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WO/2023/090777A1 |
The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. More specifically, the present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography, th...
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WO/2023/086297A1 |
Reticle pods include inner pods where motion limiting features restrict translational motion of the cover and the baseplate relative to one another. The motion limiting features are in addition to gross alignment features included in the...
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WO/2023/085761A1 |
The present invention relates to a pellicle film for extreme ultraviolet lithography. More specifically, the present invention relates to a pellicle film, for extreme ultraviolet lithography, comprising a multi-component silicon compound...
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WO/2023/082411A1 |
A photomask, and a manufacturing method and exposure method therefor. The photomask comprises: a first graphical region (100) and a first cutting channel region (200), which surrounds the first graphical region (100), wherein a first tes...
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WO/2023/078589A1 |
Stocker system for storage of a plurality of reticles, especially EUV reticles, comprising a plurality of storage pods (110) each adapted to hold one of said reticles in their interior, and to be stacked vertically one above the other to...
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WO/2023/076267A1 |
An apparatus includes a reticle pod. The reticle pod includes a baseplate having a first surface, a cover having a second surface, and a stand-off mechanism on at least one of the cover and the baseplate. The first surface includes a fir...
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WO/2023/074770A1 |
[Problem] To obtain a multilayer reflective film-attached substrate having a structure in which a protective film made of a material containing metal is provided, the multilayer reflective film-attached substrate being configured such th...
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WO/2023/074899A1 |
[Problem] The objective of the present invention is to provide a pellicle frame, and a pellicle employing the same, which prevents the discharge and generation of debris and foreign matter remaining on a frame during processing to create...
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WO/2023/070738A1 |
A mask parameter optimization method, comprising: acquiring a test pattern, a light source parameter, and an initial mask parameter, wherein the initial mask parameter comprises a mask thickness and an initial mask side wall angle; gener...
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WO/2023/073713A1 |
An antireflective coating for reducing reflection of a wave off the coating, comprises a stack of layers, each having a discrete array of resonators characterized by a resonant wavelength within a spectral band of the wave, wherein at le...
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WO/2023/069433A1 |
Embodiments of the present disclosure relate to a photomask. The photomask may include: a substrate; and one or more pixel units formed over the substrate. Each pixel unit may include: at least one polymer crystal element configured to i...
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WO/2023/067957A1 |
Provided is an EUV transmissive film exhibiting not only EUV transmittance but also high IR emissivity. This EUV transmissive film has an EUV transmittance of at least 80% at a wavelength of 13.5nm, and comprises a main layer that has an...
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WO/2023/066657A1 |
Described herein is a method for grouping patterns associated with one or more design layouts of a semiconductor. The method involves obtaining a set of patterns (e.g., from one or more design layouts), where a pattern of the set of patt...
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WO/2023/068555A1 |
The present invention relates to a method for preparing a stencil provided with a protection bridge for fine pattern printing. As the method for preparing a stencil that is provided with a protection bridge for fine pattern printing, whe...
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WO/2023/066685A1 |
There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle me...
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WO/2023/066683A1 |
A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is c...
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WO/2023/067739A1 |
Provided is an EUV transmissive film exhibiting both durability in low-pressure hydrogen atmosphere environments and a high practical level of EUV transmittance. The EUV transmissive film is equipped with a main layer that is formed from...
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WO/2023/061387A1 |
The present invention relates to a class-A amplification apparatus, in particular to a class-A amplification apparatus which is connected in series in a circuit by using an energy source, is used for eliminating a cut-off of a fully cont...
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WO/2023/058368A1 |
The present invention provides a method that is capable of forming a good pattern by making a large difference in the developer solution solubility between a light-exposed part and a non-light-exposed part in cases where a radiation sens...
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WO/2023/058929A1 |
A method for forming a line and a space pattern, according to one embodiment of the present invention, comprises exposing a mask in a first direction and a second direction on a substrate and stitching same. The method for forming a line...
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WO/2023/055729A1 |
A filtration formed nanostructure pellicle film with an ultra-thin zirconium coating is disclosed. The filtration formed nanostructure pellicle film includes a plurality of nanotubes that are intersected randomly to form an interconnecte...
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WO/2023/054037A1 |
The purpose of the present invention is to provide, in order to enable defect inspection after the formation of a conductive film, a conductive film having low transmittance in a wavelength range including Ar laser inspection light (a wa...
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WO/2023/055945A1 |
The present disclosure provides masks suitable for Extreme Ultraviolet (EUV) and X-ray lithography by including a non-reflective region combined with a reflective multilayer. This non-reflective region replaces a typical absorber layer u...
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WO/2023/055634A1 |
Methods and systems for detecting defects on a mask are provided. One method includes generating a database reference image for a multi-die mask by simulation and detecting first defects on the mask by comparing the database reference im...
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WO/2023/054145A1 |
Provided is a multilayer reflective film-equipped substrate having a multilayer reflective film which has a shallow effective reflection surface and in which it is possible to suppress the phenomenon in which atoms serving as a material ...
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WO/2023/055739A1 |
A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a plan...
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WO/2023/056012A1 |
Feature images representing a layout geometry of a lithographic mask are received. Mask function (MF) contributions from individual feature images are calculated by convolving the feature image with a corresponding three-dimensional mask...
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WO/2023/046385A1 |
Selecting an optimized, geometrically diverse subset of clips for a design layout for a semiconductor wafer is described. A complete representation of the design layout is received. A set of representative clips of the design layout is d...
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WO/2023/048853A1 |
The present disclosure is directed to EUV mask inspection tools including a source assembly that generates a EUV beam, a detector assembly having a projection optics system, a processor, a movable stage supporting a patterned mask, a sta...
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WO/2023/038139A1 |
This pellicle is provided with a pellicle frame, a pellicle film which is supported on one end surface of the pellicle frame, and an adhesive layer which is provided on the other end surface of the pellicle frame, and satisfies formula (...
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WO/2023/038142A1 |
This pellicle is provided with a pellicle frame, a pellicle film, and an adhesive layer. An inner wall surface and/or an outer wall surface of the adhesive layer satisfies expression (1). Expression (1): ([A2s]/[A50s]) ≤ 0.97 where A...
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WO/2023/039054A1 |
Reticle pods include interfacing surfaces to secure segments of the reticle pod to one another. At least one of the interfacing surfaces is a ramped surface, such that when the reticle pods are secured to one another, the reticle is clam...
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WO/2023/038840A1 |
Extreme ultraviolet (EUV) mask blanks, methods of forming EUV mask blanks and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer reflective stack on a substrate. The multilayer reflective stack comprises...
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WO/2023/038141A1 |
This pellicle frame has one end surface provided with an adhesive layer capable of adhering to a photomask, and another end surface for supporting a pellicle film. The pellicle frame is a rectangular pellicle frame (but is not a pellicle...
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WO/2023/036561A1 |
Since a mask check wafer can utilize a different process than a production wafer, a high-contrast illumination setting with lower pupil fill ratio (PFR) that leads to a reduction of the productivity of the scanner can be utilized. By sel...
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WO/2023/037731A1 |
Provided are a mask blank, a phase shift mask, and a method for producing a semiconductor device, the mask blank being provided with a light-blocking film that has a desired light-blocking property and makes it possible to suppress an in...
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WO/2023/036895A1 |
The present invention relates to a method (1800) for repairing at least one defect (320) of a sample (205, 300, 1500) using a focused particle beam (227), comprising the steps of: (a) producing (1850) at least one first local, electrical...
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WO/2023/037980A1 |
Provided is a multilayer reflective film-attached substrate having a multilayer reflective film which has a shallow effective reflection surface and in which the phenomenon of material atom diffusion between a low-refractive-index layer ...
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WO/2023/036200A1 |
The present application provides a thin film mask, comprising: a first layer and a second layer. The first layer and the second layer are laminated; the second layer comprises an adhesive film; the absorption coefficient of the first lay...
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WO/2023/038140A1 |
The objective is to provide a pellicle which less likely generates outgas. A pellicle (10) of the present disclosure comprises a pellicle frame (14), a pellicle film (12) supported on one end face of the pellicle frame (14), and an adh...
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WO/2023/033975A1 |
Extreme ultraviolet (EUV) mask blanks, production systems therefor, and methods of increasing multilayer film reflectance are disclosed. The EUV mask blanks comprise a bilayer film on a substrate. The bilayer film comprises a first film ...
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WO/2023/025511A1 |
A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irre...
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WO/2023/026868A1 |
This reflective mask blank has a substrate, a multilayer reflection film that reflects EUV light, and a phase shift film that shifts the phase of the EUV light in this order. The phase shift film contains a compound containing Ru and an ...
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WO/2023/027051A1 |
[Problem] To achieve high performance of a filter attached to a ventilation port provided through a pellicle frame so as to satisfy strict use conditions required particularly for EUV exposure. [Solution] A pellicle according to the pres...
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WO/2023/027159A1 |
This pellicle film contains a plurality of carbon nanotubes, wherein the plurality of carbon nanotubes have an average value of the linearity parameter represented by formula (1) of is 0.10 or lower. Formula (1): the linearity paramete...
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WO/2023/021856A1 |
This substrate processing device is provided with a substrate holding unit for holding a substrate, and a plasma reactor (1). The plasma reactor (1) emits plasma onto a main surface of the substrate. The plasma reactor (1) comprises: at ...
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WO/2023/016752A1 |
Described are embodiments for generating a design (e.g., a metrology mark or a device pattern to be printed on a substrate) that is optimized for aberration sensitivity related to an optical system of a lithography system. A metrology ma...
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WO/2023/016270A1 |
A reticle preparation method, a reticle, a Josephson junction element, and a quantum chip, relating to the field of quantum information, and in particular to the technical field of quantum computing. The reticle preparation method compri...
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WO/2023/016723A1 |
An improved methods and systems for detecting defect(s) on a mask are disclosed. An improved method comprises inspecting an exposed wafer after the wafer was exposed, by a lithography system using a mask, with a selected process conditio...
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WO/2023/015638A1 |
A photomask and a method for preparing same, which are used for avoiding the situation whereby a photomask is discarded and unusable due to a destructive process failure thereof, thereby saving on costs. The photomask comprises: a first ...
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