a high transparency in a wide wavelength area from an ultraviolet ray a...
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JP3607761B2 |
A hydrocarbon resin having a Ring and Ball (R&B) softening point of 70-150[deg]C, a max. Mz of 4000, a max. Mw of 2500 and a max. polydispersity (Pd) of 3.0, comprises a thermally polymerised copolymer made from: (I) 40-90 wt.% (based on...
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JP2004359964A |
To provide a thermally polymerized resin having a relatively low molecular weight and a relatively high softening point, which is produced using a low-cost DCPD feed stock as a base and does not substantially change with time in a reacto...
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JP3604162B2 |
PURPOSE: To provide a method for producing an acrylic caulking or sealing composition with improved adhesion and free from silanes. CONSTITUTION: In this method for producing an acrylic caulking or sealing composition with improved adhes...
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JP3595863B2 |
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JP2004331779A |
To efficiently produce a relatively high-molecular-weight indene polymer under a mild condition by applying the polymerization technique of a metal complex catalyst.The method for producing the indene-based polymer comprises polymerizing...
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JP2004317575A |
To provide a method for producing a hydroxyacid compound having a reduced metal impurity content and capable of providing a good resist pattern by performing ring opening of a lactone ring using an organic alkali.The method for producing...
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JP3587739B2 |
The present invention provides a photoresist monomer represented by the following formula 2; a photoresist copolymer represented by the following formula 100; and a photoresist composition containing the same.wherein, R1 and R2 are indep...
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JP3587743B2 |
The present invention relates to novel monomers which can be used to form polymers which are useful in a photolithography employing a light source in the far ultraviolet region of the light spectrum, copolymers thereof, and photoresist c...
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JP2004294688A |
To provide a positive resist composition excellent in dependence on the concentration of a developing solution and durability against side lobe light (side robe margin).The chemical amplifying resist composition contains: (A-1) a resin h...
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JP3578430B2 |
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JP2004285249A |
To provide a new photocurable and polymerizable compound having a norbornene skeleton having various advantages on a main chain and to provide a method for producing the compound.The method for producing the polymerizable compound compri...
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JP3574399B2 |
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JP3570455B2 |
To obtain a resin composition having low birefringence and excellent transparency and flowability by mixing a polar-group-containing thermoplastic norbornene resin with a normally solid hydrocarbon resin. This composition comprises 100 p...
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JP2004256666A |
To provide a fluorine-containing polymer excellent in insulation and transparency in the low wavelength region.The fluorine-containing polymer contains (A) a repeating unit as expressed by formula (1) in the molecule in an amount of 1-10...
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JP2004244464A |
To provide a fluorine-containing polymer having excellent mechanical strengths, excellent stain resistance, and the like, and to provide a method for producing the fluorine-containing polymer.This fluorine-containing polymer containing r...
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