| Document |
Document Title |
|
WO/2011/044361 |
System and method for processing image data between adjacent imaging areas in a lithography manufacturing process are disclosed, hi one embodiment, the method includes providing a parallel imaging writer system which has a plurality of s...
|
|
WO/2011/043071 |
Disclosed is a pellicle which has a mask adhesive layer that has adequate softness and good handling properties, said mask adhesive layer leaving only few adhesive residue when separated from a mask. Particularly disclosed is a pellicle ...
|
|
WO/2011/035946 |
Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced...
|
|
WO/2011/034728 |
A distributed patterned mask for use in a laser ablation process to image a complete pattern onto a substrate. The mask has a plurality of apertures for transmission of light and non-transmissive areas around the apertures. When the aper...
|
|
WO/2011/034728 |
A distributed patterned mask for use in a laser ablation process to image a complete pattern onto a substrate. The mask has a plurality of apertures for transmission of light and non-transmissive areas around the apertures. When the aper...
|
|
WO/2011/029535 |
During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an e...
|
|
WO/2011/029535 |
During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an e...
|
|
WO/2011/030521 |
Disclosed is a method for manufacturing a mask blank, which is provided with a thin film containing a transition metal, silicon, and oxygen and/or nitrogen. With the method, the metal oxide thin film having less defects and a uniform fil...
|
|
WO/2011/027647 |
Disclosed is a method for manufacturing a half-tone mask, wherein film-forming steps are reduced. The half-tone mask is provided with: a transparent substrate (2), which has, on the surface thereof, a transmitting section (21) that trans...
|
|
WO/2011/026055 |
A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure.
|
|
WO/2011/026055 |
A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure.
|
|
WO/2011/025795 |
A charged particle beam writer system is disclosed comprising a generator for a charged particle beam having a beam blur radius, wherein the beam blur radius may be varied from shot to shot, or between two or more groups of shots. A meth...
|
|
WO/2011/022703 |
A character projection charged particle beam writer system is disclosed comprising a variable magnification reduction lens which will allow different shot magnifications on a shot by shot basis. A method for fracturing or mask data prepa...
|
|
WO/2011/015412 |
Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the o...
|
|
WO/2011/013317 |
Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers i...
|
|
WO/2011/012265 |
A method is provided for determining the position of a first structure (8a) relative to a second structure (8b) or a part thereof, said method having the steps of: a) providing a first picture (Fl) having a multiplicity of pixels and whi...
|
|
WO/2011/007523 |
Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy...
|
|
WO/2011/007800 |
Provided is a mask blank to which EB defect correction can be suitably applied and which allows a light-blocking film to be made thinner. The provided mask blank (10) has a light-blocking film (2) on top of a light-transmitting substrate...
|
|
WO/2011/004850 |
Disclosed is an EUV-lithography reflection-type mask blank that is provided with an absorber layer that has an optical constant suited for making films thinner. The EUV-lithography reflection-type mask blank, which has a reflection layer...
|
|
WO/2011/002967 |
The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than...
|
|
WO/2011/002806 |
Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k...
|
|
WO/2010/151087 |
The present invention relates to a manufacturing method of half tone mask configured to have multiple half permeation units using a single half permeation material, wherein the manufacturing method of half tone mask comprises: forming a ...
|
|
WO/2010/151087 |
The present invention relates to a manufacturing method of half tone mask configured to have multiple half permeation units using a single half permeation material, wherein the manufacturing method of half tone mask comprises: forming a ...
|
|
WO/2010/150355 |
Disclosed is a multilevel gradation photomask comprising a light shielding film that is provided on a transparent substrate and shields exposure light and a semi-light transparent film through which a part of the exposure light is transm...
|
|
WO/2010/148343 |
One embodiment relates to a method of automatically inspecting multiple array regions (102) simultaneously using an imaging apparatus (302). The method includes selecting (211 or 212) an optimal pixel size such that each array region in ...
|
|
WO/2010/147172 |
Provided is a mask blank that is suitable for application to EB defect repair and also allows light-blocking films to be made thinner. The provided mask blank (10) is used to create transfer masks to which ArF exposure light is applied, ...
|
|
WO/2010/147846 |
Provided are novel inspection methods and systems for inspecting unpatterned objects, such as extreme ultraviolet (EUV) mask blanks, for surface defects, including extremely small defects. Defects may include various phase objects, such ...
|
|
WO/2010/148343 |
One embodiment relates to a method of automatically inspecting multiple array regions (102) simultaneously using an imaging apparatus (302). The method includes selecting (211 or 212) an optimal pixel size such that each array region in ...
|
|
WO/2010/147846 |
Provided are novel inspection methods and systems for inspecting unpatterned objects, such as extreme ultraviolet (EUV) mask blanks, for surface defects, including extremely small defects. Defects may include various phase objects, such ...
|
|
WO/2010/147195 |
A protective apparatus (2) that protects a predetermined area of the front surface of a mask substrate (1), provided with a pellicle frame (4) that is disposed on at least a portion of the circumference of the predetermined area and bond...
|
|
WO/2010/146965 |
Disclosed are a photo mask, a photolithography method, a substrate production method and a display panel production method which can reduce the number of photo masks. The photolithography method uses a photo mask (1a) to create a semi tr...
|
|
WO/2010/140223 |
A pressing body comprises three or more pressing pins (40) brought into contact with a photomask (70) on the underside in the pressing direction D, a body (10) which supports the pressing pins (40) unreleasably downward, which allows the...
|
|
WO/2010/134449 |
Disclosed is a method for producing a TiO2-SiO2 glass body, which comprises a step in which a TiO2-SiO2 glass body after transparent vitrification is heated at a temperature of not less than T1 + 400 (°C) for 20 hours or more and a step...
|
|
WO/2010/134779 |
A half tone mask is characterized in that the half tone mask having at least one or more half permeation parts capable of adjusting a transmittance by adjusting pattern density of a fine pattern forming the half permeation part, whereby ...
|
|
WO/2010/134779 |
A half tone mask is characterized in that the half tone mask having at least one or more half permeation parts capable of adjusting a transmittance by adjusting pattern density of a fine pattern forming the half permeation part, whereby ...
|
|
WO/2010/131662 |
Disclosed is a method for producing a TiO2-SiO2 glass body, which comprises a step in which a TiO2-SiO2 glass body after transparent vitrification is maintained within a temperature range from T1-90 (°C) to T1-220 (°C) for 120 hours or...
|
|
WO/2010/131414 |
Disclosed is a purging apparatus with reduced purging operation time. To achieve this, a pod opener (21), which is an apparatus for feeding purging gas into a reticle pod (1) which comprises a pod cover (5) and an openable bottom lid (7)...
|
|
WO/2010/131632 |
Disclosed is a liquid crystal polymer represented by formula (I). In formula (I), R represents a hydrogen atom or a methyl group, n represents an integer of 1 to 20, m represents an integer of 3 or more, at least one of the X's represent...
|
|
WO/2010/125933 |
Provided is a mold release composition, with which it is possible to form a transparent coating on the surface of which a photoresist cannot be readily deposited. Also provided is a surface protective film having a coating formed from th...
|
|
WO/2010/125825 |
Disclosed is a color filter capable of constituting a liquid crystal display device free of display variation due to the difference in exposure illuminance between exposure heads and due to the misalignment of the pattern and excellent i...
|
|
WO/2010/126166 |
A protective apparatus protects a predetermined area on a surface of a substrate. The protective apparatus includes: a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each oth...
|
|
WO/2010/124791 |
A method for calibrating an apparatus (10) for the position measurement of measurement structures (14) on a lithography mask (12) comprises the following steps: qualifying a calibration mask (40) comprising diffractive structures (42) ar...
|
|
WO/2010/122697 |
A pellicle for lithography is provided with a pellicle film (10) of monocrystalline silicon which is supported by a support member (20a) having an outer frame portion (20a) and a porous portion (mesh structure) (20b) on an inside area of...
|
|
WO/2010/119811 |
A relative density of a light shielding film of MoSi, which is represented by (relative density = real density/theoretical density x 100), is obtained from a density (real density) calculated by an XRR method and a theoretical density wh...
|
|
WO/2010/118927 |
A mask inspection system with Fourier filtering and image compare can include a first detector, a dynamic Fourier filter, a controller, and a second detector. The first detector can be located at a Fourier plane of the inspection system ...
|
|
WO/2010/117626 |
The manufacturing of integrated circuits relies on the use of lithography simulation to predict the image of the mask created on the wafer. Such predictions can be used for example to assess the quality of the images, verify the manufact...
|
|
WO/2010/117626 |
The manufacturing of integrated circuits relies on the use of lithography simulation to predict the image of the mask created on the wafer. Such predictions can be used for example to assess the quality of the images, verify the manufact...
|
|
WO/2010/116647 |
Disclosed is a method for forming a resist pattern, wherein the uniformity of development is improved by increasing the wettability of the surface of a resist layer when the resist pattern is formed on a device such as a photoresist. Spe...
|
|
WO/2010/116646 |
Disclosed is a method for forming a resist pattern, wherein a good resist pattern is obtained by performing light exposure using a resist layer that has a uniform thickness when the resist pattern is formed on a device such as a photores...
|
|
WO/2010/115027 |
The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.
|
