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Document Title |
JP2002145925A |
To provide a new organic metal compound having sufficient catalytic activity and capable of polymerizing a linear olefin or cyclic olefin at a high conversion ratio and a method for preparing the same, an olefin polymerization catalyst c...
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JP3284699B2 |
PURPOSE: To obtain a stock solution having an easily adjustable pot life and not suffering from decreased production efficiency even in the production of a large molding by dividing an activity modifier which is added to prepare a stock ...
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JP2002139834A |
To provide a method for forming a negative type pattern free of swelling and excellent in resolution while having a chemical structure transparent in the far UV region including 193 nm wavelength of ArF excimer laser beam and having high...
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JP3280637B2 |
To obtain a cyclic dione polymer having low hydroscopicity and a low glass transition temperature, excellent in adhesion and storage stability and useful for a thin film coating industry and a photoresist industry by homopolymerzing a cy...
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JP2002128831A |
To provide a novel norbornene-based compound having high transpar ency to radiation and excellent in sensitivity, resolution, pattern shape or the like and also having small variation in line width to temperature change when heated after...
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JP3277568B2 |
PURPOSE: To obtain a resin excellent in heat resistance, moisture resistance, transparency, low birefringent properties, chemical resistance, electrically insulating properties, mechanical properties, etc., by using a small amount of a h...
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JP2002114739A |
To provide a method for industrially easily producing in high yield and in high purity a t-butoxycarbonyl-substituted norbornene derivative of the general formula (2) useful as a raw material for resins for resists suitable for exposure ...
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JP2002511503A |
The invention refers to a linear, isotactic polymer which has a structure of one or several C2 to C20 olefins, of which the isotacticity, due to a statistic distribution of stereoscopic errors in the polymer chain, is within the range of...
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JP3269796B2 |
To easily carry out a lithographic process utilizing far UV and to form a fine pattern fit to highly integrate a semiconductor device by polymerizing plural kinds of specified alicyclic olefins. Two or more kinds of alicyclic olefins sel...
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JP2002509955A |
Substituted cyclopentenes, such as alkyl cyclopentenes, are polymerized by selected alpha-imine complexes of nickel and palladium. The polymers are useful as molding resins or elastomers. Also disclosed herein are novel catalysts for the...
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JP2002091005A |
To provide a positive photoresist composition excellent in resolving power and ensuring few particles and few development defects in the production of a semiconductor device.The positive photoresist composition contains (A) resin contain...
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JP2002091002A |
To provide a new radiation sensitive resin composition having high transparency to radiation and superior developability, excellent in adhesiveness to a substrate as well as in basic solid state properties as a resist, e.g. sensitivity, ...
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JP3268005B2 |
PURPOSE: To provide an olefinic copolymer which is excellent in elastic recovery and low-temperature properties and can be improved in high-temperature properties, adhesiveness, etc., by grafting and a process for efficiently producing t...
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JP3266368B2 |
PURPOSE: To provide a method for producing a cyclic olefinic copolymer excellent in copolymerizability and polymerization activity, capable of giving the cyclic olefinic copolymer narrow in the mol.wt. distribution and high in the random...
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JP2002069122A |
To provide a method for removing fully a hydrogenation catalyst in a short time from a solution of polymer containing an alicyclic structure which contains the catalyst and to produce a polymer containing the alicyclic structure which ha...
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JP3260847B2 |
PURPOSE: To obtain a copolymer having excellent oil-resistance, solvent- resistance, transparency, rigidity and heat-resistance and useful as optical material, etc., by copolymerizing an α-olefin and a specific cycloolefin under specifi...
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JP2002053607A |
To provide a metallocene compund that is useful as a component for olefin polymerization catalysts, stable to air and water and easy to handle, liberates no hydrogen halide with high storage stability and has high catalyst activity.The o...
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JP3255692B2 |
PURPOSE: To provide a shape-recovering molding capable of being deformed at room temperature, recovered into the original shape by heating the deformed molding at ≥ a constant temperature and of being utilized for industrial molding, t...
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JP2002047355A |
To provide an inorganic fiber reinforced flame retardant resin composite (IFRP) excellent in flame retardancy and a composite of a IFRP.The composition for IFRP is composed of a polyvalent metal salt (A1) of a phosphoric acid ester (A0) ...
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JP2002504573A |
The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consist...
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JP3255697B2 |
PURPOSE: To provide the olefinic synthetic wax excellent in the transparency and the low temperature characteristics, and further to provide a method for efficiently producing the same. CONSTITUTION: The wax comprises an α-olefin-cyclic...
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JP2002504577A |
The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polym...
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JP2002047317A |
To provide a photoresist composition with low absorbance at 193 nm and 157 nm.The photoresist polymer shown in Formula (3) and the photoresist composition using the polymer are manufactured. The photoresist composition is effectively use...
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JP2002504171A |
Olefins such as ethylene and alpha -olefins may be (co)polymerized using preformed catalysts containing selected transition metals, especially late transition metals, complexed to selected ligands. These performed catalysts are preferabl...
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JP3253563B2 |
To make a gas phase fluidized bed reactor capable of performing a gas phase polymerization reaction controllable of growing of grain size of a polymer without stopping an operation of the reactor by supplying a liquid catalyst into the r...
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JP2002502888A |
A process for producing an unsaturated cyclic compound, comprising the steps of hydrochlorinating a terpene to produce a hydrochlorinated terpene, and subjecting the hydrochlorinate terpene to elimination of hydrogen chloride to form an ...
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JP2002023371A |
To provide a new radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist such as sensitivity, resolution and pattern shape, not causing development defects in microf...
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JP3247130B2 |
Polymers of polycyclic olefins such as, for example, norbornene or tetracyclododecene, or copolymers of polycyclic olefins with cycloolefins and/or 1-olefins are obtained without ring opening, in high space-time yield, with high cycloole...
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JP2002003447A |
To provide a novel alicyclic esterified norbornene carboxylate monomer, polymer thereof and photoresist composition including the polymer as a resin binder and the synthetic methods for the same.The method of preparing a substituted norb...
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JP3244124B2 |
The present invention relates to a metallocene compound as a catalyst component for the polymerization of olefins, said compound is stable to air and moisture so that it generates no hydrogen halide by hydrolysis and is easily handled, a...
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JP2001354755A |
To provide a resin film which is excellent in punching procesability, has high mechanical strength, and comprises a thermoplastic saturated norbornene resin and to provide a process which can suitably produce the film.This film comprises...
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JP2001350025A |
To provide a light guide with superior heat and moisture resistance and high brightness, with respect to a surface light source device used for a liquid crystal display panel.The light guide, which is useful for the surface light source ...
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JP2001348410A |
To provide a polymer which is used as a binder in a polymer composition useful for a photoresist composition.This polymer contains as polymerized units one or more cyclic olefin monomers having fused cyclic electron-withdrawing groups re...
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JP3237072B2 |
PURPOSE: To obtain a random copolymer excellent in transparency, heat resistance and mechanical properties and also in melt flow by copolymerizing a specified α-olefin with a specified norbornene derivative and a specified cycloolefin. ...
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JP3237073B2 |
PURPOSE: To improve the resistances to impact and heat by copolymerizing an α-olefin with a specific cycloolefin in the presence of a hydrocarbon elastomer. CONSTITUTION: 10-90mol% α-olefin and 90-10mol% cycloolefin of formula I (where...
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JP3235219B2 |
PURPOSE: To obtain a resin excellent in heat, moisture and chemical resistance, transparency, low birefringent properties, electrical insulating properties, etc., by using a small amount of a hardly available monomer. CONSTITUTION: The o...
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JP2001330959A |
To provide a positive type radiation sensitive resin composition having high transparency to radiation, excellent in resolution, sensitivity, pattern shape, etc., causing no development defect in microfabrication and capable of producing...
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JP2001328964A |
To provide a new polycyclic unsaturated hydrocarbon derivative useful as a monomer for producing radiation-sensitive resists which have good dry etching resistance and excellent transparency for radiations having wavelengths of ≤160 nm...
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JP2001329016A |
To provide a method for manufacturing a cyclic olefin polymer showing heat resistance and lowering of the molecular weight and having little residual solvent.A cyclic olefin polymer composition comprising a cyclic olefin polymer and an o...
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JP2001323031A |
To provide a photoresist composition capable of forming an image with light having short wavelength, containing a resin binder having decreased swelling tendency and exhibiting excellent adhesion to the substrate compared with convention...
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JP2001302726A |
To obtain a resist material comprising a polymeric compound bearing a group represented by general formula (1) (wherein R1, R2, R3 and R4 are each hydrogen atom, fluorine atom, a 1-20C linear, branched or cyclic alkyl group or a fluoroal...
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JP3223527B2 |
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JP2001294724A |
To provide a highly heat-resistant polyolefin resin material that can be obtained in various forms, is environmentally safe, chemically resistant and nonhygroscopic, and is suitable for various applications. This resin material comprises...
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JP2001519821A |
(57) [Summary] The present invention relates to catalysts; and the use of such catalysts for polymerization. This catalyst has the formula (I):[In the formula, R1Is a monocyclic or polycyclic hydrocarbon; M1+Is a Group VIIIb transition m...
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JP2001290274A |
To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. The radiation sensi...
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JP2001518953A |
pi-complex compounds and in particular metallocene compounds of formula (Ia)(Ib),in which piI and piII represent pi-systems, D designates a donor atom and A designates an acceptor atom, D and A being linked by a reversible coordinative b...
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JP2001518968A |
(57) [Summary] The following formula (A)Represented by and in the formula, M means chromium, molybdenum or tungsten, respectively, independently of each other, and Z means fluorine, chlorine, bromine, iodine, hydrogen or C, respectively,...
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JP2001518955A |
The invention relates to the production of homopolymers, co-copolymers or block copolymers from cycloolefinic monomer units characterized in that polymerization occurs in the presence of a catalyst of general formula (I), and optionally ...
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JP2001278960A |
To provide a method for producing in large quantities and high efficiency the polymer having a cyclic structure with few possibilities of manufacturing a defective molding such as discoloring and a sink mark in the molding. The monomer h...
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JP2001273675A |
To provide an information recording medium free of groove deforma tion in the recording and reproduction of a signal and disk vibration and warpage in the read of a signal and excellent also in the transferability of pits and grooves. Th...
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